POLARIZED LIGHT IMAGING APPARATUS AND METHODS THEREOF FOR SEPARATING LIGHT FROM A SURFACE OF A SAMPLE ITS DEEPER DIFFUSE LAYERS

    公开(公告)号:US20180180530A1

    公开(公告)日:2018-06-28

    申请号:US15880014

    申请日:2018-01-25

    Applicant: MOBILEODT LTD.

    CPC classification number: G01N21/21 G01N21/956 G01N2201/063

    Abstract: A polarized light imaging apparatus for separating light from a superficial single-scattering layer of a sample and its deeper diffuse layer as a function of space is disclosed. The apparatus has a light source for producing light beams; an illumination optic coupled to the light source for guiding the light beams towards the sample; a linear polarizer coupled to the illumination optic; a non-total internal reflection (TIR) birefringent polarizing prism (BPP) communicatively coupled to the sample to maximize a refraction difference between ordinary waves and extraordinary waves of light returning from the sample; and a detection optic unit coupled to the non-TIR BPP for guiding the light waves returning from the sample towards a single polarization sensitive sensor element.

    METHOD FOR DETECTING CLARITY OF TRANSPARENT DISPLAY PANEL AND DETECTING APPARATUS THEREOF

    公开(公告)号:US20180136125A1

    公开(公告)日:2018-05-17

    申请号:US15539801

    申请日:2016-10-24

    Abstract: A method for detecting a clarity of a transparent display panel and a detecting apparatus thereof are provided. The detecting method includes: detecting directly a reference pattern sheet by a measuring device to obtain a without-panel measurement value of the reference pattern sheet; placing the transparent display panel between the measuring device and the reference pattern sheet; detecting the reference pattern sheet through the transparent display panel to obtain a with-panel measurement value of the reference pattern sheet; acquiring clarity of the transparent display panel according to the without-panel and with-panel measurement value; wherein, the reference pattern sheet includes a plurality of pattern groups sequentially arranged in a first direction, each of which includes a first region and a second region, and widths of the plurality of pattern groups in the first direction are different. The detecting method can better evaluate a transparent effect of the transparent display panel.

    APERTURE-PLATE DRIVE MECHANISM
    105.
    发明申请

    公开(公告)号:US20180120552A1

    公开(公告)日:2018-05-03

    申请号:US15799193

    申请日:2017-10-31

    CPC classification number: G02B21/362 G01N21/35 G01N2201/063 G02B5/005

    Abstract: Provided is an aperture-plate drive mechanism including an aperture-plate open-close mechanism and a rotation mechanism for rotating the open-close mechanism. The open-close mechanism includes: drive blocks 308 fixed to a pair of aperture plates 301; a linear motion guide 306 allowing the drive blocks to move along an axis; a feed screw 302 parallel to the axis, on which a pair of helical threads proceedimg in opposite directions formed; nut members 305 each of which is provided in a manner to be engaged with one of the pair of helical threads and is prevented from rotating due to a rotation of the feed screw; an urging member 309 for pressing the drive blocks onto the nut members, respectively; and a distance adjustment member 310 placed between one drive block and the corresponding nut member, for adjusting the distance between them. With this mechanism, a discrepancy between the open-close center of the aperture plates from the rotation center can be cancelled even after the mechanism is assembled.

