公开(公告)号：JPH117662A

公开(公告)日：1999-01-12

申请号：JP15690997

申请日：1997-06-13

Applicant: SONY CORP

Inventor： TAKEDA MINORU ,  YAMATSU HISAYUKI ,  FURUKI MOTOHIRO

IPC: C25D1/00 ,  G11B7/26

Abstract: PROBLEM TO BE SOLVED: To manufacture, with an improved yield, a stamper for a high-density large-capacity optical disk. SOLUTION: A chemical amplification type photo-resist film is formed on a glass original disk by spin coating, with a pit or a group pattern plotted with an ultraviolet laser beam having a wavelength of 180-300 nm. This resist original disk 12 is heated, with baking performed after exposure, and then immersed in an alkali developer to form the pit or the group pattern. In addition, a metallic thin film 9 is laminated on the resist 8 surface by sputtering; a conductive film consisting of this thin film is conducted to the negative pole to perform Ni electroplating; and a stamper is made which is a replica of the resist original disk 12. Thus, the pit or the group pattern can be plotted having the shortest pit length of 0.1-0.3 μm and a track pitch of 0.1-0.5 μm. Further, an Ni thin film with a thickness of 30-100 nm is laminated on the resist surface under the film forming conditions of 0.5-2.0 Pa sputtering pressure.

公开(公告)号：JPH10255337A

公开(公告)日：1998-09-25

申请号：JP5803597

申请日：1997-03-12

Applicant: SONY CORP

Inventor： TAKEDA MINORU ,  FURUKI MOTOHIRO

IPC: G11B7/26

Abstract: PROBLEM TO BE SOLVED: To produce an optical master disk capable of dealing with a tread toward a higher recording density and higher recording capacity and producing such as optical disk by enabling the formation of patterns, such as pits and grooves made increasingly finer. SOLUTION: The patterns indicating information are formed by applying a photosensitive resin which is formed with an acid by exposure and in which the acid acts as a catalyst on a substrate, exposing the resin with a laser beam having a wavelength of

公开(公告)号：JPH10106049A

公开(公告)日：1998-04-24

申请号：JP25664496

申请日：1996-09-27

Applicant: SONY CORP

Inventor： TAKEDA MINORU ,  KASHIWAGI TOSHIYUKI ,  ARAKAWA NORIYUKI

IPC: B29C45/00 ,  B29C45/26 ,  B29D17/00 ,  B29L17/00 ,  G11B7/26

Abstract: PROBLEM TO BE SOLVED: To prevent the warpage of a substrate due to contraction of a resin immediately after manufacture of a multilayered optical recording medium, the warpage, etc., of the substrate due to water absorption and dehydration of steam in the air, and further, to improve the production efficiency to the multilayered optical recording medium. SOLUTION: In a manufacturing method for the optical recording medium constituted by forming a first information recording layer 41 having at least a first fine ruggedness and a second information recording layer 42 having a second fine ruggedness, the optical recording medium, which is excellent in the symmetry in the thickness direction of the substrate 40, is manufactured by simultaneously forming the first fine ruggedness and the second fine ruggedness on both surfaces of the substrate 40 of the optical recording medium.

公开(公告)号：JPH08250606A

公开(公告)日：1996-09-27

申请号：JP4687895

申请日：1995-03-07

Applicant: SONY CORP

Inventor： TAKEDA MINORU ,  HAYASHI YUTAKA ,  YAMAGISHI MACHIO

IPC: G03F7/20 ,  G11C7/00 ,  G11C17/08 ,  H01L21/8247 ,  H01L27/115 ,  H01L29/788 ,  H01L29/792

Abstract: PURPOSE: To make it possible to supply custom ROMs through a flexible manufacturing system that responds to the trend of the market in a timely manner. CONSTITUTION: Projected from a laser light source 1, ultraviolet laser light is on/off-controlled at AOM 3, and made to linearly scan with constant velocity by a polygonal mirror 5 and a fθ lens 6. The light is then gathered through an objective 7, and locally applied in a spot to the memory cell array on a semiconductor chip 8 on an X-Y stage 9, which is two-dimensionally moved and controlled by a control device 10. A pattern corresponding to desired data is thereby written into memory.

公开(公告)号：JPH08179202A

公开(公告)日：1996-07-12

申请号：JP32103394

申请日：1994-12-22

Applicant: ASAHI OPTICAL CO LTD ,  SONY CORP

Inventor： MARUYAMA KOICHI ,  IWAKI MAKOTO ,  WAKAMIYA SHUNICHIRO ,  KUBOTA SHIGEO ,  SUGANUMA HIROSHI ,  TAKEDA MINORU

IPC: G02B13/14 ,  G02B13/24 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE: To easily execute the adjustment of measurement and the check of performance by dividing a system into a collimator lens and an image forming lens and providing an optical branching system at the part of parallel luminous flux between both lenses. CONSTITUTION: This system is provided with two lenses of the collimator lens 11 and the image forming lens 12. By the lens 11, light diverging from one point on a reticle(chart for reduction and exposure) 13 is changed into the parallel luminous flux. On the other hand, the image of the reticle 13 is reduced and projected on a wafer(photosensitive material) 14 by the lens 12 receiving the parallel luminous flux. Then, the luminous flux is parallel between the lenses 11 and 12. Since two lenses are separated at a part where the luminous flux is parallel, magnification is not changed even when a focusing action is executed by moving only the lens 12. Then, the parallel luminous flux emitted from the lens 11 and the light reflected on the wafer 14 and transmitted through the lens 12 again are guided to an external observation system by an almost parallel beat plate 15 constituting an interferometer. Besides, assembling work can be adjusted while the aberration state of the lens 12 is observed.

