ACID-ETCH RESISTANT, PROTECTIVE COATINGS

    公开(公告)号:SG175217A1

    公开(公告)日:2011-11-28

    申请号:SG2011074903

    申请日:2010-03-19

    Abstract: New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.

    ACID-ETCH RESISTANT, PROTECTIVE COATINGS

    公开(公告)号:SG2014012512A

    公开(公告)日:2014-06-27

    申请号:SG2014012512

    申请日:2010-03-19

    Abstract: New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.

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