公开(公告)号：AU2003210868A1

公开(公告)日：2003-09-02

申请号：AU2003210868

申请日：2003-02-04

Applicant: THERMO FINNIGAN LLC

Inventor： SYKA JOHN E P

IPC: G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/00 ,  H01J49/02 ,  H01J49/38 ,  H01J49/42

Abstract: A circuit is described for applying RF and AC voltages to the elements or electrodes of an ion trap or ion guide. The circuit includes an RF transformer having a primary winding and a secondary winding. The secondary winding includes at least two filars. A broadband transformer adapted to be connected to a source of AC voltage applies AC voltage across the low-voltage end of two of the filars. Another broadband transformer connected to the filars at the high-voltage end provides a combined RF and AC output for application to selected electrodes. Also described is a circuit employing a multi-filar RF transformer and broadband transformers for applying RF and AC voltages to spaced rods of a linear ion trap. Also described is a circuit employing a multi-filar RF transformer and broadband transformers for applying RF and AC voltages to the electrodes in each section of a linear ion trap of the type having a center section and end sections, and different DC voltages to the electrodes in the end sections.

公开(公告)号：CA2474862A1

公开(公告)日：2003-08-14

申请号：CA2474862

申请日：2003-02-04

Applicant: THERMO FINNIGAN LLC

Inventor： SYKA JOHN E P

IPC: G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/00 ,  H01J49/02 ,  H01J49/38 ,  H01J49/42

Abstract: A circuit is described for applying RF and AC voltages to the elements or electrodes of an ion trap or ion guide. The circuit includes an RF transform er having a primary winding and a secondary winding. The secondary winding includes at least two filars. A broadband transformer adapted to be connecte d to a source of AC voltage applies AC voltage across the low-voltage end of t wo of the filars. Another broadband transformer connected to the filars at the high-voltage end provides a combined RF and AC output for application to selected electrodes. Also described is a circuit employing a multi-filar RF transformer and broadband transformers for applying RF and AC voltages to spaced rods of a linear ion trap. Also described is a circuit employing a multi-filar RF transformer and broadband transformers for applying RF and AC voltages to the electrodes in each section of a linear ion trap of the type having a center section and end sections, and different DC voltages to the electrodes in the end sections.

公开(公告)号：PL332232A1

公开(公告)日：1999-10-11

申请号：PL33223299

申请日：1999-03-26

Applicant: EBARA CORP

Inventor： NAITO YOSHIHIKO

IPC: H01J37/30 ,  B01D53/00 ,  B01D53/60 ,  B01D53/74 ,  G21K5/04 ,  H01J3/26 ,  H01J43/00

Abstract: To provide an electron beam irradiation device capable of avoiding a problem of convergence of an electron beam at the maximum scanning points, and constantly obtaining an irradiated region of uniform energy density, an electron beam irradiation device comprising an electron beam source 12, an accelerating tube 13 for accelerating electrons emitted from said electron beam source, a focusing electromagnet 16 for applying a magnetic field to a high energy electron beam, which is formed by the accelerating tube, for controlling the beam diameter of the electron beam, and an electromagnet 17 for deflecting and scanning the beam-diameter-controlled electron beam by applying a magnetic field to the electron beam, wherein an electric current component IF which is synchronized with an electric current IS of the scanning electromagnet 17 is superimposed on an electric current IF of the focusing electromagnet 16, thereby controlling the electric current IF of the focusing electromagnet in a manner that said beam diameter becomes maximum at the maximum scanning points.

