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公开(公告)号：JPS63184029A
公开(公告)日：1988-07-29
申请号：JP1648587
申请日：1987-01-26
Applicant: CANON KK
Inventor： MATSUGI MASAKAZU , YOSHII MINORU , NOSE TETSUSHI , OKADA YOSHIMICHI
Abstract: PURPOSE:To measure the shape of a wave front with high accuracy, on the basis of the subtraction data obtained by subtracting the reference data obtained by applying Fourier transform processing to the reference interference fringe data from a shearing interferometer from the data to be inspected due to an object to be measured. CONSTITUTION:The incidence of the fronts of the reflected waves due to both of a surface 8 to be inspected and a plane mirror 4 is performed by the opening and closing of shutters 3, 6 and the parallel beam passing through a half mirror 5 is incident to a shearing interferometer to be divided into two beams by a half mirror 9. One of the beams receives lateral shift by a parallel flat plate 13 having the angle phiof inclination to the beam so as to become preset shearing quantity and is reflected by a mirror 11 to reach a mirror 2. The other beam is reflected by a mirror 10 inclined by an angle theta to reach the mirror 12 and the shearing interference fringe corresponding to the angle theta is generated from two beams superposed each other on the mirror 12. This interference fringe is taken in a memory 16 by an area sensor 15 and subjected to Fourier transform processing to obtain reference data. Next, the reference data is subtracted from the data from the surface 18 to be inspected as correction data by an operation means 17 and the shape of a wave front can be measured with good accuracy.
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公开(公告)号：JPS63184006A
公开(公告)日：1988-07-29
申请号：JP1648487
申请日：1987-01-26
Applicant: CANON KK
Inventor： MATSUGI MASAKAZU , YOSHII MINORU , NOSE TETSUSHI , OKADA YOSHIMICHI
Abstract: PURPOSE:To perform highly accurate measurement even when the number of carriers are not an integer, by applying Fourier transformation to interference fringes respectively obtained from the reflected wave from an object to be measured by a shearing interferometer and a reference plane wave to calculate the difference between respective data. CONSTITUTION:A shearing interferometer A is constituted of half mirrors 9, 12, plane mirrors 10, 11 and a parallel flat plate 13. The beam from a beam source 1 irradiates a mirror 4 or a surface 8 to be detected from a half mirror 5 corresponding to the opening and closing of shutters 3, 6 and the reflected beam therefrom enters the interferometer A through the mirror 5 to respectively generate interference fringes. The interference fringe due to the reference plane wave from the mirror 4 among them is once taken in a frame memory 16 as an image by the area sensor of a TV camera and subjected to Fourier transformation as a predetermined shearing amount of interference fringe data. Then, in the Fourier transformation processing of the interference fringe from the surface 8 to be detected, this reference data is subtracted as correction data.
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公开(公告)号：JPS62263427A
公开(公告)日：1987-11-16
申请号：JP10643986
申请日：1986-05-09
Applicant: CANON KK
Inventor： YOSHII MINORU , NOSE TETSUSHI , NIWA YUKICHI
IPC: G01N21/45 , G01B11/24 , G01B11/245 , G01J9/04
Abstract: PURPOSE:To obtain the title apparatus capable of performing measurement with high accuracy according to an interference system using optical heretodyne, by a method wherein one of two light waves different in frequency is directed to an article to be measured to be transmitted therethrough and the two transmitted light waves are synthesized to detect the phase difference between them. CONSTITUTION:The flux of light emitted from a coherent beam source 2 is split into the P-azimuth and S-azimuth of a polarizing surface by a polarizing beam splitter (PBS) 4 to form two light waves having almost equal intensity and polarizing surfaces crossing each other at a right angle. These light waves are diffracted by acoustooptical modulation elements (A/O elements) 5, 6 so as to have different frequencies. These light waves are separated by PBS12 and one of them passes through an article 1 to be measured to be synthesized with the other one by PBS15. This light wave is converted to circular polarized beam by PBS17 and split by PBS18 to be guided to detectors 19, 20. By this method, the phase change of the light wave passing through the article 1 to be measured is detected from the phase change of the beat signals of two light waves.
