Abstract:
A spectrometric analyzing device is capable of analyzing a thin film with high accuracy by using light having an arbitrary wavelength, such as not only infrared light but also visible light, ultraviolet light and X-ray, and using whatever refractive index of a supporting member of the thin film. A spectrometric analyzing device comprises a light source (1), a polarizing filter (2), a detection unit (3), a regression operation unit (4) and an absorbance spectrum calculation unit (5). The light source (1) emits light at n different angles of incidence (θ n ) to a measurement portion. The polarizing filter (2) shields an s-polarized component. The detection unit (3) detects transmitted spectra (S). The regression operation unit (4) uses the transmitted spectra (S) and a mixing ratio (R) to obtain an in-plane mode spectrum (s ip ) and an out-of-plane mode spectrum (s op ) through a regression analysis. The absorbance spectrum calculation unit (5) calculates an in-plane mode absorbance spectrum (A ip ) and an out-of-plane mode absorbance spectrum (A op ) of the thin film, based on the results from a state in which the thin film is on the supporting member and a state in which no thin film is on the supporting member.
Abstract:
An ellipsometer or polarimeter system and method for controlling intensity of an electromagnetic beam over a spectrum of wavelengths by applying control (P2) and beam (P) polarizers, optionally in combination with an intervening and control compensator (C).
Abstract:
A method for determining analyte concentration levels is provided. The method includes acquiring radiation scattered off or transmitted by a target, analyzing at least a first portion of the radiation via a first technique to generate a first measurement of analyte concentration levels, and analyzing at least a second portion of the radiation via a second technique to generate a second measurement of analyte concentration levels. The method further determines analyte concentration levels based on at least one of the first measurement or the second measurement. In addition, a system for implementing the method and a probe for measuring and monitoring the analyte concentration levels is provided.
Abstract:
An optical device in which an end surface of a periodic multilayer structure is provided as a beam incidence surface or as a beam exit surface. The optical device can realize a high-resolving-power spectroscopic apparatus without having any increase in size of the apparatus and by use of good directivity of beam leaked from the multilayer structure and strong wavelength dependence of an angle of the leaked beam.
Abstract:
An optical spectrum analyzer comprises a diffraction grating (DG), a polarization decomposing unit (PDM) for decomposing the input light beam into first and second light beams having mutually-perpendicular linear states of polarization, and two output ports (FP2/1, FP2/2) each for receiving from the grating, substantially exclusively, a respective one of the polarized light beams (LT, LR) after diffraction by the diffraction grating (DG). Each of the linearly-polarized light beams is directed onto the diffraction grating with its linear state of polarization at any prescribed angle to a corresponding plane of diffraction of the diffraction grating. The arrangement is such that the state of polarization of the light beams, at any particular wavelength within an operating band of the analyzer remains substantially unchanged with respect to time. The analyzer also may have a reflector (RAM) for reflecting the light beams leaving the diffraction grating after diffraction a first time so as to return them to the diffraction grating for diffraction a second time.
Abstract:
A system and method for controlling polarisation state determining parameters of a polarised beam of light in an ellipsometer or polarimeter and the like system, so that they are in ranges wherein the sensitivity, of a sample system characterising PSI and DELTA value monitoring detector (DET) used to measure changes in said polarisation state resulting from interaction with a "composite sample system," comprised of a sample system per se. (SS) and a beam polarisation state determining variable retarder, to noise and measurement errors etc. therein), is reduced. This allows determining sample system per se. characterising PSI and DELTA values, from Composite Sample System characterising PSI and DELTA values, by compensating for the presence of components, (VR1) and/or (VR2), added to an ellipsometer or polarimeter and the like system. The arrangement also improves the ability of an ellipsometer or polarimeter and the like system fitted with components (VR1) and/or (VR2) to provide usably accurate and precise sample system characterising PSI and DELTA determining data values, wherein a sample system per se. investigating polarised beam of light is oriented at other than a Principal or Brewster Angle of Incidence thereto, the use of which Angle of Incidence would otherwise be difficult, if not impossible. The arrangement also allows determination of the "Handedness" of a polarised beam of light, and of sample system Jones or Mueller Matrix component values; and provides means for making system components (VR1) and/or (VR2) added to an ellipsometer or polarimeter and the like system, essentially end user transparent when desired, without removal thereof from said ellipsometer or polarimeter and the like system.
Abstract:
A high-speed ellipsometric measuring process for any number and sequence of measuring light wavelengths, suitable especially for the in situ measurement of processes on a substrate surface. A broad-band radiation source (1) and an opto-acoustically tunable filter (4) which can be controlled by a PC (10) are used for fast wavelength selection.