公开(公告)号：JPH11265067A

公开(公告)日：1999-09-28

申请号：JP27068598

申请日：1998-09-25

Applicant: JSR CORP

Inventor： SUWA MITSUFUMI ,  IWAZAWA HARUO ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: G03F7/004 ,  C08L35/00 ,  C08L45/00 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition having high transparency to radiation and sufficient dry etching resistance and superior resolution and superior balance of characteristics by incorporating a specified copolymer and a radiation sensitive acid generator. SOLUTION: The radiation sensitive resin composition contains a radiation sensitive acid generator and a copolymer having (a) repeating units I each represented by formula I, or the repeating units I represented by formula I and repeating units II each represented by formula II, and (b) a copolymer having repeating units III represented by formula III obtained by cleaving the C=C double bonds of a monomer having >=2 polymerizable C=C double bonds, and a divalent group to be decomposed by action of an acid and having a structure of the double bonds combined with each other through the divalent group. In formula I, each of A and B is an H atom or a and R is a 1-5C alkyl group.

公开(公告)号：JPH11249310A

公开(公告)日：1999-09-17

申请号：JP6607498

申请日：1998-03-03

Applicant: JSR CORP

Inventor： SUWA MITSUFUMI ,  IWAZAWA HARUO ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: H01L21/027 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. excellent particularly in shelf stability, transparency to radiation, resolution and dry etching resistance as a chemical amplification type resist and excellent also in sensitivity, developability, pattern shape, etc. SOLUTION: The radiation sensitive resin compsn. contains an alkali-insoluble or slightly alkali-soluble resin having functional, groups represented by the formula and a radiation sensitive acid generating agent. In the formula, R -R are each H, 1-6C linear or branched alkyl or 5- to 8-membered cycloalkyl, R and R may bond to each other to form 5- to 8-membered cycloalkyl or R and R may bond to each other to form 5- to 8-membered cycloalkyl and (n) is an integer of 0-3.

公开(公告)号：JPH11218924A

公开(公告)日：1999-08-10

申请号：JP3241298

申请日：1998-01-30

Applicant: JSR CORP

Inventor： SUWA MITSUFUMI ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  IWAZAWA HARUO

IPC: G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide the radiation sensitive resin composition superior in storage stability and high in transmittance to radiation as a chemically amplifiable resist, nevertheless, superior in dry etching resistance, sensitivity, resolution, and pattern profiles. SOLUTION: This radiation sensitive resin composition contains (A) an alkali- insoluble or hardly soluble resin having an acid-dissociable group represented by the formula, and (B) a radiation sensitive acid generator. In the formula, each of R and R is, independently, an H atom or a1-6C straight or branched or cyclic alkyl group, or may combine with each other to form a 3- or 6-membered cyclic alkyl group; and R is a 1-6C straight or branched or cyclic alkyl group.

公开(公告)号：JPH10254140A

公开(公告)日：1998-09-25

申请号：JP7471897

申请日：1997-03-12

Applicant: JSR CORP

Inventor： SUWA MITSUFUMI ,  IWAZAWA HARUO ,  KAJITA TORU ,  IWANAGA SHINICHIRO

IPC: G03F7/039 ,  C08L35/00 ,  C08L45/00 ,  C08L65/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. excellent especially in contact hole resolution as a chemical amplification type resist and excellent also in radiation transmitting property, dry etching resistance, pattern shape, sensitivity, resolution, etc. SOLUTION: This radiation sensitive resin compsn. contains a resin (A) having an alicyclic skeleton in the principal chain and/or a side chain, a resin (B1) having >=60%/μm transmissivity to radiation of 100-300nm wavelength or a compd. (B2) having a mol.wt. of and R is H or an acid-cleavable group, Z is a group having a cyclic hydrocarbon structure in which the total number of ring forming carbon atoms is 7-25, 0 =1.