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公开(公告)号：JPS60257313A
公开(公告)日：1985-12-19
申请号：JP11384984
申请日：1984-06-05
Applicant: CANON KK
Inventor： YOSHII MINORU
Abstract: PURPOSE:To detect stably and with high accuracy a very small polarization bearing by using two analyzers for detecting the polarization bearing, and optimizing an azimuth of these analyzers. CONSTITUTION:Laser light from a semiconductor laser 1 is split by a beam splitter 3, becomes a light wave of a right turn and a left turn, respectively, and each of them is emitted from the opposite end of an optical fiber and multiplexed by a beam splitter 6. Thereafter, it is split by a non-polarization beam splitter 19, passes through analyzers 18, 18' and reaches photodetectors 10, 10'. In this case, the analyzers 18, 18' are set so that the transmission axis coincides with a plane of polarization, when a fiber gyro is at a standstill state, namely, when a phase difference of Sagnac is ''0''. In this way, the detecting sensitivity can be optimized by maximizing a ratio of variation in light quantity by the Sagnac effect and the light quantity at the time when there is no Sagnac effect.
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公开(公告)号：JPS57211518A
公开(公告)日：1982-12-25
申请号：JP9866981
申请日：1981-06-24
Applicant: CANON KK
Inventor： YOSHII MINORU
Abstract: PURPOSE:To enable precise measurement of the distribution of light intensity by making a solid-state image pickup element movable relatively to an optical image. CONSTITUTION:A one-dimentional solid-state image pickup element 1 is arranged movably on a differential mechanism 3. This differential mechanism 3 is so designed that the solid-state image pickup element 1 can be fed differentially in parallel to a plane and in the direction of the arrangement of photocells by a micrometer 4, for instance. On the solid-state image pickup element 1, the optical image of a substance 6 to be measured is formed through the intermediary of a lens system 5, for instance. The respective outputs of the photocells of the solid-state image pickup element 1 are inputted in a memory circuit 7, which has a capacity for storing the outputs of 2n units of photocells when the number of the photocells is n. After an optical image of the distribution of light intensity is measured by the image pickup element 1, this element 1 is transferred by a prescribed amount to conduct the subsequent measurement of light, optical images obtained by the two measurements are inputted in the memory circuit 7, and thus high resolution can be obtained.
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Patent Agency Ranking
公开(公告)号：JPS5627572A
公开(公告)日：1981-03-17
申请号：JP10390179
申请日：1979-08-15
Applicant: CANON KK
Inventor： YOSHII MINORU , ASAEDA TAKESHI
Abstract: PURPOSE:To correct variance in sensitivity among photocells with a simple constitution by individually setting the light transmissivity of each filter provided at the photodetection side of a photocell and the size of the aperture of each mask. CONSTITUTION:Photodetection surfaces of photocells 21-2n constituting the solid image pickup element are provided with filters 31-3n or masks controlling the quantity of light incident to each surface. In accordance with variance in sensitivity among photocells 21-2n, the light transmissivity of each of filters 31-3n or the size of the sperture of each mask is individually set to make an output even with uniform exposure.
