公开(公告)号：US20150175845A1

公开(公告)日：2015-06-25

申请号：US14402975

申请日：2013-05-21

Applicant: BASF SE

Inventor： Yuzhuo Li ,  Bastian Marten Noller ,  Christophe Gillot ,  Diana Franz

IPC: C09G1/02 ,  H01L21/306

CPC classification number: C09G1/02 ,  B81C2201/0121 ,  B81C2201/0123 ,  B81C2201/0126 ,  H01L21/02024 ,  H01L21/302 ,  H01L21/304 ,  H01L21/30625 ,  H01L21/3212 ,  H01L21/461

Abstract: A process for the manufacture of semiconductor devices comprising the chemical-mechanical polishing of a substrate or layer containing at least one III-V material in the presence of a chemical-mechanical polishing composition (Q1) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one amphiphilic non-ionic surfactant having (b1) at least one hydrophobic group; and (b2) at least one hydrophilic group selected from the group consisting of polyoxyalkylene groups comprising (b22) oxyalkylene monomer units other than oxyethylene monomer units; and (M) an aqueous medium.

Abstract translation: 一种用于制造半导体器件的方法，包括在化学机械抛光组合物（Q1）的存在下对包含至少一种III-V材料的基底或层进行化学机械抛光，所述化学机械抛光组合物包含（A）无机颗粒，有机颗粒， 或其混合物或复合物，（B）至少一种具有（b1）至少一个疏水基团的两亲性非离子表面活性剂; 和（b2）至少一种选自包含（b22）氧化烯单体单元以外的氧化烯单体单元的聚氧化烯基的亲水基团; 和（M）水性介质。

公开(公告)号：US09416298B2

公开(公告)日：2016-08-16

申请号：US14402975

申请日：2013-05-21

Applicant: BASF SE

Inventor： Yuzhuo Li ,  Bastian Marten Noller ,  Christophe Gillot ,  Diana Franz

IPC: C09G1/02 ,  H01L21/304 ,  H01L21/302 ,  H01L21/321 ,  H01L21/461 ,  H01L21/306 ,  H01L21/02

CPC classification number: C09G1/02 ,  B81C2201/0121 ,  B81C2201/0123 ,  B81C2201/0126 ,  H01L21/02024 ,  H01L21/302 ,  H01L21/304 ,  H01L21/30625 ,  H01L21/3212 ,  H01L21/461

Abstract: A process for the manufacture of semiconductor devices comprising the chemical-mechanical polishing of a substrate or layer containing at least one III-V material in the presence of a chemical-mechanical polishing composition (Q1) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one amphiphilic non-ionic surfactant having (b1) at least one hydrophobic group; and (b2) at least one hydrophilic group selected from the group consisting of polyoxyalkylene groups comprising (b22) oxyalkylene monomer units other than oxyethylene monomer units; and (M) an aqueous medium.

Abstract translation: 一种用于制造半导体器件的方法，包括在化学机械抛光组合物（Q1）的存在下对包含至少一种III-V材料的基底或层进行化学机械抛光，所述化学机械抛光组合物包含（A）无机颗粒，有机颗粒， 或其混合物或复合物，（B）至少一种具有（b1）至少一个疏水基团的两亲性非离子表面活性剂; 和（b2）至少一种选自包含（b22）氧化烯单体单元以外的氧化烯单体单元的聚氧化烯基的亲水基团; 和（M）水性介质。