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    MICROSCOPIC SCALE FORMING METHOD BY SELECTIVE ETCHING OF A DOPED SUBSTRATE
    1.
    发明申请
    MICROSCOPIC SCALE FORMING METHOD BY SELECTIVE ETCHING OF A DOPED SUBSTRATE 审中-公开
    通过选择性蚀刻掺杂衬底的显微成像方法

    公开(公告)号：WO0132554A3

    公开(公告)日：2001-11-01

    申请号：PCT/US0041815

    申请日：2000-11-02

    Applicant: STANDARD MEMS INC

    Inventor： FRICANO GLENN J ,  LIZZA MARK ,  PUMO THOMAS A ,  TRIMMER WILLIAM S

    IPC: B81B1/00 ,  B81C1/00

    CPC classification number: B81C1/00119 ,  B81B2201/055 ,  B81B2203/0353 ,  B81C1/00595 ,  B81C2201/0173

    Abstract: A method for forming microscopic scale structures by selective etching of a doped substrate is disclosed. A substrate is prepared for etching by forming relatively deep doped substrate regions with substantially faster dissolution rates in selected etchants than the surrounding pure substrate. The doped regions are defined by depositing the dopants on the substrate using a lithographic process. Doped regions with high aspect ratios are produced by thermomigrating the deposited metal into the substrate. The substrate is then etched in an etchant that selectively removes the doped regions, while leaving the surrounding pure substrate essentially unetched. Thus, the doped region can be used to define a high aspect ratio feature, such as a microtubulc or micro-channel. Additionally, methods for forming more complex structures by depositing a variety of different dopants in a pattern on a substrate are disclosed. Combinations of the foregoing selective doping methods with a mask-and-etch process are further disclosed, useful for making structures such as a microscopic needle having a central microtubule for injecting fluids.

    Abstract translation: 公开了一种通过选择性蚀刻掺杂衬底形成微观尺度结构的方法。 通过在选择的蚀刻剂中形成比周围的纯基底具有明显更快的溶解速率的相对深的掺杂基底区域来准备用于蚀刻的基底以进行蚀刻。 通过使用光刻工艺将掺杂剂沉积在衬底上来限定掺杂区域。 具有高纵横比的掺杂区域通过将沉积的金属热沉积到衬底中而产生。 然后在选择性去除掺杂区域的蚀刻剂中蚀刻衬底，同时使周围的纯衬底基本上未被蚀刻。 因此，掺杂区域可以用于定义高纵横比特征，例如微管或微通道。 另外，公开了通过在衬底上以图案沉积多种不同掺杂剂来形成更复杂结构的方法。 进一步公开了前述选择性掺杂方法与掩模 - 蚀刻工艺的组合，其可用于制造诸如具有用于注射流体的中央微管的微观针的结构。

    METHOD FOR ALIGNING OPTICAL COMPONENTS
    2.
    发明申请
    METHOD FOR ALIGNING OPTICAL COMPONENTS 审中-公开
    对准光学元件的方法

    公开(公告)号：WO0181961A3

    公开(公告)日：2003-08-21

    申请号：PCT/US0113211

    申请日：2001-04-25

    Applicant: STANDARD MEMS INC ,  TRIMMER WILLIAM ,  FRICANO GLENN J

    Inventor： TRIMMER WILLIAM ,  FRICANO GLENN J

    IPC: G02B6/32 ,  G02B6/35 ,  G02B6/42 ,  G02B6/255 ,  G01B11/27 ,  G02B6/30

    CPC classification number: G02B6/3588 ,  G02B6/32 ,  G02B6/3512 ,  G02B6/3546 ,  G02B6/3556 ,  G02B6/4224 ,  G02B6/4225

    Abstract: In a fiber optic system, a method for aligning an incoming beam of light (13) and a target fiber (3) that does not use light travelling down the core of the fiber to make adjustments to the relative positions of the beam of light and the fiber. According to the method of the invention, cladding mounted light detectors (23) detect light in the cladding as the beam of light sweeps across the fiber, and a miminum amount of light detected in the cladding is established during the course of the sweeps. The relative positions of the beam of light and the fiber are then adjusted so that the light detected in the cladding corresponds to the minimum detected during the sweeps.

    Abstract translation: 在光纤系统中，用于对准入射光束（13）和目标光纤（3）的方法，该方法不使用沿着光纤芯线行进的光线来调整光束的相对位置， 纤维。 根据本发明的方法，随着光束扫过光纤，包层安装的光检测器（23）检测包层中的光，并且在扫描过程中建立了在包层中检测到的一定量的光。 然后调整光束和光纤的相对位置，使得在包层中检测的光对应于扫描期间检测到的最小值。

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