公开(公告)号：US20190101837A1

公开(公告)日：2019-04-04

申请号：US16086343

申请日：2017-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Hakki Ergün CEKLI ,  Günes NAKÍBOGLU ,  Frank Johannes Jacobus ,  Jean-Philippe XAVIER ,  Richard Johannes Franciscus

IPC: G03F7/20

Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.

公开(公告)号：US20240176255A1

公开(公告)日：2024-05-30

申请号：US18284608

申请日：2022-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Remco VAN DE MEERENDONK ,  Daniel Jozef, Maria DIRECKS ,  Günes NAKÍBOGLU ,  Nicholas Peter WATERSON ,  Joost André KLUGKIST ,  Sven PEKELDER ,  Antonius Johannus VAN DER NET ,  Johannes Henricus Wilhelmus JACOBS ,  Jaap OUDES ,  Gerardus Arnoldus Hendricus, Franciscus JANSSEN ,  Jeroen, Peterus Johannes VAN LIPZIG ,  Johannes, Franciscus Martinus VAN SANTVOORT

IPC: G03F7/00

CPC classification number: G03F7/70891

Abstract: A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.