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    Carbamoyl carboxylic acid amide derivs.
    1.
    发明专利
    Carbamoyl carboxylic acid amide derivs. 未知

    公开(公告)号：DE4446458A1

    公开(公告)日：1996-07-04

    申请号：DE4446458

    申请日：1994-12-27

    Applicant: BASF AG

    Inventor： WAGNER OLIVER DR ,  WETTERICH FRANK DR ,  EICKEN KARL DR ,  HARREUS ALBRECHT DR ,  AMMERMANN EBERHARD DR ,  LORENZ GISELA DR

    IPC: C07C271/22 ,  C07C271/34 ,  C07C271/54 ,  C07C271/60 ,  A01N47/12 ,  C07C269/04 ,  C07C269/06

    Abstract: Carbamoyl carboxylic acid amide derivs. of formula (I) and their salts are new R = 1-8C alkyl, 2-8C alkenyl, or 2-8C alkynyl (these gps. being opt. partially or completely halogenated and/or mono-, di- or tri-substd. with T gps.); 3-7C cycloalkyl or 3-7C cycloalkyl (these last 2 gps. being opt. partially or completely halogenated and/or mono-, di- or tri-substd. with T gps. (excluding cycloalkyl, cycloalkenyl and heteroaryl) or with 1-4C alkyl or aryl(1-4C)alkyl (this last gp. itself opt. substd. with T gps. excluding cycloalkyl or cycloalkenyl)); a non-aromatic 4-8 membered ring contg. in the ring, in addition to C, 1 or 2 heteroatoms chosen from O, S and N (the ring C being opt. mono-, di- or tri-substd. with halogen, 1-4C alkyl, T gps. (excluding cycloalkyl, cycloalkenyl and heteroaryl) and the second and any further N heteroatom carrying H or 1-4C alkyl); aryl or heteroaryl (these 2 gps. opt. mono-, di- or tri-substd. with halogen, 1-4C alkyl or T gps. (excluding cycloalkyl and cycloalkenyl)) or W W C=N; W = 1-8C alkyl (opt. partially or completely halogenated and/or opt. mono-, di- or tri-substd. with T gps. (excluding alkoxycarbonyl, cycloalkyl and cycloalkenyl)), 2-8C alkenyl, 2-8C alkynyl (opt. partially or completely halogenated and opt. mono-, di- or tri-substd. with 1-4C alkyl or T gps. (excluding cycloalkyl, cycloalkenyl and heteroaryl), 3-7C cycloalkyl or 3-7C cycloalkenyl (opt. mono-, di- or tri-substd. with halogen, 1-4C alkyl, aryl(1-4C)alkyl (this last gp. itself opt. substd. with halogen, 1-4C alkyl or T gps., excluding cycloalkyl, cycloalkenyl or heteroaryl) or T gps. (excluding cycloalkyl, cycloalkenyl, aryloxy or heteroaryl)), aryl or heteroaryl (these last 2 gps. opt. substd. with T gps., excluding cycloalkyl, cycloalkenyl or heteroaryl); W = H or a gp. W ; R = H, 1-8C alkyl or 3-7C cycloalkyl (these last 2 gps. opt. partially or completely halogenated); R = 1-8C alkyl, 3-7C cycloalkyl (opt. mono-, di- or tri-substd. with halogen, 1-4C alkyl, phenyl(1-4C)alkyl (in which the Ph gp. is opt. mono-, di- or tri-substd. with halogen, 1-4C alkyl or T gps., excluding cycloalkyl, cycloalkenyl, aryl, aryloxy or heteroaryl)); R = one of the R gps.; or R and R together with the C atom to which they are attached form a 4-8 membered ring which contains, in addition to C, 1 or 2 heteroatoms chosen from O, S and N (the ring C being opt. mono- or di-substd. with halogen, 1-4C alkyl and T gps. (excluding cycloalkyl, cycloalkenyl and heteroaryl) and the N heteroatom carrying H or 1-4C alkyl); R = a R gp.; X = H, 1-8C alkyl and/or 2-8C alkenyl (these last 2 gps. opt. partially or completely halogenated and opt. mono-, di- or tri-substd. with T gps., excluding cycloalkyl, cycloalkenyl or heteroaryl), 3-7C cycloalkyl and/or 3-7C cycloalkenyl (these 2 gps. opt. partially or completely halogenated and opt. mono-, di- or tri-substd. with 1-4C alkyl, aryl(1-4C) alkyl (this last opt. substd. with halogen, 1-4C alkyl and T gps., excluding cycloalkyl, cycloalkenyl and heteroaryl), or T gps. (excluding cycloalkyl, cycloalkenyl or heteroaryl)); m = 0-2; A = 3-7C cycloalkyl or 3-7C cycloalkenyl (opt. partially or completely halogenated and/or opt. mono-, di- or tri-substd. with 1-4C alkyl, aryl(1-4C)alkyl (thus last opt. mono-, di- or tri-substd. on aryl with halogen, 1-4C alkyl or T gps., excluding cycloalkyl, cycloalkenyl and heteroaryl) or T gps. excluding cycloalkyl, cycloalkenyl, aryloxy and heteroaryl); R = aryl or heteroaryl (these gps. opt. mono-, di- or tri-substd. with halogen or T gps., excluding cycloalkyl, cycloalkenyl or heteroaryl); T = CN, 1-4C alkoxyalkyl, 1-4C haloalkyl, 1-4C alkoxy, 1-4C haloalkoxy, 1-4C alkylthio, 1-4C alkoxycarbonyl, 3-7C cycloalkyl, 3-7C cycloalkenyl, aryl, aryloxy or heteroaryl, the cyclic gps. themselves being opt. mono-, di- or tri-substd. with halogen, CN, 1-4C alkyl, 1-4C alkoxy alkyl, 1-4C haloalkyl, 1-4C alkoxy, 1-4C haloalkoxy, 1-4C alkylthio, 1-4C alkoxycarbonyl, aryl, aryloxy or heteroaryl.