公开(公告)号：JPH08124226A

公开(公告)日：1996-05-17

申请号：JP26380694

申请日：1994-10-27

Applicant: SONY CORP

Inventor： AKI YUICHI ,  TAKEDA MINORU

IPC: G11B7/00 ,  G11B7/0045 ,  G11B7/26

Abstract: PURPOSE: To simplify the cutting process by irradiating an optical disc with continuously oscillating laser light subjected to intensity modulation and forming a signal groove therein thereby eliminating the step for applying photoresist and the step for development. CONSTITUTION: A single mode continuous oscillation laser light is fed from a UV laser light source 1 through a mirror 2 to an acoustooptical modulation element 3 where the laser light is subjected to intensity modulation with a signal fed from a formatter 4 and outputted as an optical modulation pulse. It is fed through a mirror 5 to a beam expander 6 where the beam diameter is enlarged and the beam passes through mirrors 7, 8 and impinges on the incident pupil face of an objective lens 9 before being condensed onto an original optical disc 13 with a spot size of diffraction limit by adjusting the focus. An optical system including a lens 9 is then shifted from the outer circumference to the center in order to expose the original disc 13 spirally thus recording signals through abrasion.

公开(公告)号：JPH07134950A

公开(公告)日：1995-05-23

申请号：JP27971493

申请日：1993-11-09

Applicant: SONY CORP

Inventor： ANDO SHIGEO ,  TAKEDA MINORU

IPC: H01J29/02

Abstract: PURPOSE:To narrow the invalid screen luminescent region of a color cathode-ray tube by making the cross section shape of an electron beam shield serrate and setting the free end of the electron beam shield closely to a color selecting mechanism part. CONSTITUTION:An electron beam shield 28 is installed by welding or the like through a connection part 28b of a phosphor screen side of a frame B member. In the condition of the installation, the free end of the shield 28 is set closely to a color selecting mechanism 14. The long side serrate shield part especially the surface of the free end of the shield part 28a, is preferably set at an angle in which direction the electron beam B2 hits almost perpendicularly, wherein the electron beam comes into the outermost part of the phosphor screen. In that case, since the free end of the shield part 28a in set closely to the phosphor screen, an invalid screen luminescent region can be narrowed. The electron beam B3 is not shielded by the shield 28 and is one to pass the nearest position of the shield and together with the beam B2, the electron beam B3 forms the invalid screen luminescent region. The electron beam B4 hits against the shield part 28a and is reflected at acute angle prevents conventional IBS reflection.

公开(公告)号：JPH0798891A

公开(公告)日：1995-04-11

申请号：JP24309693

申请日：1993-09-29

Applicant: SONY CORP

Inventor： TAKEDA MINORU

IPC: G11B7/26

Abstract: PURPOSE:To accurately form fine pits and to remarkably improve the production by using the extreme ultraviolet radiation transparent optical member for the optical parts through which the emitting light passes. CONSTITUTION:In a light intensity modulating device 11 and in an optical system 12, the synthesized quartz or fluorite is used as the ultraviolet radiation transparent member for the optical parts through which the emitting light passes. The light emitted from an ultraviolet laser light source emitting part 10 is sent to the modulator 11 and the light is modulated according to the pit recording signal sent from the formatter of a terminal 13. The modulated light is irradiated through autofocusing optical system 14 and through an objective lens 17a to an optical disk 17b. The laser light is rotated and scanned on the disk by a disk rotating mechanism. At the same time, the optical system 12 including the objective lens is moved in the radial direction from the center of the disk. Thus, the beam is scanned spirally on the disk and the photo resist is exposed to form the pit with high density.

公开(公告)号：JPH0794389A

公开(公告)日：1995-04-07

申请号：JP23472093

申请日：1993-09-21

Applicant: SONY CORP

Inventor： KUBOTA SHIGEO ,  OKA MICHIO ,  TAKEDA MINORU

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To provide a semiconductor aligner which does not use the phase shift method for preventing color aberration and can perform a mode-uniform exposure where it can control the quantity of exposure light easier than excimer laser. CONSTITUTION:For example, the fourth higher harmonic of Nd:YAG laser is applied to a reticle 12 via a lighting optical system 11 from an ultraviolet ray laser light source irradiation part 10, the image of a fine pattern of the reticle 12 is formed on a wafer 14 via a demagnification prejection lens 13, and then an XY stage 15 is moved while the alignment at an alignment mechanism part 16 is performed for accurately transferring the above fine pattern onto the wafer 14.

公开(公告)号：JPH04340277A

公开(公告)日：1992-11-26

申请号：JP2552891

申请日：1991-01-25

Applicant: SONY CORP

Inventor： TAKEDA MINORU

IPC: H01L21/3205 ,  H01L21/768 ,  H01L29/423 ,  H01L29/43 ,  H01L29/49 ,  H01L29/78

Abstract: PURPOSE:To increase the processing accuracy of an integrated circuit by a method wherein a gate electrode is formed by an offset etching operation by making use of the silicon-contained resist of a polycrystalline silicon layer as a mask and the silicon-contained resist is used as an offset insulating film. CONSTITUTION:Sidewalls 6 composed of SiN2 are formed on sidewalls on gate electrodes 3a which use silicon-contained resist films 4 as offset insulating films. Thereby, a contact hole 7 surrounded by the sidewalls is formed. After that, a diffusion-layer extraction electrode 10 composed of a second-layer polycrystalline silicon layer is formed. Since the silicon-contained resist is nearly inorganic and electrically insulating, the electrodes 3a can be insulated from the electrode 10 by means of the offset insulating film 4 even when the electrode 10 is overlapped with the gate electrode 3a. Consequently, a layout so as to be overlapped can be performed without any trouble. Thereby, the processing accuracy of the title integrated circuit can be increased.