    Inspection device
    106.
    发明授权

    公开(公告)号:US09759669B2

    公开(公告)日:2017-09-12

    申请号:US14416752

    申请日:2013-07-03

    Inventor: Takahiro Jingu

    Abstract: In an inspection apparatus, inspection is carried out by linearly moving a wafer while rotating the wafer with respect to light. In a case where the wafer is rotated, the velocity of flow of air in outer regions of the wafer is increased, and there is a possibility that the flow of the air in the outer regions cause particles contained in an atmosphere in the vicinity of the wafer to be adhered to the wafer. In a case where such particles are adhered to the wafer, the particles are also detected as a defect, and therefore yields and cleanliness in a semiconductor production process cannot be correctly evaluated. Therefore, it is desirable that adhesion of the particles contained in the atmosphere in the vicinity of the wafer to the wafer be reduced as much as possible. Further, it is expected that, when, for example, rotation speed of the wafer is increased or a diameter of the wafer is increased, such particles are adhered further remarkably. This point has not been satisfactorily considered in the conventional arts. The invention has a feature that a conductor such as a draft to outer regions is supplied from above a substrate while the substrate is being rotated and the supplied conductor is exhausted on outside of the substrate.

    Automated focusing, cleaning, and multiple location sampling spectrometer system
    109.
    发明授权
    Automated focusing, cleaning, and multiple location sampling spectrometer system 有权
    自动对焦,清洗和多位置采样光谱仪系统

    公开(公告)号:US09568430B2

    公开(公告)日:2017-02-14

    申请号:US14983933

    申请日:2015-12-30

    Applicant: SciAps, Inc.

    Inventor: David Day

    Abstract: An analysis system includes a moveable focusing lens, a laser (typically an eye safe laser) having an output directed at the focusing lens, and a spectrometer outputting intensity data from a sample. A controller system is responsive to the spectrometer and is configured to energize the laser, process the output of the spectrometer, and adjust the position of the focusing lens relative to the sample until the spectrometer output indicates a maximum or near maximum intensity resulting from a laser output focused to a spot on the sample.

    Abstract translation: 分析系统包括可移动聚焦透镜,具有指向聚焦透镜的输出的激光器(通常是眼睛安全激光器)以及从样本输出强度数据的光谱仪。 控制器系统响应于光谱仪并且被配置为激励激光器,处理光谱仪的输出,并且调整聚焦透镜相对于样品的位置,直到光谱仪输出指示由激光产生的最大或接近最大强度 输出集中在样品上的一个点。

    OPTICAL MICROSCOPY SYSTEM AND METHOD FOR RAMAN SCATTERING WITH ADAPTIVE OPTICS
    110.
    发明申请
    OPTICAL MICROSCOPY SYSTEM AND METHOD FOR RAMAN SCATTERING WITH ADAPTIVE OPTICS 审中-公开
    具有自适应光学的拉曼散射的光学显微系统和方法

    公开(公告)号:US20160363538A1

    公开(公告)日:2016-12-15

    申请号:US15121632

    申请日:2015-02-24

    Abstract: An optical apparatus for Raman scattering microscopy, includes a laser source (10) suitable for emitting a laser beam (11) at an excitation wavelength λ, a microscope objective (14) suitable for receiving the laser beam (11) and focusing the laser beam in an image plane of the microscope objective (14), the focused laser beam (21) being intended to illuminate a sample (20), an optical system suitable for collecting a Raman scattering optical beam (22), and detection elements (16, 17) suitable for detecting the Raman scattering beam (22) collected. More particularly, the Raman scattering microscopy apparatus further includes an adaptive optics system (31, 32, 33) positioned on an optical path of the excitation laser beam (11), on an optical path of the Raman scattering beam (22) or on an optical path common to the excitation laser beam (11) and the Raman scattering beam (22).

    Abstract translation: 一种用于拉曼散射显微镜的光学装置,包括适于发射激发波长λ的激光束(11)的激光源(10),适于接收激光束(11)并将激光束聚焦的显微镜物镜(14) 在显微镜物镜(14)的像平面中,聚焦激光束(21)旨在照射样品(20),适于收集拉曼散射光束(22)的光学系统和检测元件(16, 17)适用于检测所收集的拉曼散射光束(22)。 更具体地,拉曼散射显微镜装置还包括位于激光激光束(11)的光路上的自适应光学系统(31,32,33),在拉曼散射光束(22)的光路上,或者在 激光激光束(11)和拉曼散射光束(22)共用的光路。

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