Amides of carbamoyl carboxylic acid, process of their preparation, composition for fighting harmful fungi and molds and method for controlling harmful fungi and molds

    公开(公告)号:CZ292267B6

    公开(公告)日:2003-08-13

    申请号:CZ50098

    申请日:1996-08-26

    Applicant: BASF AG

    Abstract: In the present invention there are disclosed carbamoyl carboxylic acid amides of the general formula I, in which Re1 represents an optionally substituted alkyl containing 1 to 8 carbon atoms, alkenyl containing 2 to 8 carbon atoms or alkynyl containing 2 to 8 carbon atoms a Re2 denotes hydrogen, a halogen, cyano, nitro, alkyl containing 1 to 8 carbon atoms, alkoxyalkyl containing 1 to 4 carbon atoms in the alkoxy moiety, haloalkyl containing 1 to 4 carbon atoms, alkoxy containing 1 to 4 carbon atoms, haloalkoxy containing 1 to 4 carbon atoms, alkylthio containing 1 to 4 carbon atoms, haloalkylthio containing 1 to 4 carbon atoms, or a phenyl group bound through oxygen or sulfur. Further disclosed is a process of their preparation, which process is characterized by bringing a corresponding carbamoyl carboxylic acid into reaction a relevant amine. Said amides can be used for fighting harmful fungi and molds wherein the compositions for controlling harmful fungi and molds contain an effective amount of at least one above-indicated amide and at least one general preparation. When controlling the harmful fungi and molds the harmful fungi and molds, or a place of their incidence or plants, area, material or surfaces are treated with an effective amount of at least one aforementioned compound or the above-indicated composition.

    4.
    发明专利
    未知

    公开(公告)号:ES2153693T3

    公开(公告)日:2001-03-01

    申请号:ES98101536

    申请日:1998-01-29

    Applicant: BASF AG

    Abstract: Purification of alpha , beta , gamma -substituted carboxylic acids of formula (I), their salts and esters or a mixture of these and one or more polyol and one or more aminoalcohol in aqueous solution comprises treatment by electrodialysis. R1 = H, 1-10C alkyl, Na or K ; R2 = H or 1-10C alkyl; R3 = H, 1-10C alkyl (optionally substituted by NH2, OH, 1-4C alkyl, 1-4C alkoxy or halo-substituted phenyl); X = halo (when R3 is absent), N, O, P, S; and m = 0-2. Also claimed are: (i) cleavage of an optically active amide to an optically active amine and (I); and (ii) resolution of a racemic primary or secondary amine by reacting (I) with a hydrolase, separating the unreacted enantiomer of the amine from the amide and hydrolysing the amide to give the amine enantiomer and (I).

    6.
    发明专利
    未知

    公开(公告)号:DE59006739D1

    公开(公告)日:1994-09-15

    申请号:DE59006739

    申请日:1990-05-07

    Applicant: BASF AG

    Abstract: Sulphonamides of the general formula I in which the substituents and indices have the following meanings: R represents hydrogen or C1-C4-alkyl, R represents hydrogen, optionally substituted C1-C6-alkyl; C3-C4-alkenyl; C3-C4-alkynyl or optionally substituted saturated or monounsaturated 5- to 7-membered heteroaryl; R and R represent halogen; optionally substituted C1-C4-alkoxy, C1-C4- alkylthio, C2-C6-alkenyl, C2-C6-alkenyloxy, C2-C6-alkenylthio, C2-C6- alkynyl, C2-C6-alkynyloxy, C2-C6-alkynylthio, C3-C6-cycloalkyl, C3-C6- cycloalkylthio, C5-C6-cycloalkenyl, C3-C6-cycloalkoxy, C5-C6- cycloalkenyloxy, C5-C6-cycloalkenylthio, phenyl, phenoxy, phenylthio, benzyl, benzyloxy or benzylthio; the groups mentioned under R or NR R in which R and R represent hydrogen, C1-C6-alkyl, C3-C6-alkenyl, C3-C6-alkynyl, C3-C6-cycloalkyl, C5-C6-cycloalkenyl, optionally substituted phenyl and/or benzyl, or represent optionally substituted C4-C6-alkylene which can be interrupted by oxygen, sulphur or nitrogen; X represents nitrogen or =CR - in which R represents one of the radicals R , n represents 0 or 1 and A represents optionally substituted aryl with one or two rings, containing one to two nitrogen, oxygen and/or sulphur atom(s), and their agriculturally useful salts, and herbicidal and plant- growth-regulating compositions containing them.