    Amides of carbamoyl carboxylic acid, process of their preparation, composition for fighting harmful fungi and molds and method for controlling harmful fungi and molds
    2.
    发明专利
    Amides of carbamoyl carboxylic acid, process of their preparation, composition for fighting harmful fungi and molds and method for controlling harmful fungi and molds 未知

    公开(公告)号：CZ292267B6

    公开(公告)日：2003-08-13

    申请号：CZ50098

    申请日：1996-08-26

    Applicant: BASF AG

    Inventor： WETTERICH FRANK DR ,  WAGNER OLIVER DR ,  EICKEN KARL DR ,  DITRICH KLAUS DR ,  AMMERMANN EBERHARD DR ,  LORENZ GISELA DR ,  STRATHMANN SIEGFRIED DR

    IPC: C07C269/04 ,  A01N47/12 ,  C07C269/06 ,  C07C271/22

    Abstract: In the present invention there are disclosed carbamoyl carboxylic acid amides of the general formula I, in which Re1 represents an optionally substituted alkyl containing 1 to 8 carbon atoms, alkenyl containing 2 to 8 carbon atoms or alkynyl containing 2 to 8 carbon atoms a Re2 denotes hydrogen, a halogen, cyano, nitro, alkyl containing 1 to 8 carbon atoms, alkoxyalkyl containing 1 to 4 carbon atoms in the alkoxy moiety, haloalkyl containing 1 to 4 carbon atoms, alkoxy containing 1 to 4 carbon atoms, haloalkoxy containing 1 to 4 carbon atoms, alkylthio containing 1 to 4 carbon atoms, haloalkylthio containing 1 to 4 carbon atoms, or a phenyl group bound through oxygen or sulfur. Further disclosed is a process of their preparation, which process is characterized by bringing a corresponding carbamoyl carboxylic acid into reaction a relevant amine. Said amides can be used for fighting harmful fungi and molds wherein the compositions for controlling harmful fungi and molds contain an effective amount of at least one above-indicated amide and at least one general preparation. When controlling the harmful fungi and molds the harmful fungi and molds, or a place of their incidence or plants, area, material or surfaces are treated with an effective amount of at least one aforementioned compound or the above-indicated composition.

    DERIVATIVE OF CARBAMOYLCARBOXYLIC ACID AMIDE, PROCESS OF ITS PREPARATION AND THE USE THEREOF
    3.
    发明专利
    DERIVATIVE OF CARBAMOYLCARBOXYLIC ACID AMIDE, PROCESS OF ITS PREPARATION AND THE USE THEREOF 未知

