公开(公告)号：DE69402232T2

公开(公告)日：1997-09-18

申请号：DE69402232

申请日：1994-01-14

Applicant: IBM

Inventor： BUNSVOLD WILLIAM R ,  CONLEY WILLARD E ,  GELORME JEFFREY D ,  WOOD ROBERT L ,  LINEHAN LEO L ,  SOORIYAKUMARAN RATNAM ,  TAI TSONG-LIN

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/30 ,  G03F7/38 ,  H01L21/027

Abstract: Improved chemically amplified negative tone microlithographic resist compositions and methods for the use thereof are disclosed. The compositions comprise, in admixture, a crosslinking agent, a polymeric binder, and a compound that generates acid upon exposure of the resist composition to imaging radiation. The invention is particularly related to compositions having a crosslinking agent which does not plasticize the polymeric binder or alternatively does not reduce the glass transition temperature thereof. This minimizes the diffusion of the acid component from exposed regions of the resist to unexposed regions, and helps maintain relief image dimensional control.

公开(公告)号：DE69402232D1

公开(公告)日：1997-04-30

申请号：DE69402232

申请日：1994-01-14

Applicant: IBM

Inventor： BUNSVOLD WILLIAM R ,  CONLEY WILLARD E ,  GELORME JEFFREY D ,  WOOD ROBERT L ,  LINEHAN LEO L ,  SOORIYAKUMARAN RATNAM ,  TAI TSONG-LIN

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/30 ,  G03F7/38 ,  H01L21/027

Abstract: Improved chemically amplified negative tone microlithographic resist compositions and methods for the use thereof are disclosed. The compositions comprise, in admixture, a crosslinking agent, a polymeric binder, and a compound that generates acid upon exposure of the resist composition to imaging radiation. The invention is particularly related to compositions having a crosslinking agent which does not plasticize the polymeric binder or alternatively does not reduce the glass transition temperature thereof. This minimizes the diffusion of the acid component from exposed regions of the resist to unexposed regions, and helps maintain relief image dimensional control.