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公开(公告)号:JP2006186381A
公开(公告)日:2006-07-13
申请号:JP2006000173
申请日:2006-01-04
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
IPC: B24B37/00 , H01L21/304 , B24D3/00 , B24D3/28 , C01F7/44 , C09G1/02 , C09K3/14 , H01L21/321
Abstract: PROBLEM TO BE SOLVED: To provide a CMP process and products thereof which can reduce dishing by removing metal selectively and relatively slowly. SOLUTION: In this CMP process and products thereof, alumina is used including α-alumina particles with a particle size of less than 50 nm and a surface area of at least 50 m 2 /g. COPYRIGHT: (C)2006,JPO&NCIPI
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公开(公告)号:JP2002038132A
公开(公告)日:2002-02-06
申请号:JP2001135915
申请日:2001-05-07
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K
IPC: C04B38/06 , C01F7/02 , C01F7/44 , C04B35/111 , C09K3/14
Abstract: PROBLEM TO BE SOLVED: To provide an α-alumina abrasive grain suitable for the grinding under medium to low pressure. SOLUTION: The α-alumina grain particle has a crystal size smaller than 5 μm, essentially all alumina grain has α-form, the density of the grain is 3.6-3.9 g/cc, the grain diameter is 0.1-5 μm and the grain contains randomly distributed essentially spherical voids.
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公开(公告)号:CA2344980C
公开(公告)日:2006-06-27
申请号:CA2344980
申请日:2001-04-25
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K
IPC: C04B38/06 , C09K3/14 , C01F7/02 , C01F7/44 , C04B35/111
Abstract: Alpha alumina abrasive grits which are particularly well-suited to medium to low pressure grinding applications wherein the grits comprise uniformly dispersed microvoids.
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公开(公告)号:DE60001958T2
公开(公告)日:2004-03-04
申请号:DE60001958
申请日:2000-06-06
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , KHAUND ARUP
IPC: B24B37/00 , C01F17/00 , C09K3/14 , H01L21/304 , H01L21/306
Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.
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公开(公告)号:AU752038B2
公开(公告)日:2002-09-05
申请号:AU5464700
申请日:2000-06-06
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , KHAUND ARUP
IPC: B24B37/00 , C01F17/00 , C09K3/14 , H01L21/304 , H01L21/306
Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.
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公开(公告)号:CA2383504A1
公开(公告)日:2001-04-26
申请号:CA2383504
申请日:2000-08-30
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , DELANEY WILLIAM R , TANIKELLA BRAHMANANDAM V
Abstract: Abrasive materials comprising silica-coated transitional alumina particles with an average particle size of less than 50 nanometers and a BET surface area of at least 50 m2/gm are useful in CMP processes either in the form of slurries or as fixed abrasives.
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公开(公告)号:DE10121656B4
公开(公告)日:2012-08-02
申请号:DE10121656
申请日:2001-05-03
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K
IPC: C01F7/02 , C04B38/06 , C01F7/44 , C04B35/111 , C09K3/14
Abstract: Verfahren für die Herstellung von Alpha-Aluminiumoxid Schleifkörnern, welches umfaßt: a) Bilden einer wäßrigen Dispersion einer Alpha-Aluminiumoxid-Vorstufe; Bilden eines Gels; b) gleichmäßiges Verteilen von Poren bildenden Teilchen in dem Gel; trocknen und brennen des Gels, um die Alpha-Aluminiumoxid-Vorstufe in ein poröses Alpha-Aluminiumoxid zu überführen, wobei die Poren bildenden Teilchen derart ausgewählt sind, daß das Alpha-Aluminiumoxid gleichmäßig darin verteilte, im Wesentlichen kugelförmige Mikro-Poren mit Durchmessern von 0,1 bis 5 Mikrometern sowie eine Dichte von 3,6 bis 3,9 g/m3 aufweist; und c) Bilden von Schleifkörnern in einem gewünschten Größenbereich.
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公开(公告)号:HK1050913A1
公开(公告)日:2003-07-11
申请号:HK03103083
申请日:2003-04-30
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
IPC: B24B37/00 , C01F7/44 , C09G20090101 , C09G1/02 , C09K20090101 , C09K3/14 , H01L20090101 , H01L21/304 , H01L21/321
Abstract: CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
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公开(公告)号:AU754060B2
公开(公告)日:2002-10-31
申请号:AU7090200
申请日:2000-08-30
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
IPC: B24B37/00 , C01F7/44 , C09G1/02 , C09K3/14 , H01L21/304 , H01L21/321
Abstract: CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
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公开(公告)号:DE10121656A1
公开(公告)日:2001-11-22
申请号:DE10121656
申请日:2001-05-03
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K
IPC: C04B38/06 , C01F7/02 , C01F7/44 , C04B35/111 , C09K3/14
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