公开(公告)号：AU5464700A

公开(公告)日：2001-01-02

申请号：AU5464700

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS AND PLASTICS INC

Inventor： GARG AJAY K ,  TANIKELLA BRAHMANANDAM V ,  KHAUND ARUP

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

公开(公告)号：BR0012290A

公开(公告)日：2002-04-16

申请号：BR0012290

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS

Inventor： GARG AJAY K ,  TANIKELLA BRAHMANANDAM V ,  KHAUND ARUP

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

公开(公告)号：CA2374373C

公开(公告)日：2005-04-05

申请号：CA2374373

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS

Inventor： GARG AJAY K ,  KHAUND ARUP ,  TANIKELLA BRAHMANANDAM V

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano- chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

公开(公告)号：DE60001958T2

公开(公告)日：2004-03-04

申请号：DE60001958

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS

Inventor： GARG AJAY K ,  TANIKELLA BRAHMANANDAM V ,  KHAUND ARUP

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

公开(公告)号：AU752038B2

公开(公告)日：2002-09-05

申请号：AU5464700

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS

Inventor： GARG AJAY K ,  TANIKELLA BRAHMANANDAM V ,  KHAUND ARUP

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

公开(公告)号：DE60001958D1

公开(公告)日：2003-05-08

申请号：DE60001958

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS

Inventor： GARG AJAY K ,  TANIKELLA BRAHMANANDAM V ,  KHAUND ARUP

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.

公开(公告)号：CA2374373A1

公开(公告)日：2000-12-21

申请号：CA2374373

申请日：2000-06-06

Applicant: SAINT GOBAIN CERAMICS

Inventor： KHAUND ARUP ,  TANIKELLA BRAHMANANDAM V ,  GARG AJAY K

IPC: B24B37/00 ,  C01F17/00 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

Abstract: A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m2/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano- chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.