    公开(公告)号：CZ64097A3

    公开(公告)日：1998-02-18

    申请号：CZ64097

    申请日：1995-08-19

    Applicant: BASF AG

    Inventor： WETTERICH FRANK DR ,  WAGNER OLIVER DR ,  EICKEN KARL DR ,  AMMERMANN EBERHARD DR ,  LORENZ GISELA DR

    IPC: A01N47/10 ,  A01N47/12 ,  A01P3/00 ,  C07C271/22 ,  C07C323/23 ,  C07C323/50

    Abstract: PCT No. PCT/EP95/03303 Sec. 371 Date Mar. 3, 1997 Sec. 102(e) Date Mar. 3, 1997 PCT Filed Aug. 19, 1995 PCT Pub. No. WO96/07638 PCT Pub. Date Mar. 14, 1996Carbamoylcarboxamides of the general formula I (I) and their salts (R1 is unsubstituted or substituted alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkenyl or an unsubstituted or substituted nonaromatic carbo- or heterocycle; R2 is H or unhalogenated or halogenated alkyl or cycloalkyl; R3 is unsubstituted or substituted alkyl, cycloalkyl or phenylalkyl; R4 is H or one of the radicals R3 or R3 and R4, together with the C atom to which they are bonded, are an unsubstituted or substituted carbo- or heterocycle; R5 independently of these is one of the radicals R2; X independently of one another is hydrogen, unsubstituted or substituted alkyl and/or alkenyl; Y independently of one another and of these is one of the radicals X; p,q independently of one another are 0, 1 or 2; R6 is halogen, cyano, nitro or unsubstituted or substituted alkyl, alkoxy, alkylthio or an unsubstituted or substituted phenyl group bonded via oxygen or sulfur; r is 0, 1, 2 or 3), and compositions containing them, processes for preparation, and the use of the compounds I and the compositions are described.

    New 4-aryl-hydrazino- and 4-aryl-azo-quinoline derivs.
    4.
    发明专利
    New 4-aryl-hydrazino- and 4-aryl-azo-quinoline derivs. 未知

    公开(公告)号：DE19533653A1

    公开(公告)日：1997-03-13

    申请号：DE19533653

    申请日：1995-09-12

    Applicant: BASF AG

    Inventor： WAGNER OLIVER DR ,  WETTERICH FRANK DR ,  EICKEN KARL DR ,  LORENZ GISELA DR ,  AMMERMANN EBERHARD DR ,  STRATHMANN SIEGFRIED DR

    IPC: A01N43/42 ,  C07D215/42 ,  C07D401/12 ,  A01N43/58

    Abstract: 4-Arylhydrazino-quinolines of formula (I) and 4-arylazo-quinolines of formula (II) and the N-oxides and acid-addn. salts of (I) are new. R1-R4 = H, OH, NO2, halo, 1-4C alkyl, 1-4C alkoxy, 1-4C haloalkyl, 1-4C alkylthio, 1-4C haloalkoxy, 1-4C haloalkylthio or 2-5C alkoxyalkyl; R5, R6 = H, halo, 1-4C alkyl, 1-4C alkoxy, 1-4C haloalkoxy or 1-4C alkylthio; R7 = H, 1-4C alkyl, CHO, 2-5C alkanoyl or 2-5C alkoxycarbonyl; R8 = H, CHO, opt. halogenated 1-8C alkyl, 2-8C alkenyl, 2-8C alkynyl, 2-9C alkanoyl or 3-7C cycloalkyl; aryl or heteroaryl opt. substd. by 1-3 of NO2, halo, CN, 1-4C (halo)alkyl, 1-4C (halo)alkoxy, 1-4C alkylthio, mono and di(1-4C alkyl)amino, 1-4C alkylsulphonyl, 1-4C alkylsulphoxy (sic), 1-4C alkylsulphonyloxy, 2-5C alkanoyl, 2-5C alkanoyloxy, 2-5C alkoxycarbonyl, aryl or aryloxy,;or R7+R8 = a bond; R9 = aryl or heteroaryl opt. substd. by 1-3 of NO2, halo, CN, 1-4C (halo)alkyl, 1-4C (halo)alkoxy, 1-4C alkylthio, mono- and di(1-4C alkyl)amino, 1-4C alkylsulphonyl, 1-4C alkylsulphoxy (sic), 1-4C alkylsulphonyloxy, 2-5C alkanoyl, 2-5C alkanoyloxy, 2-5C alkoxycarbonyl, aryl and aryloxy, where aryl and aryloxy are opt. substd. by 1-3 of NO2, of halo, CN, 1-4C (halo)alkyl, 1-4C(halo)alkoxy, 1-4C alkylthio, mono- and di)1-4C alkyl)amino, 1-4C alkylsulphonyl, 1-4C alkylsulphoxy (sic), 1-4C alkylsulphonyloxy, 2-5C alkanoyl, 2-5C alkanoyloxy, 2-5C alkoxycarbonyl, aryl or aryloxy. Cpds. (I) with the following substits. are excluded (substits. not mentioned are H): R9 = phenyl, 4-chlorophenyl (an its N-oxide and HCl salt), 2,4-dichlorophenyl (and N-oxide and HCl salt), 2,4-dibromophenyl; R9 = 4-bromophenyl (HBr salt); R5 = Me, R7 = H or Me and R9 = phenyl; R2 ,R5 = Me, and R9 = phenyl; R1 = OMe, R5 = Me, R9 = phenyl (HCl salt); R2 = Me, R9 = 4-nitrophenyl(and N-oxide and HCl salt); R3 = Cl, R9 = 4-nitrophenyl or 4-chlorophenyl; R5 = Cl, R9 = 4-chlorophenyl or 2,4-dichlorophenyl, R3= 4-quinolyl (and di-N-oxide); R5 = Me, R9 = 4-quinolyl (di-N-oxide); Q, R9 = phenyl, 4-chlorophenyl, 4-bromophenyl, 2,4-dichlorophenyl, 2,4-dibromophenyl or 4-dimethylaminophenyl (and N-oxides); R2, R4 = OMe or OEt, R5 = Me, R7 = undefined, and R9 = phenyl; R5 = Ce (sic), Q, and R9 = phenyl, 4-chlorophenyl or 2,4-dichlorophenyl; R3 = Cl, Q, and R9 = phenyl; R5 = Me, R7 and R8 undefined, and R9 = phenyl; R5,R6 = Me, Q, R9 = phenyl, R1, R5 = Me, Q, R9 = phenyl; R2,R5 = Me, Q, R9 = phenyl; R5 = Me, Q, R9 = phenyl; R1,R3, R5 = Me, Q, R9 = phenyl; R2, R4, R5 = Me, Q, R9 = phenyl; Q = R7 and R8 are not defined.

