公开(公告)号：US07641969B2

公开(公告)日：2010-01-05

申请号：US11088076

申请日：2005-03-23

Applicant: Joseph P. Fletcher, III

Inventor： Joseph P. Fletcher, III

IPC: G02B6/036 ,  D02G3/22

CPC classification number: C03B37/01211 ,  C03B2201/03 ,  C03B2201/04 ,  Y10T428/2913

Abstract: An optical fiber preform is assembled by inserting core rod segments axially end to end inside of a first glass overclad tube having a first, relatively low concentration of a given impurity that contributes to signal attenuation in an optical fiber to be drawn from the preform. The first overclad tube with the contained core rod segments are inserted in a second glass tube having a second concentration of the given impurity which is higher than the first concentration. The wall thickness of the first overclad tube is preferably less than that of the second overclad tube, thus reducing the amount of high purity glass needed to form the first overclad tube and attendant manufacturing costs. The core rod segments may include salvageable remnants from a single long core rod produced, for example, by vapor axial deposition (VAD).

Abstract translation: 通过将芯棒片段轴向端对端插入第一玻璃外包层管内装配光纤预制件，第一玻璃外包管具有第一相对低浓度的给定杂质，这有助于从预成型件中拉出的光纤中的信号衰减。 将具有所述芯棒段的第一外包管插入具有高于第一浓度的给定杂质的第二浓度的第二玻璃管中。 第一外包层管的壁厚优选小于第二外包层管的壁厚，从而减少形成第一外包层管所需的高纯度玻璃的量和伴随的制造成本。 芯棒段可以包括来自例如通过气相轴向沉积（VAD）产生的单个长芯棒的可补救残余物。

公开(公告)号：US20080282743A1

公开(公告)日：2008-11-20

申请号：US11968418

申请日：2008-01-02

Applicant: Guangjun Xu ,  Larry Zeng ,  Ivo Flammer ,  Dennis Robert Simons ,  Cedric Gonnet ,  Rob Hubertus Matheus Deckers

Inventor： Guangjun Xu ,  Larry Zeng ,  Ivo Flammer ,  Dennis Robert Simons ,  Cedric Gonnet ,  Rob Hubertus Matheus Deckers

IPC: C03B37/075 ,  C03B37/012 ,  G02B6/02

CPC classification number: C03B37/01876 ,  C03B32/00 ,  C03B37/01892 ,  C03B2201/03 ,  C03C3/06 ,  C03C2203/52 ,  Y02P40/57

Abstract: Disclosed is a method of heat treating quartz glass deposition tubes at between 900° C. and 1200° C. for at least 115 hours. The resulting deposition tubes are useful in forming optical preforms that can yield optical fibers having reduced added loss.

Abstract translation: 公开了在900℃至1200℃之间对石英玻璃沉积管进行热处理至少115小时的方法。 所得到的沉积管可用于形成光学预成型件，其可以产生具有减小的添加损失的光纤。

公开(公告)号：US07160387B2

公开(公告)日：2007-01-09

申请号：US10781682

申请日：2004-02-20

Applicant: Hiroshi Kishi ,  Masanori Fukui ,  Yoshiyuki Tsuji

Inventor： Hiroshi Kishi ,  Masanori Fukui ,  Yoshiyuki Tsuji

IPC: C30B13/06

CPC classification number: C03C3/06 ,  C03B19/095 ,  C03B2201/03 ,  C30B15/10 ,  C30B29/06 ,  Y10S117/90 ,  Y10T117/1032 ,  Y10T117/1052

Abstract: This invention provides a high purity silica crucible having low impurity concentration in its inner portion, and its production method. The crucible, in which at least each content of Na and Li being contained in the depth of 1 mm from the inside surface is less than 0.05 ppm, is given by a production method of a high purity silica glass crucible, wherein a purity of the melted silica powder layer is increased by applying a voltage between a mold and an arc electrode to move impurity metals being contained in the melted silica glass layer to the outside, when the silica crucible is produced by arc plasma heating a raw material powder of silica in an inside surface of a hollow rotary mold. The method comprises, keeping an arc electrode potential of within ±500 V during an arc melting, applying a voltage of from −1000 V to −20000 V to a mold being insulated to the ground, and applying a high voltage to the un-melted silica powder layer of the outside.

