公开(公告)号：KR20180026582A

公开(公告)日：2018-03-12

申请号：KR20187006323

申请日：2011-07-28

Applicant: KLA TENCOR CORP

Inventor： KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  COHEN GUY

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70683

Abstract: 촬상기반계측에서사용하기위한다층오버레이타겟이개시된다. 오버레이타겟은 3개이상의타겟구조물을포함한복수의타겟구조물을포함하고, 각타겟구조물은 2개이상의패턴요소들의집합을포함하며, 타겟구조물은타겟구조물의정렬시에공통대칭중심을공유하도록구성되고, 각타겟구조물은공통대칭중심에대한 N도(N도는 180도이상임) 회전에대하여불변체이며, 2개이상의패턴요소는각각개별적인대칭중심을갖고, 각타겟구조물의 2개이상의패턴요소들은각각개별적인대칭중심에대한 M도(M도는 180도이상임) 회전에대하여불변체이다.

Abstract translation: 公开了用于基于成像的度量衡中的多层覆盖目标。 覆盖目标包括多个包括三个或更多个目标结构的目标结构，每个目标结构包括一组两个或更多个模式元素，其中目标结构被配置为在目标结构对齐时共享对称的共同中心，每个 目标结构围绕所述公共对称中心不变为N度旋转，其中N等于或大于180度，其中所述两个或更多个图案元件中的每一个具有单独的对称中心，其中所述两个或更多个图案中的每一个 每个目标结构的元素对于围绕单个对称中心的M度旋转是不变的，其中M等于或大于180度。

公开(公告)号：KR20180039743A

公开(公告)日：2018-04-18

申请号：KR20187009582

申请日：2016-08-18

Applicant: KLA TENCOR CORP

Inventor： LEVINSKI VLADIMIR ,  PASKOVER YURI ,  LUBASHEVSKY YUVAL ,  MANASSEN AMNON

IPC: G01N21/47 ,  G01J3/44

CPC classification number: G01B11/272 ,  G01B9/0201 ,  G01N21/4788 ,  G03F7/70633

Abstract: 메트롤로지측정방법및 툴이제공되며, 이는고정된조명원에의해고정된회절타겟을조명하고, 0차회절신호와 1차회절신호의합으로구성된신호를측정하고, 상기회절타겟과상기조명원을고정되게유지하면서상기 0차회절신호와상기 1차회절신호사이의복수의관계에대하여상기측정단계를반복하며, 측정된합으로부터상기 1차회절신호를유도한다. 조명은간섭성일수 있고, 측정은동공평면에있을수 있거나, 조명은비간섭성일수 있고, 측정은필드평면에있을수 있으며, 어느경우이든, 0차및 1차회절차수의부분중첩이측정된다. 조명은환형일수 있으며, 회절타겟은중첩영역을분리하기위해상이한피치를갖는주기적구조를갖는 1(one) 셀 SCOL 타겟일수 있다.

公开(公告)号：SG11201906424WA

公开(公告)日：2019-08-27

申请号：SG11201906424W

申请日：2017-12-15

Applicant: KLA TENCOR CORP

Inventor： ADAM IDO ,  LEVINSKI VLADIMIR ,  MANASSEN AMNON ,  LUBASHEVSKY YUVAL

IPC: H01L21/66 ,  G03F7/20

Abstract: COARSEPITCH COARSE PITCH OFFSET+f j.. 4 HEIGHT 80A- \ CELL 1 868 DIFFRACTION COEFFICIENTS r + AND r - 81 80 86A 81 DIFFRACTION COEFFICIENTS r+ AND r' 82 878 87A 82 1-1 cc N 00 O C (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 16 August 2018 (16.08.2018) WIPO I PCT ill mu °million °nolo DID Ho oimIE (10) International Publication Number WO 2018/147938 Al (51) International Patent Classification: GO3F 7/20 (2006.01) H01L 21/66 (2006.01) (21) International Application Number: PCT/US2017/066853 (22) International Filing Date: 15 December 2017 (15.12.2017) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/457,787 10 February 2017 (10.02.2017) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Dept., One Technology Drive, Milpitas, CA 95035 (US). (72) Inventors: ADAM, Ido; Nehar Hayarden 21, 55450 Qiriat Ono (IL). LEVINSKI, Vladimir; Hermon 9, 23100 Migdal HaEmek (IL). MANASSEN, Amnon; 10 Golda Meir, 34892 Haifa (IL). LUBASHEVSKY, Yuval; 22 Smolen- skin St., 3436606 Haifa (IL). (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corpo- ration, Legal Dept., One Technology Drive, Milpitas, CA 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, (54) Title: MITIGATION OF INACCURACIES RELATED TO GRATING ASYMMETRIES IN SCATTEROMETRY MEASURE- MENTS Figure 1 (57) : Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements. Targets comprise additional cells with sub-resolved structures replacing resolved coarse pitch gratings and/or comprise alternating sub-resolved structures with coarse pitch periodicity - to isolate and remove inaccuracies that result from grating asymmetries. Measurement methods utilize orthogonally polarized illumination to isolate the grating asymmetry effects in different measurement directions, with respect to the designed target structures. [Continued on next page] WO 2018/147938 Al MIDEDIMOMMIONERIOMMIMMIEDIOMMOVOIMIE UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))