    Hetero-aryl-di:carboxylic acid amide derivs.

    公开(公告)号:DE4022566A1

    公开(公告)日:1992-01-23

    申请号:DE4022566

    申请日:1990-07-16

    Applicant: BASF AG

    Abstract: Dicarboxylic acid imides of formula (I) and their salts tolerated by plants, excepting 3-methyl-isoxazole-4,5-dicarboximide and thiazole-4,5-dicarboxylic acid imide in which R2 = Ph if R1 = Me or 2-thiazolyl a, b and c complete an aromatic ring and represent either (i) CHR1, N and X, (ii) CHR1, X and N or (iii) N, CHR1 and X respectively X = O or S; R1 = H, halogen, CN, 1-6C alkyl (opt. contg. 1-5 halogen and/or 1 or 2 of the following: 3-6C cyclo-alkyl, 1-4C alkoxy, 1-4C haloalkoxy, 1-4C alkylthio, 1-4C haloalkylthio, 1-4C alkyl-sulphonyl, 1-4C haloalkyl sulphonyl or CN), 3-8C cycloalkyl (opt. mono, di or tri substd. by 1-4C alkyl or halogen), 2-6C alkenyl, 2-6C alkynyl (these last 2 opt. mono, di or trisubstd. by halogen, 1-3C alkoxy and or Ph, which is itself mono, di or tri substd. by 1-4C alkyl, 1-4C haloalkyl, etc. PhO or PhS opt. substd., a 5 or 6-membered satd. or aromatic heterocyclic gp. (contg. 1 or 2 O, S or N heteroatoms, and the ring being opt. mono or di substd. ) or a condensed aromatic ring chosen from benzofuran-2 or 3-yl, isobenzofuran-2-yl, benzothiophen-2- or 3-yl isobenzothiophen-2-yl, indol-2 or 3-yl, , etc. (each opt. mono or di substd. substd. R2 = H, OH, 1-4C alkoxy, 1-6C alkyl (opt. --3-8C cycloalkyl (opt. mono, di or tri substd. by 1-6C alkyl, CN, etc. 3-6C alkenyl, 3-6C alkynyl (these opt. mono- di- or tri-substd. by halogen and/or mono-substd. by Ph, itself opt. or by formyl, Ph, 1-4C alkanoyl, 1-4C haloalkanyl

    9.
    发明专利
    未知

    公开(公告)号:DE3916469A1

    公开(公告)日:1990-11-22

    申请号:DE3916469

    申请日:1989-05-20

    Applicant: BASF AG

    Abstract: Sulphonamides of the general formula I in which the substituents and indices have the following meanings: R represents hydrogen or C1-C4-alkyl, R represents hydrogen, optionally substituted C1-C6-alkyl; C3-C4-alkenyl; C3-C4-alkynyl or optionally substituted saturated or monounsaturated 5- to 7-membered heteroaryl; R and R represent halogen; optionally substituted C1-C4-alkoxy, C1-C4- alkylthio, C2-C6-alkenyl, C2-C6-alkenyloxy, C2-C6-alkenylthio, C2-C6- alkynyl, C2-C6-alkynyloxy, C2-C6-alkynylthio, C3-C6-cycloalkyl, C3-C6- cycloalkylthio, C5-C6-cycloalkenyl, C3-C6-cycloalkoxy, C5-C6- cycloalkenyloxy, C5-C6-cycloalkenylthio, phenyl, phenoxy, phenylthio, benzyl, benzyloxy or benzylthio; the groups mentioned under R or NR R in which R and R represent hydrogen, C1-C6-alkyl, C3-C6-alkenyl, C3-C6-alkynyl, C3-C6-cycloalkyl, C5-C6-cycloalkenyl, optionally substituted phenyl and/or benzyl, or represent optionally substituted C4-C6-alkylene which can be interrupted by oxygen, sulphur or nitrogen; X represents nitrogen or =CR - in which R represents one of the radicals R , n represents 0 or 1 and A represents optionally substituted aryl with one or two rings, containing one to two nitrogen, oxygen and/or sulphur atom(s), and their agriculturally useful salts, and herbicidal and plant- growth-regulating compositions containing them.

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