公开(公告)号：WO2017151737A1

公开(公告)日：2017-09-08

申请号：PCT/US2017/020151

申请日：2017-03-01

Applicant: H.C. STARCK INC.

Inventor： STAWOVY, Michael, Thomas

IPC: B22F3/105 ,  B22F5/12 ,  B22F3/17 ,  B22F3/18 ,  B22F3/20 ,  B33Y10/00 ,  B33Y70/00

Abstract: In various embodiment, the present invention relates to method of fabricating a three-dimensional part by a process comprising the steps of: providing a wire comprising arc-melted refractory metallic material; translating a tip of the wire relative to a platform; while the tip of the wire is being translated, melting the tip of the wire with an energy source to form a molten bead, whereby the bead cools to form at least a portion of a layer of a three-dimensional part; and repeating steps (b) and (c) one or more times to produce the three dimensional part.

Abstract translation: 在各种实施例中，本发明涉及通过包括以下步骤的方法制造三维部件的方法：提供包含电弧熔化的难熔金属材料的线材; 将线的尖端相对于平台平移; 当丝线的尖端被平移时，用能源熔化丝线的尖端以形成熔融珠粒，由此珠粒冷却以形成三维部件的层的至少一部分; 并重复步骤（b）和（c）一次或多次以产生三维零件。

公开(公告)号：WO2016115026A9

公开(公告)日：2016-07-21

申请号：PCT/US2016/012824

申请日：2016-01-11

Applicant: H.C. STARCK INC.

Inventor： SUN, Shuwei ,  ROZAK, Gary Alan ,  ZHANG, Qi ,  COX, Barbara ,  LEE, Yen-Te

IPC: C23C14/08 ,  C23C14/14 ,  C23C14/34 ,  C22C27/04 ,  G06F3/00

Abstract: Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about 88 to 97 weight percent molybdenum show improved performance, particularly with respect to etching, such as when simultaneously etching an alloy layer including the Mo, Nb, and Ta, and a metal layer (e.g., an aluminum layer). The targets are particularly useful in manufacturing touch screen devices.

Abstract translation: 发现包括钼，铌和钽的溅射靶可用于电子器件的溅射膜。 具有约88重量百分比至约97重量百分比的钼的溅射靶具有改进的性能，尤其是对于蚀刻，例如同时蚀刻包括Mo，Nb和Ta的合金层以及金属层（例如铝层）时的性能。 目标对制造触摸屏设备特别有用。

公开(公告)号：WO2016077287A1

公开(公告)日：2016-05-19

申请号：PCT/US2015/059856

申请日：2015-11-10

Applicant: H.C. STARCK INC.

Inventor： AIMONE, Paul, R. ,  ABOUAF, Mark ,  HOGAN, Patrick

IPC: B01J19/00 ,  F28D3/00

CPC classification number: B01J19/0093 ,  B01J19/02 ,  B01J19/2415 ,  B01J2219/00092 ,  B01J2219/00822 ,  B01J2219/00837 ,  B01J2219/00873 ,  B01J2219/0236 ,  B01J2219/0277 ,  B22F3/008 ,  B22F3/1055 ,  B22F3/12 ,  B22F5/10 ,  B33Y10/00 ,  B33Y80/00 ,  Y02P10/295

Abstract: In various embodiments, a microreactor features a corrosion-resistant microchannel network encased within a thermally conductive matrix material that may define therewithin one or more hollow heat-exchange conduits.

Abstract translation: 在各种实施例中，微反应器具有包封在导热基体材料内的耐腐蚀微通道网络，其可在其中限定一个或多个中空热交换管道。

公开(公告)号：WO2015134456A1

公开(公告)日：2015-09-11

申请号：PCT/US2015/018434

申请日：2015-03-03

Applicant: H.C. STARCK INC. ,  HOGAN, Patrick ,  MOORE, John ,  BREWER, Alex ,  PETTIT, Jared

Inventor： HOGAN, Patrick ,  MOORE, John ,  BREWER, Alex ,  PETTIT, Jared

IPC: H01L29/786

CPC classification number: H01L27/1288 ,  C23F1/02 ,  C23F1/16 ,  C23F1/18 ,  C23F1/26 ,  C23F1/30 ,  G02F1/13439 ,  G02F1/1368 ,  G02F2202/103 ,  H01L21/283 ,  H01L21/32134 ,  H01L21/32139 ,  H01L27/1218 ,  H01L27/1222 ,  H01L27/1296 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/4908 ,  H01L29/4958 ,  H01L29/66742 ,  H01L29/66765 ,  H01L29/78603 ,  H01L29/78669

Abstract: In various embodiments, etchants featuring (i) mixtures of hydrochloric acid, methanesulfonic acid, and nitric acid, or (ii) mixtures of phosphoric acid, methanesulfonic acid, and nitric acid, are utilized to etch metallic bilayers while minimizing resulting etch discontinuities between the layers of the bilayer.

