公开(公告)号：JPH11176745A

公开(公告)日：1999-07-02

申请号：JP36369197

申请日：1997-12-16

Applicant: CANON KK

Inventor： HASEGAWA MASAYOSHI ,  INE HIDEKI

IPC: G03F9/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To carry out highly precise position detection of a wafer, by detecting a position of an observation object by using a signal which is obtained by a detection means when a slit-like pin hole is subjected to single vibration. SOLUTION: An image of an alignment mark 2 on a surface of an illuminated wafer 1 passes through a projection optical system 13, a mirror M1, an object lens 11, a relay system 10 and a half mirror 30 as reflection light, and is formed once in an area near a slit-like pin hole GP which can be driven. Light passed through the slit-like pin hole GP passes through a beam splitter PBS, is made an erected normal image by an erector 15, and is formed on a CCD camera 16 as an optical image 14. In the process, the slit-like pin hole GP is linearly driven in a depth direction while it is subjected to single vibration in a detection direction X. As a result, a alignment images which are frequent enough for averaging are stored within a CCD storage time, brightness irregularity of a detection image is eliminated and an error is made hard to generate.

公开(公告)号：JPH0945609A

公开(公告)日：1997-02-14

申请号：JP21123095

申请日：1995-07-26

Applicant: CANON KK

Inventor： HASEGAWA MASAYOSHI ,  TAKEUCHI SEIJI ,  YOSHII MINORU

IPC: G03B27/72 ,  G03F7/20 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To make a best focus position and an optimum exposure amount highly accurate in a short time automatically by deciding a best focus position by calculating information regarding one frequency element of a zigzag line from an image signal obtained by imaging a plurality of photosensitive patterns on an image sensing surface of a photoelectric conversion means. SOLUTION: A reticle is arranged inside a surface which is vertical to an optical axis of a projection lens, a pattern having periodicity to one direction is arranged on a surface of the reticle and a plurality of photosensitive patterns M' are formed by transferring the pattern on a wafer W' which is a photosensitive board at different focus positions. The plurality of photosensitive patterns M' are imaged in an image sensing surface of a photoelectric conversion means 105 and a best focus position is decided by calculating information regarding one frequency element of a zigzag line constituting an outline of an image of a zigzag opening from an image signal obtained by the photoelectric conversion means 105. Thereby, the best focus position and an optimum exposure amount can be made highly accurate in a short time automatically.

公开(公告)号：JPH05234852A

公开(公告)日：1993-09-10

申请号：JP7223592

申请日：1992-02-21

Applicant: CANON KK

Inventor： HASEGAWA MASAYOSHI ,  ABE NAOTO ,  YOSHII MINORU

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce an undesirable influence due to a beam of inessential light which is incident on a photodetection face and to detect a relative relationship between a mask and a wafer by properly setting a method wherein the signal of the detection sensitivity in each region of a detector is processed by using a weight factor. CONSTITUTION:A light flux from a light source 3 is detected by using a detector 38 which outputs a signal corresponding to the light intensity in an incident position of the light flux on a photodetection face via a mask 1 and a wafer 2. Then, the signal from the detector 38 is adjusted, by using a weight factor which differs according to regions, to a signal corresponding to individual regions on the photodetection face from the detector 38. After that, the regions, on the photodetection face, which are to be adjusted again on the basis of an output after the adjustment are reset; the same adjustment is performed. Thereby, a relative position between the mask and the wafer can be detected with high accuracy.

公开(公告)号：JPH07135168A

公开(公告)日：1995-05-23

申请号：JP30591093

申请日：1993-11-11

Applicant: CANON KK

Inventor： HASEGAWA MASAYOSHI ,  OSAWA MASARU

IPC: G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To enable the alignment of mask with a wafer to be made with high precision by a method wherein the noise component due to the noise beams emitted from the parts excluding an alignment mark region is filtered out by output signal transmitted from a detector. CONSTITUTION:The light flux from a light source 3 is deflected by the alignment marks MM, WM provided on a mask M or/and a wafer W to enter a detector later so that the noise component due to the noise beams emitted from the mask M or/and the wafer W is previously detected by a detector to be stored. Next, in order to detect the relative position between the mask M and the wafer W, the noise component stored in a memory is filtered out from the output signal transmitted from the detector so that the relative position may be detected making use of the remaining signal component. Through these procedures, the alignment of the mask M with the wafer W can be made with high precision.

公开(公告)号：JPH1116827A

公开(公告)日：1999-01-22

申请号：JP18175697

申请日：1997-06-23

Applicant: CANON KK

Inventor： OSAKI YOSHINORI ,  HASEGAWA MASAYOSHI ,  YOSHII MINORU

IPC: G01B11/26 ,  G03F7/20 ,  G03F9/02 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To prevent errors in the measurements of focal positions on a wafer surface and the inclination angle of the wafer surface due to steps or the like in an IC pattern, by launching luminous flux into the surface of an object in the direction opposite a plane containing the optical axes of the projection optical systems of a plurality of plane information detection systems, and controlling the position of the surface of the object using a plurality of pieces of plane information. SOLUTION: Two or more plane information detection systems are formed. For example, luminous flux from two light sources 11, 20 for focal position detection is passed through respective pattern plates 15, 24 and optical systems 12, 21, and is launched into one measuring point in two different azimuth directions of a wafer 4. The pattern images from the respective pattern plates 15, 24 are formed on the surface of the wafer 4. The image of the reflected light therefrom is formed in separate photoelectric detecting means 14, 23 through the half mirrors 18, 19 in the optical systems to detect plane information, such as plane position and inclination, on the surface of the wafer 4. A focus leveling stage 3 is controlled using the positional information on the surface of the wafer so that the surface of the wafer 4 is positioned on the focal plane of a projection optical system 5.