公开(公告)号：SG11201900996VA

公开(公告)日：2019-04-29

申请号：SG11201900996V

申请日：2017-07-10

Applicant: KLA TENCOR CORP

Inventor： PASKOVER YURI ,  MANASSEN AMNON ,  LEVINSKI VLADIMIR

IPC: G01B11/02 ,  G01B9/02

Abstract: Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal between reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features.

公开(公告)号：SG11202100991PA

公开(公告)日：2021-03-30

申请号：SG11202100991P

申请日：2018-12-14

Applicant: KLA TENCOR CORP

Inventor： YONI SHALIBO ,  PASKOVER YURI ,  LEVINSKI VLADIMIR ,  MANASSEN AMNON ,  EISANBACH SHLOMO ,  LAREDO GILAD ,  HILDESHEIM ARIEL

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/952 ,  G02B7/38

Abstract: Metrology methods and tools are provided, which enhance the accuracy of the measurements and enable simplification of the measurement process as well as improving the correspondence between the metrology targets and the semiconductor devices. Methods comprise illuminating the target in a Littrow configuration to yield a first measurement signal comprising a −1st diffraction order and a 0th diffraction order and a second measurement signal comprising a +1st distraction order and a 0th diffraction order, wherein the −1st diffraction order of the first measurement signal and the +1st diffraction order of the second measurement signal are diffracted at 180° to a direction of the illumination, performing a first measurement of the first measurement signal and a second measurement of the second measurement signal, and deriving metrology metric(s) therefrom. Optionally, a reflected 0th diffraction order may be split to yield components which interact with the −1st and +1st diffraction orders.

公开(公告)号：SG11201907074RA

公开(公告)日：2019-09-27

申请号：SG11201907074R

申请日：2018-02-27

Applicant: KLA TENCOR CORP

Inventor： GUREVICH EVGENI ,  ADEL MICHAEL E ,  GRONHEID ROEL ,  FELER YOEL ,  LEVINSKI VLADIMIR ,  KLEIN DANA ,  AHARON SHARON

IPC: H01L21/66

Abstract: 1 N 1-1 O O 1-1 00 O N C (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 07 September 2018 (07.09.2018) WIP0 I PCT IiiimmoinionotiolomomioollmiooliolomovoimIE (10) International Publication Number WO 2018/160502 Al A (51) International Patent Classification: HO1L 21/66 (2006.01) (21) International Application Number: PCT/US2018/019793 (22) International Filing Date: 27 February 2018 (27.02.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/464,382 28 February 2017 (28.02.2017) US 62/591,104 27 November 2017 (27.11.2017) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Department, One Technology Drive, Milpitas, Cali- fornia 95035 (US). (72) Inventors: GUREVICH, Evgeni; Hardufim Str. 12/7, 2063212 Yokneam Illit (IL). ADEL, Michael E.; 14 Yi- gal Alon Street, 30900 Ya'akov Zichron (IL). GRON- HEID, Roel; Sint Jansbergsesteenweg 83, 3001 Leuven (BE). FELER, Yoel; Derech Yad LeBanim 82/2, 32163 Haifa (IL). LEVINSKI, Vladimir; Hermon 9, 23100 Migdal HaEmek (IL). KLEIN, Dana; Alexander Yanai 23, Carmeliya, 34816 Haifa (IL). AHARON, Sharon; Yuval 40, 1796000 Hanaton (IL). (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corp., Legal Department, One Technology Drive, Milpitas, Cali- fornia 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, (54) Title: DETERMINING THE IMPACTS OF STOCHASTIC BEHAVIOR ON OVERLAY METROLOGY DATA MEASUREMENT MODEL CPE EIHO—W3F1

