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公开(公告)号:FR2376446A1
公开(公告)日:1978-07-28
申请号:FR7736209
申请日:1977-11-24
Applicant: IBM
Inventor: MCGRODDY JAMES C , SCOTT BRUCE A
IPC: H01J17/04 , C23C18/20 , C25D5/02 , G03C1/675 , G03C1/73 , G03C5/58 , G09F9/30 , H01B13/00 , H05K3/10 , H05K3/18 , G03F1/02
Abstract: 1521860 Electro-deposited patterns INTERNATIONAL BUSINESS MACHINES CORP 16 Nov 1977 [30 Dec 1976] 47675/77 Heading C7B Electrically conductive metal films are electrodeposited on a substrate in a predetermined pattern by first photochemically depositing on the substrate an organic #-electron donor halide salt, e.g.: followed by metal electro-deposition, the electrodeposition being accompanied by the simultaneous removal of the organic salt.
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公开(公告)号:CA1160179A
公开(公告)日:1984-01-10
申请号:CA362154
申请日:1980-10-10
Applicant: IBM
Inventor: BRODSKY MARC H , SCOTT BRUCE A
IPC: H01L31/04 , C23C16/06 , C23C16/24 , C23C16/32 , C23C16/34 , C23C16/40 , H01L21/205 , H01L21/314 , H01L21/316 , H01L21/318 , C23C11/00
Abstract: Disilane (Si2H6), trisilane (Si3H8) or a higher order silane is applied in a glow discharge process to rapidly and efficiently form a film of hydrogenated amorphous silicon on a substrate. An inductively coupled RF glow discharge apparatus, a capacitively coupled glow discharge apparatus or a DC glow discharge apparatus may be employed to deposit the amorphous silicon on a conducting or non-conducting substrate. The disilane or higher order silanes may also be combined in a glow discharge process with gases which contain elements such as nitrogen or oxygen to rapidly deposit corresponding compound films. Y0979-068
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公开(公告)号:CA1082817A
公开(公告)日:1980-07-29
申请号:CA292424
申请日:1977-12-05
Applicant: IBM
Inventor: MCGRODDY JAMES C , SCOTT BRUCE A
IPC: H01J17/04 , C23C18/20 , C25D5/02 , G03C1/675 , G03C1/73 , G03C5/58 , G09F9/30 , H01B13/00 , H05K3/10 , H05K3/18 , C25D5/54 , G03G13/22
Abstract: A METHOD OF DEPOSITING METAL CONDUCTING PATTERNS ON LARGE AREA SURFACES A method of depositing conducting patterns on a large area surface is disclosed. The method is characterized by photochemically depositing an electrically conducting organic .pi.-electron donor compound on an insulating surface and selectively depositing a metal onto the established conductive pattern while simultaneously removing the organic film. The method permits the fabrication of continuous fine conducting lines for the production of display devices such as gas panels.
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公开(公告)号:CA1068150A
公开(公告)日:1979-12-18
申请号:CA256032
申请日:1976-06-30
Applicant: IBM
Inventor: ENGLER EDWARD M , KAUFMAN FRANK B , SCOTT BRUCE A
Abstract: Optical printing of highly conductive lines or characters is described, wherein an organic .pi. -electron donor compound, dissolved in a halocarbon, is deposited onto a substrate. The coated substrate is exposed to actinic radiation in a predetermined pattern, and then the halocarbon is removed. The compositions used are of the type (Donor)xn where the donor is typically selected from TTF, TSeF, DSeDTF, and their substituted derivations where x may be selected from F, Br, Cl and I, and n
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公开(公告)号:FR2316628A1
公开(公告)日:1977-01-28
申请号:FR7615015
申请日:1976-05-13
Applicant: IBM
Inventor: ENGLER EDWARD M , KAUFMAN FRANK B , SCOTT BRUCE A
Abstract: A method of optically printing conductive characters using charge transfer compounds is provided. The method is characterized by depositing an organic pi electron donor compound dissolved in a halogenated hydrocarbon (halocarbon) on a suitable substrate and selectively exposing the so coated substrate to actinic radiation to obtain a permanent, highly conductive, image.
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