Abstract:
A method for the directional solidification of silicon or other materials. A cooled plate (19) is lowered into a silicon melt (18) and an ingot (29) of solid silicon is solidified downwards.
Abstract:
결정 성장용 도가니(1)는, 종결정을 설치하기 위한 원통형의 선단부(3)와, 결정을 성장하기 위해 선단부의 위쪽에 형성되어 있고 선단부의 직경보다 큰 직경을 갖는 원통형의 직통부(5)를 포함하는 질화붕소제 도가니로서, 선단부의 두께(T1)와 직통부의 두께(T2)는 0.1 mm≤T2
Abstract:
반도체 결정을 성장하는 방법 및 장치는 소정의 인상 스피드에서 용융물 (melt) 로부터 반도체 결정을 인상하는 것과 주기적인 인상 스피드를 평균 스피드와 결합하여 인상 스피드를 조정하는 것을 포함한다. 인상 스피드의 조정은 결정 형성 동안 용융물 및 결정의 특성 온도 구배의 인-시츄 결정을 허용한다. 온도 구배는 예를 들어, 성장 동안 결정의 온도 구배를 결정하는 결정의 목표 인상 스피드 또는 용융물 갭과 같이 완성된 결정의 형태상의 안정성 (morphological stability) 또는 고유 재료 특성에 영향을 미치는 관련 프로세스 파라미터들을 제어하도록 이용될 수도 있다. 반도체 결정 성장 방법, 특성 온도 구배, 결정 성장 프론트, 직경 제어 시스템
Abstract:
A method and apparatus for producing a manganese-zinc ferrite single crystal using a local liquid pool formation which involves melting of a starting material in a crucible and lowering of the temperature of crucible to make the resultant melt maintain form three phase regions of an upper liquid pool region, an intermediate semi-rigid region and a lower solid region. A pair of heaters are disposed at the upper and side wall portions of crucible and controlled differently from each other so that the formed lower solid region extends at its peripheral portion throughout the inner surface of the side wall portion of the crucible, thereby minimizing the contact of the formed upper liquid pool region with the whole inner surface of the crucible. For monitoring respective temperatures of various portions in the crucible to control the heaters, there are provided thermocouples which includes a thermocouple for the crystal drawing port member, a thermocouple for the upper portion of crucible, a thermocouple for the upper portion of the side wall of crucible and a thermocouple for the lower portion of crucible.
Abstract:
An improved mechanical arrangement controls the introduction of silicon particles into an EFG (Edge-defined Film-fed Growth) crucible/die unit for melt replenishment during a crystal growth run. A feeder unit injects silicon particles upwardly through a center hub of the crucible/die unit and the mechanical arrangement intercepts the injected particles and directs them so that they drop into the melt in a selected region of the crucible and at velocity which reduces splashing, whereby to reduce the likelihood of interruption of the growth process due to formation of solid mass of silicon on the center hub and adjoining components. The invention also comprises use of a Faraday ring to alter the ratio of the electrical currents flowing through primary and secondary induction heating coils that heat the crucible die unit and the mechanical arrangement.
Abstract:
Methods and apparatus for concurrent growth of multiple crystalline ribbons from a single crucible employ meniscus shapers to facilitate continuous growth of discrete and substantially flat crystalline ribbons having controlled width.
Abstract:
A thermoelectric chip unit (1) comprises equal numbers of n-type thermoelectric semiconductor elements (30n) and p-type thermoelectric semiconductor elements (30p) that are held embedded within a single chip substrate (2). It is therefore difficult for the crystals of the thermoelectric semiconductor elements (30) to split at the cleavage surfaces thereof. The thermoelectric chip unit (1) can be made to be flexible by forming the chip substrate (2) of a flexible insulator such as plastic or rubber. A thermoelectric unit (4) comprises this thermoelectric chip unit (1) to which are attached electrodes (5). The thermoelectric unit (4) can be made to be flexible by forming the electrodes (5) of flexible members such as thin copper plates. A thermoelectric module (6) comprises the thermoelectric unit (4) to which is attached a flexible sheet or cover (8). This thermoelectric module (6) can be used as a cooling device for a computer's CPU or a semiconductor laser, or in an insulated refrigerator.
Abstract:
When producing an oxide-series single crystal by continuously pulling downwardly by µ pulling down method, the composition of the single crystal can properly and quickly controlled to continuously produce the single crystal of a constant composition by changing the pulling rate of the single crystal. Preferably, the pulling rate is 20-300 mm/hr, and the pulling rate is decreased with the proceeding of growing of the single crystal.
Abstract:
A rutile single crystal with no grain boundaries of large inclination is obtained by an EFG crystal growth process wherein a die provided with slits is incorporated in a feed melt 2 to deliver up the melt through the slits until it reaches the upper face of the die, thereby obtaining a single crystal conforming in configuration to the die by pulling growth.