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公开(公告)号：JP2003222572A
公开(公告)日：2003-08-08
申请号：JP2002024469
申请日：2002-01-31
Applicant: CANON KK
Inventor： TAKEUCHI SEIJI , YOSHII MINORU
Abstract: PROBLEM TO BE SOLVED: To provide a phase measuring system capable of measuring with ease and high precision the phase characteristics of a film provided on a curved or plane mirror. SOLUTION: The phase measuring system has a light source, a branch grating for branching the flux from the light source into a plurality of fluxes and for guiding them to a plurality of positions on a subject with a film applied to its surface, a combination grating for combining two reflections from two neighboring points on the subject, and a detecting means for detecting interference data involving the combined fluxes. Based on the interference data collected by the detecting means, phase data which are dependent on the position of the film on the subject are determined. COPYRIGHT: (C)2003,JPO
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公开(公告)号：JPH1116827A
公开(公告)日：1999-01-22
申请号：JP18175697
申请日：1997-06-23
Applicant: CANON KK
Inventor： OSAKI YOSHINORI , HASEGAWA MASAYOSHI , YOSHII MINORU
IPC: G01B11/26 , G03F7/20 , G03F9/02 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To prevent errors in the measurements of focal positions on a wafer surface and the inclination angle of the wafer surface due to steps or the like in an IC pattern, by launching luminous flux into the surface of an object in the direction opposite a plane containing the optical axes of the projection optical systems of a plurality of plane information detection systems, and controlling the position of the surface of the object using a plurality of pieces of plane information. SOLUTION: Two or more plane information detection systems are formed. For example, luminous flux from two light sources 11, 20 for focal position detection is passed through respective pattern plates 15, 24 and optical systems 12, 21, and is launched into one measuring point in two different azimuth directions of a wafer 4. The pattern images from the respective pattern plates 15, 24 are formed on the surface of the wafer 4. The image of the reflected light therefrom is formed in separate photoelectric detecting means 14, 23 through the half mirrors 18, 19 in the optical systems to detect plane information, such as plane position and inclination, on the surface of the wafer 4. A focus leveling stage 3 is controlled using the positional information on the surface of the wafer so that the surface of the wafer 4 is positioned on the focal plane of a projection optical system 5.
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公开(公告)号：JPH10284402A
公开(公告)日：1998-10-23
申请号：JP10258197
申请日：1997-04-03
Applicant: CANON KK
Inventor： YOSHII MINORU , MORI TETSUYA , TAKEUCHI SEIJI
IPC: G01B11/00 , G03F9/00 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To position a reticle and a wafer accurately for a short time by applying a flux of incident light to a photosensitive pattern which is formed on an object coated with a photoreceptor and detecting change in the flux of incident light according to signals from a light reception means so as to obtain the position information on the photosensitive pattern. SOLUTION: A light source unit 301 as a means to emit a light flux which is provided with a light source 3011 and a polarization element 3012, applies an outgoing light 305 as a flux of incident light to the surfaces of a resist and a wafer and allows it to be reflected thereon, thereby changing the phase difference and amplitude ratio of P and S polarization elements in the synthetic light flux according to double-refractive index caused by the resist pattern on a wafer 103. Then, the change in light flux is detected by a detector 3021 through a turning λ/4 plate 3024 and an analyzer 3021, and the phase difference and amplitude are obtained from the phase information including amplitude, d.c. element and sine wave, so that the position information on deviation of alignment can be obtained.
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公开(公告)号：JPH104054A
公开(公告)日：1998-01-06
申请号：JP17433896
申请日：1996-06-13
Applicant: CANON KK
Inventor： YOSHII MINORU , HASEGAWA MASANORI , MIYAZAKI KYOICHI
IPC: G03F7/207 , G03F9/00 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To realize a surface position detector device which is capable of very accurately detecting position data as to a work surface by a method wherein surface position data as to a work arranged adjacent to the image forming plane of a projection optical system are so set as to enable a slit group on a projector optical system side or a photodetecting plane on a photodetecting optical system side and a wafer surface to be put in a shine proof relation between them, and a diffusing plate is arranged on the photodetecting plane of the photodetecting optical system. SOLUTION: A slit group 6 and a wafer 3 are in a shine proof relation between them as to a projector optical system 7. The wafer 3 and a diffusion plate 9 are in a shine proof relation between them as to a photodetecting optical system 8. The photodetecting optical system 8 adopts an optical system which is bi-telecentric and of one magnification and forms an inverted image, and when a wafer surface and a photodetecting plane are put in a shine proof relation between them as to the photodetecting optical system 8, all slit images are formed on the photodetecting plane coincident with the slits as an object. Therefore, the slits are formed at a right position rightly reflecting the height of the plane, and the height of the wafer surface is precisely detected. A non-directional diffusion plate 9 is used as the image forming plane of a photodetecting optical system, and a slit image formed on the diffusion plate 9 is formed on an image sensing device 16, whereby an excellent slit image is obtained.
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