公开(公告)号：WO2006015254A2

公开(公告)日：2006-02-09

申请号：PCT/US2005/027072

申请日：2005-07-29

Applicant: KLA TENCOR TECHNOLOGIES CORPORATION ,  AALUND, Martin, P. ,  APPELBAUM, Ami

Inventor： AALUND, Martin, P. ,  APPELBAUM, Ami

IPC: H01L21/677

CPC classification number: H01L21/67775

Abstract: Apparatus and method for reducing the load on an automated material handling system during processing of materials are disclosed. A materials processing tool with one or more load ports is equipped with at least one movable buffer attached to the tool front end. The buffer is configured to receive a materials pod from the automated material handling system at a storage location and move the pod to one or more of the one or more of the load ports and/or receive a pod from one or more of the one or more load ports and move the pod to the storage location. Any pod in the buffer is accessible either manually or by the material handling system.

Abstract translation: 公开了用于在材料处理期间减少自动化材料处理系统的负载的装置和方法。 具有一个或多个装载端口的材料处理工具配备有至少一个附接到工具前端的可移动缓冲器。 缓冲器被配置为从存储位置处的自动化材料处理系统接收材料盒，并且将盒移动到一个或多个装载端口中的一个或多个并且/或从一个或多个负载端口接收盒 更多的负载端口，并将pod移动到存储位置。 缓冲区中的任何pod可以手动访问或通过物料搬运系统访问。

公开(公告)号：WO2005114697A2

公开(公告)日：2005-12-01

申请号：PCT/US2005/017844

申请日：2005-05-19

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHUANG, Yung-Ho ,  ARMSTRONG, Joseph, J. ,  BROWN, David, Lee ,  TSAI, Bin-Ming, Benjamin

Inventor： CHUANG, Yung-Ho ,  ARMSTRONG, Joseph, J. ,  BROWN, David, Lee ,  TSAI, Bin-Ming, Benjamin

IPC: H01J40/14

CPC classification number: H01L27/14625 ,  H04N5/3559 ,  H04N5/357

Abstract: A variable modulated transfer function (MTF) design employing a variable gate voltage source for use in inspecting specimens is disclosed. The design applies a variable gate voltage to each pixel of a sensor, wherein applying the variable gate voltage to each pixel adjusts the MTF of the pixel. MTF adjustment improves adverse effects encountered during inspection, such as abasing and maintaining contrast.

Abstract translation: 公开了一种使用可变栅极电压源的可变调制传递函数（MTF）设计，用于检查样本。 该设计将可变栅极电压施加到传感器的每个像素，其中将可变栅极电压施加到每个像素来调整像素的MTF。 MTF调整改善了检查过程中遇到的不良影响，例如减轻和维持对比度。

公开(公告)号：WO2005073807A1

公开(公告)日：2005-08-11

申请号：PCT/US2005/002955

申请日：2005-01-31

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  SAIDIN, Zain, K. ,  XIONG, Yalin ,  GLASSER, Lance ,  HESS, Carl ,  PREIL, Moshe, E.

Inventor： SAIDIN, Zain, K. ,  XIONG, Yalin ,  GLASSER, Lance ,  HESS, Carl ,  PREIL, Moshe, E.

IPC: G03F1/00

CPC classification number: G03F1/84 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70533 ,  G03F7/70616 ,  G03F7/7065 ,  G03F7/70666 ,  G06Q30/0206

Abstract: Computer-implemented methods for detecting defects in reticle design data are provided. One method includes generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process. The method also includes generating second simulated images using the first simulated image. The second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process. The method further includes detecting defects in the reticle design data using the second simulated images. Another method includes the generating steps described above in addition to determining a rate of change in a characteristic of the second simulated images as a function of the different values. This method also includes detecting defects in the reticle design data based on the rate of change.

Abstract translation: 提供了用于检测标线设计数据缺陷的计算机实现方法。 一种方法包括生成第一模拟图像，其示出如何使用标线制造工艺将掩模版设计数据印刷在掩模版上。 该方法还包括使用第一模拟图像产生第二模拟图像。 第二模拟图像示出了在晶片印刷过程的一个或多个参数的不同值下如何将掩模版印刷在晶片上。 该方法还包括使用第二模拟图像检测掩模版设计数据中的缺陷。 除了确定作为不同值的函数的第二模拟图像的特性的变化率之外，另一种方法包括上述生成步骤。 该方法还包括基于变化率检测掩模版设计数据中的缺陷。

公开(公告)号：WO2005065246A2

公开(公告)日：2005-07-21

申请号：PCT/US2004/043129

申请日：2004-12-17

Applicant: KLA- TENCOR TECHNOLOGIES CORPORATION ,  VAEZ-IRAVANI, Mehdi ,  ZHAO, Guoheng ,  STOWKOWSKI, Stanley E.

Inventor： VAEZ-IRAVANI, Mehdi ,  ZHAO, Guoheng ,  STOWKOWSKI, Stanley E.

