Abstract:
Provided is a doped quartz glass member for plasma etching, which is used in a plasma etching process and is free from any problematic fluoride accumulation during use. The quartz glass member for plasma etching is used as a jig for semiconductor production in a plasma etching process, and includes at least two or more kinds of metal elements in a total amount of 0.01 wt% or more to less than 0.1 wt%, in which the metal elements are formed of at least one kind of a first metal element selected from metal elements belonging to Group 3B of the periodic table and at least one kind of a second metal element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids.
Abstract:
The invention relates to an amplifying optical fiber comprising a central core adapted to convey and amplify an optical signal, and an cladding surrounding the central core and adapted to confine the conveyed optical signal in the central core. The central core is formed of a core matrix containing nanoparticles, the nanoparticles comprising a nanoparticle matrix and rare-earth-dopant elements. The core matrix also includes an additional dopant. Furthermore, the concentration by weight of rare-earth-dopant elements in the central core lies in the range 200 ppm to 1000 ppm, the concentration by weight of the nanoparticle matrix in the central core lies in the range 0.5 wt% to 5 wt%, preferably in the range 1.5 wt% to 4 wt%, and the concentration by weight of the additional dopant in the central core lies in the range 1 wt% to 10 wt%.
Abstract:
A light amplifying optical fiber capable of restricting a reduction in amplifying efficiency and non-linearity caused by the concentration quenching of erbium ions. At least one of rare earth elements, having an ion radius at least 70% and up to 130% of that of erbium and excluding erbium, for example, Yb, is added to the core portion of an erbium-ion-added light amplifying optical fiber.
Abstract:
In order to provide quartz glass which has excellent plasma corrosion resistance and can be used for semiconductor production, it is suggested to use a mixed quartz powder which is suitable for the production of the quartz glass. Furthermore, a production process for quartz glass using the quartz powder is provided. The mixed quartz glass powder containing from 0.1 to 20 mass % in total of two or more of dope elements, in which the dope element contains one or more of first elements selected from the group consisting of N, C and F and one or more of second elements selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids.
Abstract:
As a jig material to use under plasma reaction for producing semiconductors, the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt% in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt% or less.
Abstract:
A method for manufacturing an optical article including the steps of providing a substrate tube; forming one or more cladding layers inside the substrate tube, the one or more cladding layers including an innermost cladding layer; forming a concentric fluorine reservoir adjacent to the innermost cladding layer; and forming a core adjacent to the fluorine reservoir and concentric with the one or more outer cladding layers. The fluorine concentration in the fluorine reservoir is higher than the fluorine concentration in either the core or the innermost cladding layer.
Abstract:
Die Erfindung beschreibt ein Verfahren zur Herstellung von Quarzglas, das zusätzlich zu einer Dotierung mit Seltenen Erden und/oder Übergangsmetallen die Fluorierung des Quarzglases umfasst. Durch das beschriebene Verfahren lässt sich ein Ausdiffundieren er Dotanden während der Fluorierung verhindern. Weiterhin betrifft die Erfindung das nach dem erfindungsgemäßen Verfahren erhältliche Quarzglas sowie dessen Verwendung als laseraktives Quarzglas, zur Erzeugung von lichtführenden Strukturen und für den Einsatz in optischen Anwendungen.
Abstract:
Photodarkening resistant optical fiber lasing media and fiber lasers incorporating the same are disclosed. In one embodiment, an optical fiber lasing medium includes a core portion formed from silica-based glass comprising a rare-earth dopant and deuterium, the core portion having an index of refraction n c , a numerical aperture NA c . A concentration of defect color centers in the core portion is less than 1x10 16 /cm 3 . Deuterium is combined with the defect color centers to form reacted defect color centers that do not absorb ultraviolet and visible wavelengths of light. A first cladding portion is formed from silica-based glass, the first cladding portion surrounding and directly contacting the core portion and having an index of refraction n 1 , wherein the index of refraction n 1 of the first cladding portion is less than the index of refraction n c of the core portion. Methods of forming the photodarkening resistant optical fiber lasing media are also disclosed.