    6.
    发明专利
    未知

    公开(公告)号：DE19622270A1

    公开(公告)日：1997-12-04

    申请号：DE19622270

    申请日：1996-06-03

    Applicant: BASF AG

    Inventor： WETTERICH FRANK DR ,  EICKEN KARL DR ,  HILL REGINA LUISE DR ,  LORENZ GISELA DR ,  AMMERMANN EBERHARD DR ,  STRATHMANN SIEGFRIED DR

    IPC: A01N43/54 ,  C07D239/38 ,  C07D239/28

    Abstract: Pyrimidine-4-carboxylic acid amides of formula (I) and their salts, in which R is optionally substituted alkyl, aryl; n is 0, 1, or 2; R is hydrogen, hydroxy, halogen, alkyl, alkyl halide, alkoxy, alkoxy halide; R is hydrogen, hydroxy, halogen, alkyl, alkyl halide, alkoxy, alkoxy halide, where one of the radicals R and R always stands for hydrogen; Y is oxygen or sulphur; R is hydrogen or optionally partially or fully halogenated alkyl, cycloalkyl; R is optionally substituted alkyl, cycloalkyl, aryl; and agents containing them and their use as fungicides.

    Fungicide contg. new or known quinoline cpds.
    7.
    发明专利
    Fungicide contg. new or known quinoline cpds. 未知

    公开(公告)号：DE19535208A1

    公开(公告)日：1997-03-27

    申请号：DE19535208

    申请日：1995-09-22

    Applicant: BASF AG

    Inventor： WAGNER OLIVER DR ,  WETTERICH FRANK DR ,  EICKEN KARL DR ,  LORENZ GISELA DR ,  AMMERMANN EBERHARD DR ,  STRATHMANN SIEGFRIED DR