公开(公告)号：RU2119244C1

公开(公告)日：1998-09-20

申请号：RU97111550

申请日：1997-07-11

Applicant: POLIKS ,  TOVARISHCHESTVO S OGRANICHENNO

Inventor： POPANDOPULO G V

IPC: H03K17/28 ,  H01J3/00 ,  H01J3/26 ,  H03K17/296 ,  H04L12/54

公开(公告)号：FR2690005B1

公开(公告)日：1994-05-20

申请号：FR9204430

申请日：1992-04-10

Applicant: COMMISSARIAT A ENERGIE ATOMIQUE

Inventor： MOLVA ENGIN ,  ACCOMO ROGER

IPC: H01J1/304 ,  H01S3/0959 ,  H01S5/00 ,  H01S5/04 ,  H01J1/30 ,  H01J3/02 ,  H01J3/26 ,  H01S3/18

Abstract: PCT No. PCT/FR93/00353 Sec. 371 Date Dec. 9, 1993 Sec. 102(e) Date Dec. 9, 1993 PCT Filed Apr. 8, 1993 PCT Pub. No. WO93/21646 PCT Pub. Date Oct. 28, 1993.Compact electron gun having a microdot electron source and a semiconductor laser using said gun for electronic pumping. A compact electron gun is provided having a microdot electron emitting source (2), an anode (8) spaced from the microdots, means (16) for applying a high voltage to the and, array (10) of electrodes distributed around the bean emitted by the source for the strip focussing thereof onto the anode. The array also serves as an electrostatic screen for the source with respect to the high voltage of the array. The array is positioned between the source and the anode and has at least two pairs of electrodes (18, 18b, 20a, 20b) of different dimensions which are raised to respectively positive and negative voltages. The positive and the negative voltages produce a weak electrostatic field between the source and the electrode array and a strong electrostatic field between the electrode array and the anode. The electron gun also has means for applying a medium voltage to the electrode array and means for applying an appropriate voltage to the microdots.

公开(公告)号：CA2069767A1

公开(公告)日：1992-11-30

申请号：CA2069767

申请日：1992-05-28

Applicant: ETEC SYSTEMS INC

Inventor： GESLEY MARK

IPC: H01J9/44 ,  H01J37/04 ,  H01J37/305 ,  H01L21/027 ,  H01L21/30 ,  H01J3/26

Abstract: The accuracy of a double-deflection beam blanker is dramatically improved for all blanker voltages by using provided, closed-form, trajectory equations to determine the blanker geometric parameters and compensating for fringe-field affects in order to precisely determine the delay line length for control of an electron or ion beam. This delay line length is maintained by placing alignment apertures above and below the blanker.

公开(公告)号：CS272986A1

公开(公告)日：1989-07-12

申请号：CS272986

申请日：1986-04-14

Applicant: DELONG ARMIN ,  KOLARIK VLADIMIR RNDR

Inventor： DELONG ARMIN AKADEMIK ,  KOLARIK VLADIMIR RNDR

IPC: H01J3/26

公开(公告)号：CA1229430A

公开(公告)日：1987-11-17

申请号：CA456628

申请日：1984-06-14

Applicant: AMERICAN TELEPHONE & TELEGRAPH

Inventor： LIU RUICHEN ,  THOMSON MICHAEL G R

IPC: H01J1/30 ,  H01J1/304 ,  H01J37/073 ,  H01J37/305 ,  H01L21/30 ,  G21K1/08 ,  H01J3/14 ,  H01J3/26

Abstract: ELECTRON EMISSION SYSTEM An electron emission system includes a highbrightness field-emitter cathode. Advantageously, the tip of the cathode is shaped to minimize structural variations caused by surface tension forces. In addition, an electrode assembly associated with the cathode is designed to establish electric field forces that are opposite and at least approximately equal to the surface tension forces acting on the tip. The electric field forces can be adjusted to establish a highly stable operating condition without altering the value of electron beam energy for which the overall system was designed. Moreover, the current density of the beam at a writing surface can be selectively varied without changing prescribed operating parameters of the cathode. The resulting system is characterized by excellent emission stability, low noise and a useful operating life of at least several thousand hours.

公开(公告)号：DD203428B1

公开(公告)日：1986-12-17

申请号：DD23496681

申请日：1981-11-19

Applicant: DRESDEN ING HOCHSCHULE

Inventor： IHLEFELD JOACHIM ,  PIETSCH EBERHARD

IPC: H01J3/26 ,  H04N3/26

公开(公告)号：HU185609B

公开(公告)日：1985-03-28

申请号：HURA000690

申请日：1978-09-28

Applicant: RCA CORP

Inventor： MIRSCH JOHN W

IPC: H01J9/236 ,  H01F5/00 ,  H01J29/76 ,  H01J3/26 ,  H04N3/00