公开(公告)号：JPH11176750A

公开(公告)日：1999-07-02

申请号：JP26220098

申请日：1998-09-17

Applicant: IBM

Inventor： AFZALI-ARDAKANI ALI ,  BRUNSVOLD WILLIAM ROSS ,  GELORME JEFFREY D ,  KOSBAR LAURA L ,  NANCY C RABIANKA ,  PATEL NIRANJAN M ,  PUSHUKARA RAAO VARAANASHII

IPC: G03F7/038 ,  G03F7/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain high resolution which enables development by water base, by adding film formation polymer resin with phenol group by a specified formula, glycol uril derivative cross linking agent, radiolysis acid generation agent and organic base. SOLUTION: A photoresist composition comprises film formation polymer resin with phenol group. The phenol resin is copolymer of hydroxystyrene and hydroxycyclohexyl ethene shown by a formula I (n>1, 0