Abstract:
지지 레이어에 부착된 복수의 펜들을 갖는 팁 어레이를 사용하는 리소그래피 방법을 개시한다. 팁들은 금속, 준금속, 및/또는 반도체 물질을 포함할 수 있고, 지지 레이어는 탄성중합체 폴리머를 포함할 수 있다. 팁 어레이는 팁과 기판 표면의 접촉 시 기판에 축적되는 잉크(예를 들어, 패터닝 조성물)로 팁들이 코팅되는 리소그래피를 수행하도록 사용된다. 팁들은 기판에 용이하게 레벨링될 수 있으며, 레벨링은 지지 레이어의 광선 반사에 있어서의 변화 및/또는 팁과 기판 표면의 접촉 시 팁들 부근 근처에서 시각적으로 모니터링될 수 있다.
Abstract:
PURPOSE: A local pattern manufacturing method is provided to achieve the desired conductivity ratio by controlling the temperature of the mask and the electrical field applied to the mask. CONSTITUTION: A mask(7) is arranged in contact with the lower part of a support(1). The mask comprises at least one recess(8). The recess corresponds to the pattern to be formed on the top of the support. The recess has shape and the size suitable for the pattern to be formed. The solution(9) comprises the material which is designed in order to form the pattern on the upper side of the support.
Abstract:
Methods comprising providing a pre-patterned substrate having an array of thick walls, depositing a conforming layer on the pre-patterned substrate, etching the conforming layer from the top of the thick walls and the space between the walls, and etching the thick walls while leaving thin walls of conforming layer.
Abstract:
PROBLEM TO BE SOLVED: To provide a method of generating a simple and high-resolution localized pattern which is easy to implement. SOLUTION: This method of generating at least one pattern on the upper surface of a support body 1 made of a substance showing first thermal conductivity includes a process of arranging a mask 7 made of a substance which shows second thermal conductivity and including at least one hole part 8 having a shape corresponding to the shape of the pattern. The hole part 8 contacts the bottom face of the support body 1. The ratio of the first conductivity to the second conductivity is ≥2 or ≤1/2 in the execution period (duration) of the method. The method includes processes of: depositing a solution containing a substance made to form the pattern on the upper surface, and evaporating the solution. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for artificially, simply and easily manufacturing a structure that imitates a structure having a fine two-stage layer appearing in soles of gecko. SOLUTION: The method for manufacturing a columnar structure having a two-stage layer includes steps of: (1) filling pores of a porous membrane with resin on a base material; (2) curing the resin to form a columnar structure; (3) subjecting the end portion of the columnar structure to plasma etching processing to form a columnar structure having a two-stage layer; and (4) removing the porous membrane from the base material. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
Le but de la présente invention est de fournir un procédé de fonctionnalisation de veines fluidiques (1b) dans un dispositif micromécanique dont les parois comprennent une couche opaque. A cette fin l'invention propose un procédé de fonctionnalisation d'un dispositif micromécanique muni d'une veine fluidique comprenant une paroi périphérique (5) présentant une surface externe (2) à la veine et une surface interne (3) délimitant un espace (1b) dans lequel est susceptible de circuler un fluide, la paroi périphérique comprenant au moins partiellement une couche de silicium (5a). Le procédé comprend les étapes suivantes : a) la mise à disposition d'un dispositif dont la paroi périphérique (5) comprend au moins partiellement une couche de silicium (5a) présentant, au moins localement, une épaisseur (e) comprise entre 100 et 200 nm exclu, avantageusement entre 160 et 180 nm, c) la silanisation d'au moins la surface interne de la veine fluidique, d) la photo déprotection localisée et sélective sur au moins la surface interne du dispositif silanisé par insolation de la paroi périphérique (5) là où elle présente une épaisseur (e) comprise entre 100 et 200 nm exclu, avantageusement entre 160 et 180 nm.
Abstract:
Disclosed are methods of lithography using a tip array having a plurality of pens attached to a backing layer, where the tips can comprise a metal, metalloid, and/or semi-conducting material, and the backing layer can comprise an elastomeric polymer. The tip array can be used to perform a lithography process in which the tips are coated with an ink (e.g., a patterning composition) that is deposited onto a substrate upon contact of the tip with the substrate surface. The tips can be easily leveled onto a substrate and the leveling can be monitored optically by a change in light reflection of the backing layer and/or near the vicinity of the tips upon contact of the tip to the substrate surface.