Abstract translation: 在各种实施方案中，使用特征为（i）盐酸，甲磺酸和硝酸的混合物或（ii）磷酸，甲磺酸和硝酸的混合物的蚀刻剂来蚀刻金属双层，同时最小化所得到的蚀刻不连续性 双层的层。

公开(公告)号：WO2009020587A1

公开(公告)日：2009-02-12

申请号：PCT/US2008/009388

申请日：2008-08-05

Applicant: H.C. STARCK, INC. ,  JEPSON, Peter, R. ,  BOZKAYA, Dincer

Inventor： JEPSON, Peter, R. ,  BOZKAYA, Dincer

IPC: B21B1/22 ,  C22F1/18 ,  B22F3/18

CPC classification number: H01J37/3426 ,  B21B1/227 ,  B21B39/04 ,  B21B2265/24 ,  B21B2267/065 ,  B21B2273/02 ,  B22F3/18 ,  C22F1/18 ,  C23C14/3414 ,  Y10T428/12 ,  Y10T428/12014 ,  Y10T428/12458

Abstract: A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100 / / ND and 111 / / ND, which is substantially uniform throughout the plate.

Abstract translation: 提供难熔金属板。 板具有中心，厚度，边缘，顶表面和底表面，并且具有晶体学结构（通过厚度梯度，条带严重性以及板上的变化的特征，对于每个纹理组件100 / / ND和111 / ND，其在整个板中基本均匀。

公开(公告)号：WO2008063774A2

公开(公告)日：2008-05-29

申请号：PCT/US2007/081074

申请日：2007-10-11

Applicant: H.C. STARCK INC. ,  WU, Rong-chen, Richard ,  KUMAR, Prabhat ,  SUN, Shuwei

Inventor： WU, Rong-chen, Richard ,  KUMAR, Prabhat ,  SUN, Shuwei

IPC: C23C14/34 ,  C04B35/46 ,  C23C14/08

CPC classification number: H01B1/08 ,  C04B35/46 ,  C04B35/645 ,  C04B2235/3251 ,  C04B2235/3256 ,  C04B2235/3258 ,  C04B2235/404 ,  C04B2235/9653 ,  C23C14/083 ,  C23C14/3414

Abstract: The present invention is directed to a composition consisting essentially of: a) from about 80 to about 99 moie% of TiO2, and b) from about 1 to about 20 mole % of one or more materials selected from the group consisting of i) WO2, ii) Ta2O5, iii) Nb2O5, iv) MoO2, v) Mo, vi) Ta, vii) Nb, viii) W and ix) mixtures thereof, wherein the mole %s are based on the total product and wherein the sum of components a) and b) is 100. The invention is also directed to the sintered product of such composition, a sputtering target made from the sintered product and a transparent electroconductive film made from the composition.

Abstract translation: 本发明涉及一种基本上由以下组成的组合物：a）约80-约99摩尔％的TiO 2，和b）约1至约20摩尔％的一种或多种选自i）WO 2 ，ii）Ta 2 O 5，iii）Nb 2 O 5，iv）MoO 2，v）Mo，vi）Ta，vii）Nb，viii）W和ix）其混合物，其中摩尔％基于总产物， 组分a）和b）为100.本发明还涉及这种组合物的烧结产品，由烧结产品制成的溅射靶和由该组合物制成的透明导电膜。

公开(公告)号：WO2007027466A3

公开(公告)日：2007-03-08

申请号：PCT/US2006/032578

申请日：2006-08-21

Applicant: H.C. STARCK INC. ,  AIMONE, Paul, R.

Inventor： AIMONE, Paul, R.

IPC: C22B34/24 ,  C22B9/20 ,  C22C27/02 ,  C23C14/34

Abstract: A method of making an alloy of niobium that includes: A) forming a blend comprising niobium powder and a powder of a metal selected from the group consisting of yttrium, aluminum, hafnium, titanium, zirconium, thorium, lanthanum and cerium and pressing the blend to form pressed blend; B) attaching the pressed blend to an electrode comprising niobium; C) melting the electrode and pressed blend under vacuum arc remelting conditions, such that the blend mixes with the melted electrode; D) cooling the melted electrode to form an alloy ingot; and E) applying thermo-mechanical processing steps to the alloy ingot to form a wrought product. The method provides a fully recrystallized niobium wrought product with a grain size finer that ASTM 5, that can be used to make deep drawn cups and sputtering targets.

