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公开(公告)号:JP2006186381A
公开(公告)日:2006-07-13
申请号:JP2006000173
申请日:2006-01-04
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
IPC: B24B37/00 , H01L21/304 , B24D3/00 , B24D3/28 , C01F7/44 , C09G1/02 , C09K3/14 , H01L21/321
Abstract: PROBLEM TO BE SOLVED: To provide a CMP process and products thereof which can reduce dishing by removing metal selectively and relatively slowly. SOLUTION: In this CMP process and products thereof, alumina is used including α-alumina particles with a particle size of less than 50 nm and a surface area of at least 50 m 2 /g. COPYRIGHT: (C)2006,JPO&NCIPI
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公开(公告)号:CA2383504A1
公开(公告)日:2001-04-26
申请号:CA2383504
申请日:2000-08-30
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , DELANEY WILLIAM R , TANIKELLA BRAHMANANDAM V
Abstract: Abrasive materials comprising silica-coated transitional alumina particles with an average particle size of less than 50 nanometers and a BET surface area of at least 50 m2/gm are useful in CMP processes either in the form of slurries or as fixed abrasives.
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公开(公告)号:HK1050913A1
公开(公告)日:2003-07-11
申请号:HK03103083
申请日:2003-04-30
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
IPC: B24B37/00 , C01F7/44 , C09G20090101 , C09G1/02 , C09K20090101 , C09K3/14 , H01L20090101 , H01L21/304 , H01L21/321
Abstract: CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
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公开(公告)号:AU754060B2
公开(公告)日:2002-10-31
申请号:AU7090200
申请日:2000-08-30
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
IPC: B24B37/00 , C01F7/44 , C09G1/02 , C09K3/14 , H01L21/304 , H01L21/321
Abstract: CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
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公开(公告)号:BR0014755A
公开(公告)日:2002-09-24
申请号:BR0014755
申请日:2000-08-30
Applicant: SAINT GOBAIN CERAMICS E PLASTI
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
Abstract: Abrasive materials comprising silica-coated transitional alumina particles with an average particle size of less than 50 nanometers and a BET surface area of at least 50 m2/gm are useful in CMP processes either in the form of slurries or as fixed abrasives.
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公开(公告)号:AU7090200A
公开(公告)日:2001-05-10
申请号:AU7090200
申请日:2000-08-30
Applicant: SAINT GOBAIN CERAMICS AND PLASTICS INC
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
IPC: B24B37/00 , C01F7/44 , C09G1/02 , C09K3/14 , H01L21/304 , H01L21/321
Abstract: CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
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7.
公开(公告)号:CA2382724C
公开(公告)日:2006-01-24
申请号:CA2382724
申请日:2000-08-30
Applicant: SAINT GOBAIN CERAMICS
Inventor: TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R , GARG AJAY K
IPC: B24B37/00 , C09K3/14 , C01F7/44 , C09G1/02 , H01L21/304 , H01L21/321
Abstract: CMP processes and products employ aluminas comprising alpha alumina particle s having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
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公开(公告)号:ZA200201091B
公开(公告)日:2003-07-30
申请号:ZA200201091
申请日:2002-02-07
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
IPC: C01F7/44 , C09G1/02 , C09K3/14 , B24B37/00 , H01L21/304 , H01L21/321 , C09K , C09G , H01L
Abstract: CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
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公开(公告)号:AU754328B2
公开(公告)日:2002-11-14
申请号:AU7090000
申请日:2000-08-30
Applicant: SAINT GOBAIN CERAMICS
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM V , DELANEY WILLIAM R
Abstract: Abrasive materials comprising silica-coated transitional alumina particles with an average particle size of less than 50 nanometers and a BET surface area of at least 50 m2/gm are useful in CMP processes either in the form of slurries or as fixed abrasives.
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公开(公告)号:BR0014533A
公开(公告)日:2002-06-04
申请号:BR0014533
申请日:2000-08-30
Applicant: SAINT GOBAIN CERAMICS E PLASTI
Inventor: GARG AJAY K , TANIKELLA BRAHMANANDAM , DELANEY WILLIAM R
IPC: B24B37/00 , C01F7/44 , C09G1/02 , C09K3/14 , H01L21/304 , H01L21/321
Abstract: CMP processes and products employ aluminas comprising alpha alumina particles having a particle width of less than 50 nanometers and a surface area of at least 50 m2/gm.
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