公开(公告)号：JPH0864519A

公开(公告)日：1996-03-08

申请号：JP31386094

申请日：1994-12-16

Applicant: KOREA ELECTRONICS TELECOMM

Inventor： BOKU HEIZEN ,  GO YOUKO ,  SAI SOUSHIYU ,  YU KEISHIYUN

IPC: G03F1/20 ,  G03F1/54 ,  G03F1/70 ,  G03F1/80 ,  H01L21/027 ,  H01L21/28 ,  H01L21/338 ,  H01L29/812 ,  G03F1/08

Abstract: PURPOSE: To provide a resist pattern for forming a T-shaped gate and a producing method therefor, with which reproducibility in processes can be secured, and time and costs for forming the gate can be saved. CONSTITUTION: A resist pattern is composed of a transparent mask pattern 1 for forming a pattern at the leg section of electrode on the T-shaped gate and semitransparent mask patterns 3 and 3a for forming the head section of electrode on the T-shaped gate adjacently to that pattern 1. The semitransparent mask pattern is formed from a chrome layer or the like but, when this is formed from the chrome layer, it is formed thinner than the thickness of non-transparent mask patterns 2 and 2a so as to have low light transmissivity.

公开(公告)号：JPH0635172A

公开(公告)日：1994-02-10

申请号：JP12390793

申请日：1993-05-26

Applicant: KOREA ELECTRONICS TELECOMM

Inventor： GO YOUKO ,  ZEN EICHIN ,  KURUMA SAIGEN ,  KIN TAKASHIGE

IPC: G03F1/00 ,  G03F1/68 ,  G03F7/20 ,  H01L21/027 ,  G03F1/08

Abstract: PURPOSE: To improve the resolution and the focal depth by improving the property of light made incident on a main mask (or passing the main mask), namely, the angle of incidence (or the angle of transmission) of light and the distribution based on this angle in the mask level other than the exposure equipment level. CONSTITUTION: A mask is provided which has dummy diffraction layers 20 and 20a used as an auxiliary with a main mask at in executing a lithography process with a light exposure equipment. When the exposure equipment using deformation illumination and a super-resolution filter is used, these dummy diffraction layers 20 and 20a are used as an aid together with the main mask 10 and are constituted into a minute repeat pattern where an image is not transmitted to a wafer.