公开(公告)号：JPH10147561A

公开(公告)日：1998-06-02

申请号：JP34700597

申请日：1997-12-01

Applicant: JSR CORP

Inventor： KAJITA TORU ,  MIURA TAKAO ,  ISAMOTO YOSHITSUGU ,  OKUDA CHOZO

IPC: G03F7/022 ,  C07C247/14 ,  C07C315/04 ,  C07C317/14

Abstract: PROBLEM TO BE SOLVED: To obtain the subject compound useful as a resist for forming highly integrated circuits by esterifying a specific hydroxy compound with a 1,2- naphthoquinone diazide sulfonyl halide. SOLUTION: The method for producing a compound of formula II useful for radiation-sensitive resin compositions comprises esterifying a hydroxy compound of formula I [R -R are each a (substituted) alkyl, a (substituted) aryl, OH; R , R are each H, a (substituted) alkyl; (a), (b), (d) are each an integer of 0-5; (c) is an integer of 0-4] with a 1,2-naphthoquinone diazide sulfonyl halide in the presence of triethylamine (in an average condensation degree of usually 100%, preferably

公开(公告)号：JP2013087232A

公开(公告)日：2013-05-13

申请号：JP2011230390

申请日：2011-10-20

Applicant: Nippon Soda Co Ltd ,  日本曹達株式会社 ,  Jsr Corp ,  Jsr株式会社

Inventor： SHINTANI TAKESHI ,  OKADO TOSHIAKI ,  TANDO IZUMI ,  NARUSE HIDENORI ,  KAJITA TORU

IPC: C08F297/02 ,  C09B67/20 ,  G02B5/20

CPC classification number: C08F299/04 ,  C08F290/062 ,  C08F297/026 ,  C09B67/0002 ,  C09B67/009 ,  G02B5/223 ,  C08F220/18 ,  C08F2220/285 ,  C08F2220/281

Abstract: PROBLEM TO BE SOLVED: To provide a novel copolymer having excellent pigment dispersion performance, particularly, a novel copolymer which can be used as a pigment dispersant capable of attaining higher brightness and higher contrast of green pigment particularly in a color filter.SOLUTION: The novel copolymer contains: a block chain (A) including a repeating unit having tertiary amino group; and a block chain (B) including a repeating unit represented by formula (I) (wherein Rrepresents hydrogen atom or 1-3C alkyl, Rand Reach independently represent hydrogen atom or 1-6C alkyl, Q represents oxygen-containing heterocyclic group which may have alkyl as a substituent or 2-20C alkenyl, and n represents an integer of 0-6), and has an amine value of 80 mgKOH/g or more and 250 mgKOH/g or less.

Abstract translation: 要解决的问题：为了提供具有优异的颜料分散性能的新型共聚物，特别是可以用作颜料分散剂的新型共聚物，其可以获得更高的亮度和更高的绿色颜料的对比度，特别是在滤色器中。 解决方案：新型共聚物含有：包含具有叔氨基的重复单元的嵌段链（A）; 和包含由式（I）表示的重复单元的嵌段链（B）（其中R 1 表示氢原子或1-3C烷基，R 2 和R 3 各自独立地表示氢原子或1-6C烷基，Q表示可具有烷基作为取代基的含氧杂环基或2-20C 烯基，n表示0-6的整数），胺值为80mgKOH / g以上至250mgKOH / g以下。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011197142A

公开(公告)日：2011-10-06

申请号：JP2010061575

申请日：2010-03-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  KAJITA TORU

IPC: G03F7/038 ,  C08F20/06 ,  C08F20/28 ,  C08F20/32 ,  G03F7/004 ,  G03F7/028 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which can be cured by low-temperature heating, has good alkali developability and high radiation sensitivity, and capable of forming a cured film with excellent hardness and solvent resistance.SOLUTION: The radiation-sensitive composition contains[A] an alkali-soluble resin, [B] at least one compound selected from the group consisting of vinyloxyalkyloxetane and vinyloxyaryloxetane compounds, and [C] a compound which generates an acid when energy is imparted thereto.