Abstract translation: 本发明提供了内部杂质浓度低的高纯度二氧化硅坩埚及其制造方法。 通过高纯度二氧化硅玻璃坩埚的制造方法给出至少含有内表面1mm以内的Na和Li的含量小于0.05ppm的坩埚，其中，纯度为 通过在模具和电弧电极之间施加电压来增加熔融二氧化硅粉末层，以将熔融石英玻璃层中所含的杂质金属移动到外部，当通过电弧等离子体加热二氧化硅原料粉末 中空旋转模具的内表面。 该方法包括：在电弧熔化期间将电弧电极电位保持在±500V以内，向-1000V至-20000V施加电压至与地绝缘的模具，并将高电压施加到未熔化 二氧化硅粉末层外面。

公开(公告)号：US07140201B2

公开(公告)日：2006-11-28

申请号：US10169191

申请日：2000-12-28

Applicant: Kunio Sugiyama ,  Shuichi Tada ,  Jinichi Omi ,  Tadahiro Nakada ,  Hiroshi Morita ,  Masaki Kusuhara ,  Hiroyuki Watanabe ,  Hirofumi Uehara ,  Keiko Sanpei

Inventor： Kunio Sugiyama ,  Shuichi Tada ,  Jinichi Omi ,  Tadahiro Nakada ,  Hiroshi Morita ,  Masaki Kusuhara ,  Hiroyuki Watanabe ,  Hirofumi Uehara ,  Keiko Sanpei

IPC: C03B8/02 ,  C01B33/113

CPC classification number: C03B19/1065 ,  C01B33/16 ,  C03B2201/03 ,  C03B2201/04 ,  C03C1/006

Abstract: A hydrous silica gel is dehydrated by freezing, thawing, and removing water separated by thawing, thereby yielding silica particles. In addition, the silica particles thus formed is washed and fired, thereby producing a synthetic quartz glass power.A water glass is dealkalized, an oxidizing agent and an acid are added, the mixture thus formed is passed through a hydrogen type cation exchange resin, the aqueous silica solution thus formed is then gelled, and the gelled material is then washed and fired, thereby producing a synthetic quartz powder.Silica is sequentially held for a predetermined time at each temperature range of 150 to 400° C., 500 to 700° C., and 1,100 to 1,300° C., thereby producing a quartz glass.

Abstract translation: 通过冷冻，解冻和除去通过解冻分离的水来脱水水合硅胶，从而产生二氧化硅颗粒。 此外，将由此形成的二氧化硅颗粒进行洗涤和烧制，从而产生合成石英玻璃粉末。 将水玻璃脱碱，加入氧化剂和酸，使形成的混合物通过氢型阳离子交换树脂，然后将由此形成的二氧化硅水溶液凝胶化，然后将凝胶材料洗涤并烧制，由此 生产合成石英粉。 在150〜400℃，500〜700℃，1100〜1300℃的各温度范围内依次保持二氧化硅预定时间，生成石英玻璃。

公开(公告)号：US20060130530A1

公开(公告)日：2006-06-22

申请号：US11019721

申请日：2004-12-21

Applicant: James Anderson ,  Adam Ellison ,  Susan Schiefelbein

Inventor： James Anderson ,  Adam Ellison ,  Susan Schiefelbein

IPC: C03B37/027 ,  C03B32/00

CPC classification number: C03B37/01807 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2207/85 ,  C03B2207/90

Abstract: A method of making an optical fiber precursor includes generating vapors from an alkali metal source comprising compound containing oxygen and one or more alkali metals and applying the vapors to a surface of a glass article comprising silica at a temperature that promotes diffusion of the alkali metal into the surface of the glass article. An optical fiber has a core comprising silica and an alkali metal oxide of the form X2O, where X is selected from the group consisting of K, Na, Li, Cs, and Rb, wherein a concentration of the alkali metal oxide along a length of the core is uniform.

