Abstract:
PROBLEM TO BE SOLVED: To provide a capping layer, a photoelectron device having a capping layer with which it is easy to adjust an optical property, a manufacturing method of the photoelectron device and a method to specify a refractive index of the capping layer. SOLUTION: The photoelectron device is equipped with photoelectron members (12, 14, 16) to emit light, a light emission surface (22) and a capping layer (18) on the light emission surface (22). The capping layer (18) contains a mixture of a first material having a first refractive index and a second material having a second refractive index. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To obtain an electrode that is high in conductivity, excellent in transparency, and wide in adaptability by a method wherein the electrode that transmits light is equipped with a conductive device pattern, and the circumferential length of the device is shorter than the wavelength of the transmitted light. SOLUTION: A first ITO(indium tin oxide) layer 12 is formed as thick as 5 nm or so on a rectangular glass substrate 11 by sputtering. The layer 12 is 1000 Ω/(square) in resistance and made to serve as an adhesive layer lastly. A conductive grid 13 of gold as thick as 50 nm or so is formed by the use of micro contact printing technique. The conductive grid 13 is equipped with a conductive device or straps 14, and the conductive straps 14 are arranged like a honeycomb possessed of empty spaces 15. Moreover, the strap 14 is smaller in size than the wavelength of light. This means that the conductive strap 14 has its circumferential length shorter than the wavelength λ of a transmitted light.
Abstract:
The present invention discloses an electrode structure for electronic and opto-electronic devices. Such a device comprises a first electrode substantially having a conductive layer ( 204 ), a nonmetal layer ( 206 ) formed on the conductive layer, a fluorocarbon layer ( 208 ) formed on the nonmetal layer, a structure ( 210 ) formed on the structure. The electrode may further comprise a buffer layer ( 205 ) between the conductive layer and the nonmetal layer.
Abstract:
The present invention discloses an electrode structure for electronic and opto-electronic devices. Such a device comprises a first electrode substantially having a conductive layer (204), a nonmetal layer (206) formed on the conductive layer, a fluorocarbon layer (208) formed on the nonmetal layer, a structure (210) formed on the structure. The electrode may further comprise a buffer layer (205) between the conductive layer and the nonmetal layer.
Abstract:
An electrode for an electro-optical device is provided. Light is passing through this electrode which comprises a pattern of conductive elements. The elements have dimensions small compared to the wavelength of light, so that the electrode appear transparent. The light intensity distribution after having penetrated the electrode compared with the light intensity distribution before having penetrated the electrode is influenced by forward scattering.
Abstract:
The present invention discloses an electrode structure for electronic and op to- electronic devices. Such a device comprises a first electrode substantially having a conductive layer (204), a nonmetal layer (206) formed on the conductive layer, a fluorocarbon layer (208) formed on the nonmetal layer, a structure (210) formed on the structure. The electrode may further comprise a buffer layer (205) between the conductive layer and the nonmetal layer.