QUARTZ GLASS MEMBER FOR PLASMA ETCHING
    111.
    发明公开
    QUARTZ GLASS MEMBER FOR PLASMA ETCHING 有权
    QUARZGLASELEMENTFÜRDASPLASMAÄTZEN

    公开(公告)号:EP2194030A4

    公开(公告)日:2014-08-20

    申请号:EP08791510

    申请日:2008-07-24

    Abstract: Provided is a doped quartz glass member for plasma etching, which is used in a plasma etching process and is free from any problematic fluoride accumulation during use. The quartz glass member for plasma etching is used as a jig for semiconductor production in a plasma etching process, and includes at least two or more kinds of metal elements in a total amount of 0.01 wt% or more to less than 0.1 wt%, in which the metal elements are formed of at least one kind of a first metal element selected from metal elements belonging to Group 3B of the periodic table and at least one kind of a second metal element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids.

    Abstract translation: 提供了用于等离子体蚀刻的掺杂石英玻璃构件,其用于等离子体蚀刻工艺中,并且在使用期间没有任何有问题的氟化物积聚。 用于等离子体蚀刻的石英玻璃构件用作等离子体蚀刻工艺中的半导体制造的夹具,并且包括总量为0.01重量%以上至小于0.1重量%的至少两种以上的金属元素, 金属元素由选自属于周期表第3B族的金属元素中的至少一种第一金属元素和选自Mg,Ca,Sr等的至少一种第二金属元素形成, Ba,Sc,Y,Ti,Zr,Hf,镧系元素和锕系元素。

    QUARTZ GLASS EXCELLING IN PLASMA CORROSION RESISTANCE AND PROCESS FOR PRODUCING THE SAME
    116.
    发明公开
    QUARTZ GLASS EXCELLING IN PLASMA CORROSION RESISTANCE AND PROCESS FOR PRODUCING THE SAME 审中-公开
    QUARZKRISTALL MIT HERVORRAGENDERPLASMAKORROSIONSBESTÄNDIGKEITUND HERSTELLUNGSVERFAHRENDAFÜR

    公开(公告)号:EP1681276A1

    公开(公告)日:2006-07-19

    申请号:EP05748813.2

    申请日:2005-06-09

    Abstract: As a jig material to use under plasma reaction for producing semiconductors, the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt% in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt% or less.

    Abstract translation: 作为制造半导体的等离子体反应中使用的夹具材料,本发明提供一种具有耐等离子体腐蚀性,特别是耐氟基等离子体气体的耐腐蚀性的石英玻璃,可以在不产生硅晶片异常的情况下使用; 本发明还提供一种石英玻璃夹具及其制造方法。 含有0.1〜20重量%的两种以上金属元素的石英玻璃,所述金属元素包含选自元素周期表第3B族的至少一种金属元素作为第一金属元素和至少一种 金属元素选自Mg,Ca,Sr,Ba,Sc,Y,Ti,Zr,Hf,镧系元素和锕系元素作为第二金属元素,条件是每个第二金属元素的最大浓度为1.0 wt%以下。

    PHOTODARKENING RESISTANT OPTICAL FIBERS AND FIBER LASERS INCORPORATING THE SAME MADE BY OUTSIDE VAPOR DEPOSITION
    120.
    发明申请
    PHOTODARKENING RESISTANT OPTICAL FIBERS AND FIBER LASERS INCORPORATING THE SAME MADE BY OUTSIDE VAPOR DEPOSITION 审中-公开
    耐光光纤光纤和光纤激光器,由外部蒸发器沉积而成

    公开(公告)号:WO2012037003A1

    公开(公告)日:2012-03-22

    申请号:PCT/US2011/051158

    申请日:2011-09-12

    Abstract: Photodarkening resistant optical fiber lasing media and fiber lasers incorporating the same are disclosed. In one embodiment, an optical fiber lasing medium includes a core portion formed from silica-based glass comprising a rare-earth dopant and deuterium, the core portion having an index of refraction n c , a numerical aperture NA c . A concentration of defect color centers in the core portion is less than 1x10 16 /cm 3 . Deuterium is combined with the defect color centers to form reacted defect color centers that do not absorb ultraviolet and visible wavelengths of light. A first cladding portion is formed from silica-based glass, the first cladding portion surrounding and directly contacting the core portion and having an index of refraction n 1 , wherein the index of refraction n 1 of the first cladding portion is less than the index of refraction n c of the core portion. Methods of forming the photodarkening resistant optical fiber lasing media are also disclosed.

    Abstract translation: 公开了防光纤光纤激光介质和结合光纤激光器的光纤激光器。 在一个实施例中,光纤激光介质包括由包含稀土掺杂剂和氘的二氧化硅基玻璃形成的芯部分,芯部分具有折射率nc,数值孔径NAc。 核心部分中缺陷颜色中心的浓度小于1×1016 / cm3。 氘与缺陷色中心结合,形成不吸收紫外和可见波长光的反应缺陷色中心。 第一包层部分由二氧化硅基玻璃形成,第一包层部分围绕并直接接触芯部并具有折射率n1,其中第一包层部分的折射率n1小于折射率nc 的核心部分。 还公开了形成光抗剥离光纤激光介质的方法。

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