IPC: G02B6/00 ,  G02B6/04 ,  G02B6/32 ,  G02B27/48

CPC classification number: G02B27/48 ,  G02B6/0001 ,  G02B6/04

Abstract: Disclosed are apparatus and methods for illuminating a sample, e.g. , during an inspection of such sample for defects. In one aspect, the illumination apparatus includes a bundle of fibers that each have a first end and a second end. The illumination apparatus further includes an illumination selector for selectively transmitting one or more incident beams into one or more corresponding first ends of the optical fibers so that the selected one or more incident beams are output from one or more corresponding second ends of the fibers. The illumination apparatus also includes a lens arrangement for receiving the selected one or more incidents beams output from the corresponding one or more second ends of the fibers and directing the selected one or more incident beams towards the sample. The lens arrangement and the fibers are arranged with respect to each other so as to image an imaging plane of the sample at the second ends of the fibers. In one aspect, the incident beams are laser beams. In a specific application of the invention, the sample is selected from a group consisting of a semiconductor device, a semiconductor wafer, and a semiconductor reticle.

Abstract translation: 公开了用于照亮样品的装置和方法，例如在检查这种样品的缺陷时。 一方面，照明装置包括一束纤维，每束纤维具有第一端和第二端。 照明装置还包括照明选择器，用于选择性地将一个或多个入射光束传输到光纤的一个或多个对应的第一端中，使得所选择的一个或多个入射光束从光纤的一个或多个对应的第二端输出。 照明设备还包括透镜装置，用于接收从光纤的对应的一个或多个第二端输出的所选择的一个或多个事件光束，并将所选择的一个或多个入射光束引向样品。 透镜布置和光纤相对于彼此布置，以便在纤维的第二端成像样品的成像平面。 一方面，入射光束是激光束。 在本发明的具体应用中，样品选自半导体器件，半导体晶片和半导体掩模版。

公开(公告)号：WO2005026782A3

公开(公告)日：2005-03-24

申请号：PCT/US2004/021691

申请日：2004-07-06

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHUANG, Yung-Ho ,  ARMSTRONG, Joseph, J. ,  SHAFER, David.R.

Inventor： CHUANG, Yung-Ho ,  ARMSTRONG, Joseph, J. ,  SHAFER, David.R.

IPC: G02B17/00

Abstract: A system for use with a reduced size catadioptric objective is disclosed. The system including the reduced size objective includes various subsystemts to allow enhanced imaging, the subsystems including illumination, imaging, autofocus, positioning, sensor, data acquisition, and data analysis. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanomenters through the infrared range, and eleements of the objective are less than 100 mm in diameter. The objective comprises a focusing lens group (1607) and at least one field lens (1605) oriented to receive focused light energy from the focusing lens group (1607) and provide intermediate light energy. The objective also includes a Mangin mirror arrangement (1601). The design imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90 to a specimen for imaging purposes, and the design may be employed in various environments.

公开(公告)号：WO2004077104A2

公开(公告)日：2004-09-10

申请号：PCT/US2004/005038

申请日：2004-02-20

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： SHAFER, David, R. ,  CHUANG, Yung-Ho ,  ARMSTRONG, J., Joseph

IPC: G02B

CPC classification number: G02B17/0892 ,  G02B17/0812 ,  G02B17/0856 ,  G02B21/04 ,  G03F7/70225 ,  G03F7/70341

Abstract: A reduced size catadioptric objective and system is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range. Elements are less than 100 mm in diameter. The objective comprises a focusing lens group configured to receive the light energy and comprising at least one focusing lens. The objective further comprises at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement positioned to receive the intermediate light energy from the field lens and form controlled light energy for transmission to a specimen. The Mangin mirror arrangement imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90, and the design may be employed in various environments.

Abstract translation: 公开了一种减小尺寸的反射折射物镜和系统。 该目的可以通过红外光范围具有在约190纳米范围内的波长的光能。 元件的直径小于100毫米。 该目的包括被配置为接收光能并且包括至少一个聚焦透镜的聚焦透镜组。 该目的还包括至少一个取向为从聚焦透镜组接收聚焦光能并提供中间光能的场透镜。 该目的还包括Mangin镜布置，其定位成从场透镜接收中间光能并形成受控的光能以传输到样本。 芒格镜配置赋予数值孔径超过0.65并且高达约0.90的受控光能，并且该设计可以用于各种环境中。

公开(公告)号：WO2004051220A2

公开(公告)日：2004-06-17

申请号：PCT/US2003/037937

申请日：2003-11-25

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： STOKOWSKI, Stan ,  SAIDIN, Zain, K.