公开(公告)号：WO2006050205A3

公开(公告)日：2006-05-11

申请号：PCT/US2005/039150

申请日：2005-10-27

Applicant: H.C. STARCK INC. ,  BREIT, Henry, F. ,  WU, Rong-Chen, Richard ,  KUMAR, Prabhat

Inventor： BREIT, Henry, F. ,  WU, Rong-Chen, Richard ,  KUMAR, Prabhat

IPC: H01L23/373

Abstract: A substrate for semiconductor and integrated circuit components including: a core plate containing a Group VIB metal from the periodic table of the elements and/or an anisotropic material, having a first major surface and a second major surface and a plurality of openings extending, at least partially, from the first major surface to the second major surface; and a Group IB metal from the periodic table of the elements or other high thermally conductive material filling at least a portion of the space encompassed by at least some of the openings; and optionally, a layer containing a Group IB metal from the periodic table or other high thermally conductive material disposed over at least a portion of the first major surface and at least a portion of the second major surface.

公开(公告)号：WO2006039126A2

公开(公告)日：2006-04-13

申请号：PCT/US2005/033291

申请日：2005-09-19

Applicant: H.C. STARCK INC. ,  LEONID NATAN, Shekhter ,  LEONID, Lanin ,  CONLON, Anastasia, M.

Inventor： LEONID NATAN, Shekhter ,  LEONID, Lanin ,  CONLON, Anastasia, M.

CPC classification number: C22B5/04 ,  B22F9/20 ,  B22F9/22 ,  C22B26/22 ,  C22B34/24 ,  C22C1/045 ,  H01G9/0525

Abstract: A method of producing a refractory metal powder that includes providing a metal powder containing magnesium tantalate or magnesium niobate; and heating the powder in an inert atmosphere in the presence of magnesium, calcium and/or aluminum to a temperature sufficient to remove magnesium tantalate or magnesium niobate from the powder and/or heating the powder under vacuum to a temperature sufficient to remove magnesium tantalate or magnesium niobate from the powder, the heating steps being performed in any order. The metal powder can be formed into pellets at an appropriate sintering temperature, which can be formed into electrolytic capacitors.

Abstract translation: 一种生产难熔金属粉末的方法，该方法包括提供含有钽酸镁或铌酸镁的金属粉末; 并在惰性气氛中，在镁，钙和/或铝存在下将粉末加热至足以从粉末中除去钽酸镁或铌酸镁的温度和/或在真空下加热粉末至足以除去钽酸镁的温度或 来自粉末的铌酸镁，加热步骤以任何顺序进行。 金属粉末可以在合适的烧结温度下形成颗粒，可以形成电解电容器。

公开(公告)号：WO2006012165A2

公开(公告)日：2006-02-02

申请号：PCT/US2005/022147

申请日：2005-06-22

Applicant: H.C. STARCK INC. ,  SOLONENKO, Oleg, Pavlovich ,  KUZMIN, Victor Ivanovich ,  BELASHCHENKO, Vlaadimir, E.

Inventor： SOLONENKO, Oleg, Pavlovich ,  KUZMIN, Victor Ivanovich ,  BELASHCHENKO, Vlaadimir, E.

IPC: H05H1/34

CPC classification number: H05H1/34 ,  H05H1/42 ,  H05H2001/3426 ,  H05H2001/3436 ,  H05H2001/3452 ,  H05H2001/3468 ,  H05H2001/3484

Abstract: The present invention is a plasma jet generating apparatus that includes a cathode module having a cathode, an anode module having a first passage therethrough and an intermediate module positioned between the cathode and the anode module. The intermediate module includes at least one insert electrically isolated from the anode and cathode modules and defining a second passage in fluid communication between the cathode and the first passage. The first passage can initially converge and then, optionally, diverge in a direction away from the intermediate module. Also or alternatively, the second passage can optionally diverge in a direction toward the anode module. A pilot insert can be positioned between the anode module and the interelectrode insert for the purpose of initiating an electrical arc. A feeding module can be positioned to feed material adjacent the end of the anode module opposite the intermediate module for treatment by the plasma jet.

Abstract translation: 本发明是一种等离子体喷射发生装置，其包括具有阴极的阴极模块，具有第一通道的阳极模块和位于阴极和阳极模块之间的中间模块。 中间模块包括至少一个与阳极和阴极模块电隔离的插入件，并限定在阴极和第一通道之间流体连通的第二通道。 第一通道可以最初会聚，然后可选地沿远离中间模块的方向发散。 另外或者替代地，第二通道可以选择性地朝向阳极模块的方向发散。 引导插件可以位于阳极模块和电极间插入件之间，用于启动电弧。 馈送模块可以被定位成馈送邻近阳极模块的与中间模块相对的端部的材料，以便通过等离子体射流进行处理。