公开(公告)号：AT456822T

公开(公告)日：2010-02-15

申请号：AT06778316

申请日：2006-08-21

Applicant: IBM

Inventor： ALLEN ROBERT ,  DIPIETRO RICHARD ,  TRUONG HOA ,  BROCK PHILLIP ,  SOORIYAKUMARAN RATNAM

IPC: G03F7/004 ,  C07J9/00 ,  C07J17/00 ,  G03F7/039

Abstract: A dissolution modification agent suitable for use in a photoresist composition including a polymer, a photoacid generator and casting solvent. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to actinic radiation, whereupon the dissolution modifying agent, at a suitable temperature, becomes soluble in the developer and allows the polymer to dissolve in the developer. The DMAs are glucosides, cholates, citrates and adamantanedicarboxylates protected with acid-labile ethoxyethyl, tetrahydrofuranyl, and angelicalactonyl groups.