Abstract:
PROBLEM TO BE SOLVED: To provide a titania-doped quartz glass characterized in that the reduction amount of OH-group concentration by heat treatment at 900°C for 100 hr is ≤100 ppm, and also to provide a method for producing the same. SOLUTION: The method for producing the titania-doped quartz glass includes depositing synthetic fine particles on a rotating target by flame hydrolysis and at the same time, melting and vitrifying. The method comprises the following conditions: the molar ratio of oxygen gas to be supplied to a burner central pipe to the sum of silicon source material gas and titanium source material gas is 5 or more; the linear velocity of hydrogen gas injected from one or a plurality of hydrogen gas-feeding pipes of the burner is 100 m/sec or less; the variation of a feeding flow rate of each gas is controlled to be within ±1%; the each temperature variation of intake air in a furnace, exhaust from the furnace and outside air in periphery of the furnace is controlled within ±2.5°C; and the target is rotated at 5 rpm or more to deposit the fine particles on the target. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an improved method for producing a glass body of doped quartz glass by which a quartz glass product with higher quality is produced when compared with a method using conventional technologies. SOLUTION: The method for producing the glass body of doped silicate glass involves flame hydrolysis. A precursor to form doped glass is fed with a fuel gas into a single burner 14. A first formed body 24 is formed on a target 28. The doped silicate glass formed in this way has a low defect density and a small striae width. Preferably the first formed body is substantially formed to be a second formed body having a larger width and a shorter length than the first formed body. Thereby the defect density and the striae width in the doped quartz glass are further reduced. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PURPOSE: Titania doped quartz glass and a method for manufacturing the same are provided to maintain the concentration of a hydroxyl group in the titania doped quartz glass regardless of a thermal processing process at 900 degrees Celsius for 100 hours. CONSTITUTION: A reduced amount of the concentration of hydroxyl group in titania doped quartz glass is less than or equal to 100ppm after a thermal processing process at 900 degrees Celsius for 100 hours. A method for manufacturing the titania doped quartz glass includes the following: Silicon source gas and titanium source gas are oxidized or flame hydrolyzed to obtain synthetic silica-titania particles using combustible gas a combustion-supporting gas. Oxygen is used as the combustion-supporting gas. The silica-titania particle is deposited on a rotating target and is melted to become glass.