    IPC: A01N43/42 ,  A01N43/58 ,  C07D215/42 ,  C07D401/12 ,  A01N43/40 ,  C07D215/60

    Abstract: Use of N-(hetero)aryl-hydrazino-quinoline cpds. of formula (I), and their oxides and salts is claimed for combatting fungi. R1-R4 = H, OH, NO2, halo, alkyl, alkoxy, haloalkyl, alkylthio, haloalkoxy, haloalkylthio or alkoxyalkyl; R5, R6 = H, halo, alkyl, alkoxy, haloalkoxy, or alkylthio; R7 = H, alkyl CHO, alkylcarbonyl or alkoxycarbonyl; R8 = H, CHO, 1-8C alkyl, 2-8C alkenyl, 2-8C alkynyl, 1-8C alkylcarbonyl, 3-7C cycloalkyl, 3-7C cycloalkenyl (all opt. partly or fully halogenated) or Ar; or R7+R8 = bond; Ar = aryl or heteroaryl, (both opt. substd. by 1-3 NO2, halo, CN, alkyl, haloalkyl, alkoxy, haloalkoxy, alkylthio, haloalkylthio, alkylamino, dialkylamino, alkylsulphonyl, alkylsulphoxy, alkylsulphonyloxy, alkylcarbonyl, alkylcarbonyloxy, alkoxycarbonyl, aryl or aryloxy); R9 = aryl or heteroaryl, (both opt. substd. by 1-3 NO2, halo, CN, alkyl, haloalkyl, alkoxy, haloalkoxy, alkylthio, haloalkylthio, alkylamino, dialkylamino, alkylsulphonyl, alkylsulphoxy, alkylsulphonyloxy, alkylcarbonyl, alkylcarbonyloxy, alkoxycarbonyl, aryl or aryloxy, where the cyclic gps. are opt. substd. as in Ar, except for haloalkyl). (I) are new, with exclusions.

    New and known substd. alkylthio-pyridine derivs.
    8.
    发明专利
    New and known substd. alkylthio-pyridine derivs. 未知

    公开(公告)号：DE19531148A1

    公开(公告)日：1997-02-27

    申请号：DE19531148

    申请日：1995-08-24

    Applicant: BASF AG

    Inventor： WAGNER OLIVER DR ,  WETTERICH FRANK DR ,  EICKEN KARL DR ,  RACK MICHAEL DR ,  HAMPRECHT GERHARD DR ,  LAMM GUNTHER DR ,  SPEAKMAN JOHN-BRYAN DR ,  LORENZ GISELA DR ,  AMMERMANN EBERHARD DR ,  STRATHMANN SIEGFRIED DR

    IPC: A01N43/40 ,  A01N43/42 ,  A01N43/54 ,  A01N43/78 ,  A01N43/90 ,  C07D213/70 ,  C07D213/71 ,  C07D213/82 ,  C07D213/85 ,  C07D215/54 ,  C07D239/38 ,  C07D277/74 ,  C07D277/76 ,  C07D513/04 ,  A01N47/00

    Abstract: Control of fungi using substd. alkylthio-pyridine derivs. (I) and their salts and N-oxides is claimed. R -R = H, CN, NO2 or halo; 1-4C alkyl or 1-4C alkoxy (both opt. substd. by halo), 1-4C alkylthio, 1-4C alkoxy-1-4C alkyl, 1-4C alkoxy-CO or Ar; Ar = aryl, aryloxy or heteroaryl (all opt. ring substd. by 1-3 of halo, CN or NO2; 1-4C alkyl or 1-4C alkoxy (both opt. substd. by halo), 1-4C alkylthio, 1-4C alkoxy-1-4C alkyl, 1-4C alkoxy-CO or 1-4C acyl); m = 0-2; Alk = 1,2-ethylene or 1,3-propylene having any H atom opt. replaced by: (a) alkyl, haloalkyl, alkenyl, haloalkenyl or alkynyl (all having up to 8C and opt. substd. by 1-3 of CN, 1-4C alkoxy (opt. substd. by halo), 1-4C alkylthio, 1-4C alkoxycarbonyl, 3-7C cycloalkyl or 5-7C cycloalkenyl); or (b) 3-7C cycloalkyl or 5-7C cycloalkenyl (both opt. substd. by 1 or more halo or opt. substd. by 1-3 of CN, halo, 1-4C alkyl (opt. substd. by halo) or 1-4C alkoxy); X = O, S or NR ; R = H, 1-8C alkyl or 3-7C cycloalkyl; R = (a) aryl, heteroaryl or aryl-1-4C alkyl (all opt. ring substd. by 1-3 of CN, NO2, halo, 1-4C alkyl or 1-4C alkoxy (opt. substd. by halo), 1-4C alkylthio, 1-4C alkoxy-1-4C alkyl, 1-4C alkoxy-CO, 1-4C alkylsulphinyl, 1-4C alkylsulphonyl, 1-4C acyl or Ar); or (b) 3-7C cycloalkyl or 5-7C cycloalkenyl (both opt. substd. by 1 or more halo or opt. substd. by 1-3 of CN, halo, 1-4C alkyl or 1-4C alkoxy (opt. substd. by halo), 1-4C alkoxy-1-4C alkyl, 1-4C alkylthio, 1-4C alkoxy-carbonyl, 3-7C cycloalkyl, 5-7C cycloalkenyl or Ar).

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