Abstract translation: 制造光纤前体的方法包括从包含氧和一种或多种碱金属的化合物的碱金属源生成蒸气，并且在促进碱金属扩散的温度下将蒸气施加到包含二氧化硅的玻璃制品的表面 玻璃制品的表面。 光纤具有包含二氧化硅和X 2 O 2形式的碱金属氧化物的核，其中X选自K，Na，Li，Cs和Rb，其中浓度 的碱金属氧化物沿核心的长度是均匀的。

公开(公告)号：US20040170365A1

公开(公告)日：2004-09-02

申请号：US10479852

申请日：2003-12-08

Inventor： Tomoyuki Yokokawa ,  Eiji Yanada ,  Masaaki Hirano

IPC: G02B006/02

CPC classification number: G02B6/03694 ,  C03B37/01211 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/07 ,  C03B2203/22 ,  C03B2203/36 ,  G02B6/02261 ,  G02B6/02271 ,  G02B6/0228 ,  G02B6/03644 ,  G02B6/03666

Abstract: An object of the present invention is to provide an optical fiber manufacturing method and an optical fiber in which an increase in the transmission loss is suppressed by preventing hydroxyl group from entering near the core portion. This invention provides a method for manufacturing an optical fiber 10 including forming a glass pipe 16 by applying a ring portion 15 on the inner face of a starting pipe 14 as a starting material, inserting a glass rod 13 that becomes a central core portion 11 and a depressed portion 12 into the inside of the glass pipe 16, integrating the glass pipe 16 and the glass rod 13 by collapse to form a glass body 17, forming a preform 10a by providing a jacket portion 18 outside the glass body 17, and drawing the preform 10a, wherein the thickness of the starting pipe 14 is set in a range from 4 mm to 8 mm.

Abstract translation: 本发明的目的是提供一种光纤制造方法和光纤，其中通过防止羟基进入芯部附近而抑制传输损耗的增加。 本发明提供了一种制造光纤10的方法，该光纤10包括通过在作为起始材料的起始管14的内表面上施加环形部分15，插入成为中心芯部11的玻璃棒13和 将凹部12插入到玻璃管16的内部，将玻璃管16和玻璃棒13倒塌形成玻璃体17，通过在玻璃体17的外侧设置护套部18而形成预制件10a， 预成型件10a，其中起始管14的厚度设定在4mm至8mm的范围内。

公开(公告)号：US06505484B1

公开(公告)日：2003-01-14

申请号：US09671337

申请日：2000-09-27

Applicant: Seishi Fujiwara ,  Norio Komine ,  Hiroki Jinbo

Inventor： Seishi Fujiwara ,  Norio Komine ,  Hiroki Jinbo

IPC: C03B1100

CPC classification number: C03B32/00 ,  C03B11/08 ,  C03B19/1453 ,  C03B19/1469 ,  C03B20/00 ,  C03B2201/03

Abstract: A silica glass forming method is a method of pressing a synthetic silica bulk having at least a set of opposed surfaces, on the surfaces under a high temperature condition by a presser, wherein an elastic member with permeability is placed between the presser and the surfaces of the synthetic silica bulk pressed by the presser and wherein the synthetic silica bulk is pressed through the elastic member by the presser. This method is able to reduce bubbles remaining inside the synthetic glass formed product after the forming to a sufficiently small amount. Therefore, it becomes feasible to provide the method that permits high-yield production of silica glasses with excellent optical characteristics.

Abstract translation: 二氧化硅玻璃的形成方法是通过压机在高温条件下的表面上压制具有至少一组相对面的合成二氧化硅体的方法，其中具有渗透性的弹性构件设置在压脚与表面之间 由压制机压制的合成二氧化硅体，并且其中合成二氧化硅体通过压机压靠弹性构件。 该方法能够将形成后的合成玻璃成形体中残留的气泡减少至足够小的量。 因此，提供允许高产量生产具有优异光学特性的二氧化硅玻璃的方法变得可行。

公开(公告)号：US5979190A

公开(公告)日：1999-11-09

申请号：US118743

申请日：1998-07-17

Applicant: James William Fleming, Jr. ,  Robert M. Pafchek

Inventor： James William Fleming, Jr. ,  Robert M. Pafchek

IPC: G02B6/00 ,  B01J19/08 ,  C03B20/00 ,  C03B29/02 ,  C03B37/012 ,  C03B37/014 ,  C03C23/00 ,  C03C25/62 ,  C03B37/01

CPC classification number: C03C25/6293 ,  C03B29/02 ,  C03B37/01237 ,  C03B37/0148 ,  C03B37/01493 ,  C03C23/006 ,  C03B2201/03 ,  C03B2201/04

Abstract: A refractory dielectric body is heated with a plasma fireball at conditions which do not result in substantial removal of a surface portion of the body, yet which are sufficient to reduce both surface and bulk impurities. Typically, the body is treated with the plasma in the absence of simultaneous deposition of material onto the body. Advantageously, an isothermal, oxygen or oxygen-containing plasma is utilized. The invention is useful for reducing chlorine impurities by at least about 30% to a depth of at least about 10 .mu.m, with accompanying reduction of hydroxyl impurities. The invention thus provides a useful method for reducing the concentration of impurities that contribute to imperfections during the process of drawing fiber from an optical fiber preform, without requiring substantial removal of the surface of the preform.