Abstract translation: 要解决的问题：提供可通过低温加热固化的辐射敏感性组合物，具有良好的碱显影性和高的辐射敏感性，并且能够形成具有优异的硬度和耐溶剂性的固化膜。解决方案： 敏感性组合物含有[A]碱溶性树脂，[B]至少一种选自乙烯氧基烷氧基乙烯和乙烯氧基异丙烷化合物的化合物，[C]当赋予能量时产生酸的化合物。

公开(公告)号：JP2011191344A

公开(公告)日：2011-09-29

申请号：JP2010055156

申请日：2010-03-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  KAJITA TORU

IPC: G03F7/039 ,  C08F216/12 ,  C08F220/06 ,  C08F220/28 ,  C08F222/06 ,  C08F222/40 ,  G03F7/004 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition which has good alkali developability, can be cured by low-temperature heating, and also has high radiation sensitivity. SOLUTION: The positive radiation-sensitive resin composition includes a polymer having at least one structural unit selected from polyvinyl ethers in which tertiary carbon has an oxetanyl structure and an acid generator. It is preferable that the polymer further includes a maleic anhydride or maleimide structural unit as a monomer unit. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有良好的碱显影性的正性辐射敏感性树脂组合物，可以通过低温加热固化，并且还具有高的辐射敏感性。 正型辐射敏感性树脂组合物包括具有至少一个选自叔碳具有氧杂环丁烷基结构的聚乙烯醚和酸发生剂的结构单元的聚合物。 优选聚合物还包含作为单体单元的马来酸酐或马来酰亚胺结构单元。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010085929A

公开(公告)日：2010-04-15

申请号：JP2008257801

申请日：2008-10-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/031 ,  C07C323/40 ,  C08F220/04 ,  G02F1/1339 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity even when a light source eliminating a short wavelength range is used, giving a sufficient spacer shape even with the amount of exposure of not more than 1,000 J/m 2 for example, and allowing formation of a spacer for a liquid crystal display element excellent in elastic recovery property, rubbing durability, adhesiveness to a transparent substrate, resolution or the like. SOLUTION: The radiation-sensitive resin composition includes: [A] a copolymer of (a1) at least one kind selected from a group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound except for the above compounds (a1); [B] a polymerizable unsaturated compound; and [C] a specified oxime ester represented by a compound No.1. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决问题：为了提供即使在消除短波长范围的光源时也具有高灵敏度的辐射敏感性树脂组合物，即使曝光量不大于1,000J / cm 2，也能提供足够的间隔物形状， 例如，可以形成弹性恢复性，摩擦耐久性，对透明基材的粘合性，分辨率等优异的液晶显示元件的间隔物。 解决方案：辐射敏感性树脂组合物包括：[A]（a1）选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物和（a2）除 以上化合物（a1）; [B]可聚合不饱和化合物; 和[C]由化合物No.1表示的规定的肟酯。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009222822A

公开(公告)日：2009-10-01

申请号：JP2008065057

申请日：2008-03-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/033 ,  C08F2/44 ,  C08F265/04 ,  G02F1/1339 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition from which a spacer for a liquid crystal display element having flexibility and a high elastic recovery rate is formed even at a post-bake temperature of ≤200°C, and a radiation-sensitive resin composition excellent in storage stability. SOLUTION: The radiation-sensitive resin composition contains [A] an alkali-soluble polymer having a bicyclo ortho ester structure, [B] a polymerizable unsaturated compound, and [C] a radiation-sensitive polymerization initiator. The radiation-sensitive resin composition may further contain [D] an acid generator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种辐射敏感性树脂组合物，即使在后烘烤温度≤200℃下也形成了具有柔软性和高弹性回复率的液晶显示元件用间隔物，以及 具有优异的储存稳定性的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物含有[A]具有双环原酸酯结构的碱溶性聚合物，[B]可聚合不饱和化合物和[C]辐射敏感聚合引发剂。 辐射敏感性树脂组合物还可以含有[D]酸产生剂。 版权所有（C）2010，JPO＆INPIT