ETCHING OF MULTIPLE HOLES OF UNIFORM SIZE

    公开(公告)号:CA1137395A

    公开(公告)日:1982-12-14

    申请号:CA352847

    申请日:1980-05-27

    Applicant: IBM

    Abstract: ETCHING OF MULTIPLE HOLES OF UNIFORM SIZE Uniform holes with a diameter of the order of 1 micrometer or larger can be formed by an etching operation which employs the combined properties of the surface tension of the etch coupled with a force on the meniscus of the etch in the hole to cause the etching to stop when one hole reaches the proper size and to permit the etching to continue on all other holes until they reach the same size. YO977-061

    LINEAR ACTUATOR USING A COMPOUND PARALLEL BENDABLE ELEMENT SUSPENSION SYSTEM

    公开(公告)号:CA1331885C

    公开(公告)日:1994-09-06

    申请号:CA562790

    申请日:1988-03-29

    Applicant: IBM

    Abstract: LINEAP ACTUATOR USING A COMPOUND PARALLEL BENDABLE ELEMENT SUSPENSION SYSTEM An apparatus for the linear translation of read/write heads in a data recording system is disclosed herein. The apparatus comprises a compound parallel bending element suspension with driving means connected thereto. The compound parallel suspension comprises two sets of cantilevered bendable elements wherein one set of said elements is attached to a movable connecting means to connect said elements together and the other end of said elements is attached to a non-movable support post. The other set of said elements is attached in common to said connecting means and cantileverly extended therefrom and matingly connected to said read/write head assembly and drive means. The drive means can be any of a number conventional stepping and voice coil motor configurations including but not limited to friction drives, taut band drives, rack and pinion drives.

    DEPOSITION MASK AND METHODS OF MAKING SAME

    公开(公告)号:CA1094431A

    公开(公告)日:1981-01-27

    申请号:CA282615

    申请日:1977-07-13

    Applicant: IBM

    Inventor: HAMMER ROBERT

    Abstract: DEPOSITION MASK AND METHODS OF MAKING SAME The invention provides a reinforced mask which enables closely spaced strips or other narrowly separated parts of a deposited pattern to be formed upon a substrate by a non-line-of-sight deposition process (such as ion plating or sputter deposition) without causing unwanted voids or discontinuities to appear in the deposited pattern at points that underlie the reinforcing ribs on the mask. The mask is formed by a selective material removing process that produces a this web adjoining one or more relatively thick ribs that provide rigidity to the web. In those parts of the mask where the reinforcing ribs extend across slots or other openings in the web, the masking material is removed to a depth which exceeds the web thickness, thus raising the undersides of the ribs above the web surface to provide clearance for the vaporized material which is being deposited upon the substrate through the mask openings so that this material has ready access to points located directly beneath the ribs as well as points that are between the ribs. The ribs therefore can serve their reinforcing function without producing unwanted voids or thin spots in the deposited pattern.

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