Abstract translation: 在不会导致主体的表面部分的基本去除的条件下，用等离子体火球加热难熔电介质体，但这足以减少表面和体积杂质。 通常，在不将材料同时沉积到身体上的情况下，用等离子体处理身体。 有利地，使用等温，含氧或含氧等离子体。 本发明可用于将氯杂质减少至少约30％至至少约10μm的深度，伴随着羟基杂质的减少。 因此，本发明提供了一种有用的方法，用于在从纤维预制棒中拉伸纤维的过程中减少有助于缺陷的杂质的浓度，而不需要基本上去除预型体的表面。

公开(公告)号：US5585173A

公开(公告)日：1996-12-17

申请号：US319570

申请日：1994-10-07

Applicant: Kenji Kamo ,  Kouichi Ono ,  Koji Tsukuma ,  Hiroya Nagata ,  Emiko Abe ,  Yoshikazu Kikuchi ,  Yushiharu Funakoshi

Inventor： Kenji Kamo ,  Kouichi Ono ,  Koji Tsukuma ,  Hiroya Nagata ,  Emiko Abe ,  Yoshikazu Kikuchi ,  Yushiharu Funakoshi

IPC: C03B19/06 ,  C03C3/06 ,  C03B19/08

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/50 ,  Y10S65/08 ,  Y10S65/09 ,  Y10T428/24661 ,  Y10T428/249953 ,  Y10T428/249969 ,  Y10T428/2975

Abstract: The high-purity, opaque quartz glass containing 3.times.10.sup.6 -9.times.10.sup.6 of closed cells having an average size of 20-40 .mu.m per 1 cm.sup.3, a ratio of closed cells having sizes of 100 .mu.m or more to the whole of cells being 1% or less, thereby showing 5% or less of linear transmittance for near infrared rays (.lambda.=900 nm) at a thickness of 1 mm is produced by compacting amorphous silica powder having an average particle size of 0.5-10 .mu.m, in which each of impurities selected from Li, Na, K, Fe, Ti and Al is 1 ppm or less, if any, and sintering the resultant green body at 1730.degree.-1850.degree. C.

Abstract translation: 含有3×10 6-9×10 6个细胞的高纯度不透明石英玻璃，平均粒径为每1cm 320-40μm，具有100μm以上的细胞与整个细胞的比例为1％ 通过压制平均粒径为0.5〜10μm的无定形二氧化硅粉末，制造厚度为1mm的近红外线（λ= 900nm）的线性透射率的5％以下， 从Li，Na，K，Fe，Ti和Al中选出的杂质为1ppm以下，在1730〜-1850℃下烧成生坯。

公开(公告)号：US5174801A

公开(公告)日：1992-12-29

申请号：US717541

申请日：1991-06-19

Applicant: Mitsuo Matsumura ,  Hiroshi Matsui

Inventor： Mitsuo Matsumura ,  Hiroshi Matsui

IPC: C03C3/06 ,  C03B19/09 ,  C03B20/00 ,  C03C17/04 ,  C30B15/10 ,  C30B35/00

CPC classification number: C03B19/095 ,  C30B15/10 ,  C30B35/002 ,  C03B2201/03 ,  C03B2201/04 ,  Y02P40/57 ,  Y10S65/90

Abstract: A quartz glass crucible for use in a process for pulling a single crystal silicon and having an outer layer and an inner layer. The outer layer contains less than 0.3 ppm each of Na, K and Li and more thant 5 ppm of Al. The outer layer further contains bubbles to present an opaque appearance. The inner layer is made by melting powders of high purity non-crystalline synthetic silica and contains less then 200 ppm of OH group. There is also disclosed a method for producing the crucible.