公开(公告)号：SG11202006133SA

公开(公告)日：2020-07-29

申请号：SG11202006133S

申请日：2018-10-29

Applicant: KLA TENCOR CORP

Inventor： LUBASHEVSKY YUVAL ,  PASKOVER YURI ,  LEVINSKI VLADIMIR ,  MANASSEN AMNON

IPC: H01L21/66 ,  G03F7/20

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：SG11201907747XA

公开(公告)日：2019-10-30

申请号：SG11201907747X

申请日：2018-03-28

Applicant: KLA TENCOR CORP

Inventor： MANASSEN AMNON ,  NEGRI DARIA ,  HILL ANDREW V ,  BACHAR OHAD ,  LEVINSKI VLADIMIR ,  PASKOVER YURI

IPC: H01L21/66

Abstract: PUBLISHEDUNDER THE PATENT COOPERATION TREATY (PCT) IiiimmomiolollmonolomolmomEmmomoun () International Publication Number WO 2018/187108 Al WIPO I PCT (12) INTERNATIONAL APPLICATION (19) World Intellectual Property Organization International Bureau (43) International Publication Date 11 October 2018 (11.10.2018) (51) International Patent Classification: HO1L 21/66 (2006.01) (21) International Application Number: PCT/US2018/024702 (22) International Filing Date: 28 March 2018 (28.03.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/481,685 05 April 2017 (05.04.2017) US 15/608,766 30 May 2017 (30.05.2017) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Department, One Technology Drive, Milpitas, Cali- fornia 95035 (US). (72) Inventors: MANASSEN, Amnon; 10 Golda Meir Street, 34892 Haifa (IL). NEGRI, Dania; Ha'Alon Street 38/1, 36811 Nesher (IL). HILL, Andrew V.; 2112 Los Ange- les Avenue, Berkeley, California 94707 (US). BACHAR, Ohad; 29 He'elah Street, 36576 Timrat (IL). LEV- INSKI, Vladimir; Hermon 9, 23100 Migdal HaEmek (IL). PASKOVER, Yuri; 32A Seora Str, 30560 Binyamina (IL). (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corp., Legal Department, One Technology Drive, Milpitas, Cali- fornia 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, (54) Title: SYSTEMS AND METHODS FOR METROLOGY WITH LAYER-SPECIFIC ILLUMINATION SPECTRA 126 CONTROLLER 128 PROCESSORS 130 MEMORY 100 122 108 40111111111110- 104 —120 102 n 124 114 V 112 110 106 116 1-1 cc O N cc 00 O O FIG.1 (57) : A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumi- nation device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers. [Continued on next page] WO 2018/187108 Al MIDEDIMOMOIDEIREEMOMOHOMOIDIMMIOMMIS MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))

公开(公告)号：SG11202103847QA

公开(公告)日：2021-05-28

申请号：SG11202103847Q

申请日：2018-10-30

Applicant: KLA TENCOR CORP

Inventor： FELER YOEL ,  LEVINSKI VLADIMIR

IPC: G03F7/20 ,  H01L21/66

Abstract: Metrology targets, target design methods and menology measurement methods are provided, which estimate the effects of asymmetric aberrations, independently or in conjunction with metrology overlay estimations. Targets comprise one or more pairs of segmented periodic structures having a same coarse pitch, a same 1:1 line to space ratio and segmented into fine elements at a same fine pitch, wherein the segmented periodic structures differ from each other in that one thereof lacks at least one of its corresponding fine elements and/or in that one thereof comprises two groups of the fine elements which are separated from each other by a multiple of the fine pitch. The missing element(s) and/or central gap enable deriving the estimation of aberration effects from measurements of the corresponding segmented periodic structures. The fine pitches may be selected to correspond to the device fine pitches in the corresponding layer.

公开(公告)号：SG10201912818WA

公开(公告)日：2020-02-27

申请号：SG10201912818W

申请日：2016-05-19

Applicant: KLA TENCOR CORP

Inventor： LEVINSKI VLADIMIR ,  PASKOVER YURI ,  MANASSEN AMNON ,  SHALIBO YONI

Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.