公开(公告)号：KR20180039743A

公开(公告)日：2018-04-18

申请号：KR20187009582

申请日：2016-08-18

Applicant: KLA TENCOR CORP

Inventor： LEVINSKI VLADIMIR ,  PASKOVER YURI ,  LUBASHEVSKY YUVAL ,  MANASSEN AMNON

IPC: G01N21/47 ,  G01J3/44

CPC classification number: G01B11/272 ,  G01B9/0201 ,  G01N21/4788 ,  G03F7/70633

Abstract: 메트롤로지측정방법및 툴이제공되며, 이는고정된조명원에의해고정된회절타겟을조명하고, 0차회절신호와 1차회절신호의합으로구성된신호를측정하고, 상기회절타겟과상기조명원을고정되게유지하면서상기 0차회절신호와상기 1차회절신호사이의복수의관계에대하여상기측정단계를반복하며, 측정된합으로부터상기 1차회절신호를유도한다. 조명은간섭성일수 있고, 측정은동공평면에있을수 있거나, 조명은비간섭성일수 있고, 측정은필드평면에있을수 있으며, 어느경우이든, 0차및 1차회절차수의부분중첩이측정된다. 조명은환형일수 있으며, 회절타겟은중첩영역을분리하기위해상이한피치를갖는주기적구조를갖는 1(one) 셀 SCOL 타겟일수 있다.

公开(公告)号：SG11201906424WA

公开(公告)日：2019-08-27

申请号：SG11201906424W

申请日：2017-12-15

Applicant: KLA TENCOR CORP

Inventor： ADAM IDO ,  LEVINSKI VLADIMIR ,  MANASSEN AMNON ,  LUBASHEVSKY YUVAL

IPC: H01L21/66 ,  G03F7/20

Abstract: COARSEPITCH COARSE PITCH OFFSET+f j.. 4 HEIGHT 80A- \ CELL 1 868 DIFFRACTION COEFFICIENTS r + AND r - 81 80 86A 81 DIFFRACTION COEFFICIENTS r+ AND r' 82 878 87A 82 1-1 cc N 00 O C (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 16 August 2018 (16.08.2018) WIPO I PCT ill mu °million °nolo DID Ho oimIE (10) International Publication Number WO 2018/147938 Al (51) International Patent Classification: GO3F 7/20 (2006.01) H01L 21/66 (2006.01) (21) International Application Number: PCT/US2017/066853 (22) International Filing Date: 15 December 2017 (15.12.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/457,787 10 February 2017 (10.02.2017) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Dept., One Technology Drive, Milpitas, CA 95035 (US). (72) Inventors: ADAM, Ido; Nehar Hayarden 21, 55450 Qiriat Ono (IL). LEVINSKI, Vladimir; Hermon 9, 23100 Migdal HaEmek (IL). MANASSEN, Amnon; 10 Golda Meir, 34892 Haifa (IL). LUBASHEVSKY, Yuval; 22 Smolen- skin St., 3436606 Haifa (IL). (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corpo- ration, Legal Dept., One Technology Drive, Milpitas, CA 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, (54) Title: MITIGATION OF INACCURACIES RELATED TO GRATING ASYMMETRIES IN SCATTEROMETRY MEASURE- MENTS Figure 1 (57) : Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements. Targets comprise additional cells with sub-resolved structures replacing resolved coarse pitch gratings and/or comprise alternating sub-resolved structures with coarse pitch periodicity - to isolate and remove inaccuracies that result from grating asymmetries. Measurement methods utilize orthogonally polarized illumination to isolate the grating asymmetry effects in different measurement directions, with respect to the designed target structures. [Continued on next page] WO 2018/147938 Al MIDEDIMOMMIONERIOMMIMMIEDIOMMOVOIMIE UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))

公开(公告)号：SG11201900509YA

公开(公告)日：2019-02-27

申请号：SG11201900509Y

申请日：2017-07-28

Applicant: KLA TENCOR CORP

Inventor： HILL ANDY (ANDREW) ,  MANASSEN AMNON ,  PASKOVER YURI ,  LUBASHEVSKY YUVAL

IPC: G01N21/47 ,  G01B11/00 ,  G01N21/95 ,  G02B27/28 ,  G02B27/42

Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.

公开(公告)号：SG10201912512UA

公开(公告)日：2020-02-27

申请号：SG10201912512U

申请日：2017-07-28

Applicant: KLA TENCOR CORP

Inventor： HILL ANDY (ANDREW) ,  MANASSEN AMNON ,  PASKOVER YURI ,  LUBASHEVSKY YUVAL

Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.

公开(公告)号：SG11202006133SA

公开(公告)日：2020-07-29

申请号：SG11202006133S

申请日：2018-10-29

Applicant: KLA TENCOR CORP

Inventor： LUBASHEVSKY YUVAL ,  PASKOVER YURI ,  LEVINSKI VLADIMIR ,  MANASSEN AMNON

IPC: H01L21/66 ,  G03F7/20

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.