IPC: G01N

CPC classification number: G01M11/0264 ,  G01N21/95607

Abstract: Disclosed are methods and apparatus for altering the phase and/or amplitude of an optical beam within an inspection system (100, 200, 300) using one or more spatial light modulator(s) (SLMs) (108, 112, 122, 212, 220, 230, 312, 332, 320). In one embodiment, an apparatus for optically inspecting a sample with an optical beam is disclosed. The apparatus includes a beam generator (102, 202) for directing an incident optical beam onto the sample whereby at least a first portion of the incident optical beam is directed from the sample (118) as an output beam and a detector (126, 234, 336) positioned to receive at least a portion of the output beam. The detector is also operable to generate an output signal based on the output beam. The apparatus further includes one or more imaging optics (e.g., 224, 228, 226, 232) for directing the output beam to the detector and a programmable spatial light modulator (SLM) positioned within an optical path of the incident or output beam. The SLM is configurable to adjust a phase and/or amplitude profile of the incident beam or the output beam. The apparatus also has a control system (128, 236, 338) operable to configure the SLM to alter the phase and/or amplitude profile of the incident beam or the output beam. For example, the SLM may be configured to alter the illumination profile of the incident beam to achieve different inspection modes. In another example, the SLM may be configured to alter the phase and/or amplitude profile of the output beam so as to substantially eliminate aberrations produced by the imaging optics. In other embodiments, the apparatus may include two or more SLM's which are configurable to alter the phase and/or amplitude profile of both the incident beam and the output beam.

Abstract translation: 公开了使用一个或多个空间光调制器（SLM）（（SLM））来改变检查系统（100,200,300）内的光束的相位和/或振幅的方法和设备 108，112，122，212，220，230，312，332，320）。 在一个实施例中，公开了一种用光束光学检查样品的设备。 该设备包括用于将入射光束引导到样本上的束发生器（102,202），由此入射光束的至少第一部分作为输出束从样本（118）被引导，并且检测器（126,234 ，336）定位成接收输出光束的至少一部分。 检测器还可操作以基于输出光束产生输出信号。 该设备还包括用于将输出光束引导至检测器的一个或多个成像光学器件（例如，224,228,226,232）以及位于入射或输出光束的光路内的可编程空间光调制器（SLM）。 SLM可配置为调整入射光束或输出光束的相位和/或幅度分布。 该设备还具有控制系统（128,236,338），其可操作以配置SLM以改变入射光束或输出光束的相位和/或幅度分布。 例如，SLM可以被配置为改变入射光束的照射轮廓以实现不同的检查模式。 在另一个例子中，SLM可以被配置为改变输出光束的相位和/或幅度分布，从而基本上消除由成像光学器件产生的像差。 在其他实施例中，该设备可以包括两个或更多个SLM，其可配置为改变入射光束和输出光束的相位和/或幅度分布。

公开(公告)号：WO2003089872A3

公开(公告)日：2003-10-30

申请号：PCT/US2003/012070

申请日：2003-04-18

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： VAEZ-IRAVANI, Mehdi ,  MILLER, Larry

IPC: G01N21/88

Abstract: A multi-spot inspection system employs an objective (30) for focusing an array of radiation beams (24) to a surface of an object (28) and a second objective (32) having a large numerical aperture for collecting scattered radiation (64) from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel (34) so that information about a scattering may be conveyed to a corresponding detector in a remote detector array (36) for processing. For patterned surface inspection, a cross-shaped filter (90) is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter (92) in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface.

公开(公告)号：WO2003083835A3

公开(公告)日：2003-10-09

申请号：PCT/US2003/009082

申请日：2003-03-22

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： ZHU, Jun ,  MORARU, Alex ,  ZANETTI, Teodor ,  TAO, Franklin ,  KILMER, Dan, L. ,  HESS, Harald ,  CARR, Tom ,  BELLIS, Matt ,  PINTO, Gustavo, A. ,  LEE, Patrick, Rodney

IPC: G11B5/596

Abstract: A system and methods for efficiently performing media writing functions is disclosed. The system and methods include: detecting media movement with respect to a base and heads during reading and writing, and moving the heads in response; using an interferometer, such as a dual beam differential interferometer, to dynamically monitor disk position and address perceived errors; and minimizing repeatable and non repeatable runout error by writing data, such as servo bursts, in multiple revolutions to average adverse runout conditions. The present system has the ability to use an interferometer to enhance media certification and perform on line, in situ monitoring of the media, and includes shrouding, head mounting, disk biasing, and related mechanical aspects beneficial to media writing.

公开(公告)号：WO2003030206A1

公开(公告)日：2003-04-10

申请号：PCT/US2002/031517

申请日：2002-10-01

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： NASSER-GHODSI, Mehran ,  REICHERT, Jeffrey

IPC: H01J37/28

CPC classification number: H01J37/268 ,  G01N23/2252 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: The present invention includes a system for localization of defects in test samples. A sample is scanned using a particle beam. Some particles interact with conductive elements and may cause the emission of x-rays. Other particles can pass through the sample entirely and generate a current that can be measured. A higher current generated indicates less conductive material at the scan target that may mean a void, dishing, or erosion is present. Localization of a defect can be confirmed using an x-ray emission detector.

Abstract translation: 本发明包括用于定位测试样品中的缺陷的系统。 使用粒子束扫描样品。 一些颗粒与导电元素相互作用，并可能导致x射线的发射。 其他颗粒可以完全通过样品，并产生可以测量的电流。 产生的较高的电流表示在扫描目标处的导电材料较少，这可能意味着存在空隙，凹陷或侵蚀。 可以使用x射线发射检测器确认缺陷的定位。