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公开(公告)号：KR1020020078037A
公开(公告)日：2002-10-18
申请号：KR1020010017874
申请日：2001-04-04
Applicant: 전자부품연구원
IPC: G02B26/00
Abstract: PURPOSE: A 1 x N optical switch is provided to have a very simple structure by using a refraction of a light beam. CONSTITUTION: A 1 x N optical switch includes an input port for receiving an incident light beam(1), N number of output ports for outputting a transmitted light beam(3) and an optical refraction plate, placed between the input port and the output ports, for allowing an optical path of the transmitted light beam(3) to translate in parallel by refracting the incident light beam(1). The optical refraction plate includes a transparent plate(2), a pair of antireflection layers(8) attached both sides of the transparent plate(2) for preventing the incident light beam(1) from reflecting and a rotating axis(9) formed at the center portion of one of the antireflection layers(8). The optical refraction plate, located at an incident plane of the incident light beam(1), is capable of selecting an output port to output the transmitted light beam(3) among the N number of output ports by rotating with respect to a straight line passing through an incident point of the incident light beam(1).
Abstract translation: 目的：通过使用光束的折射，提供1 x N的光开关以具有非常简单的结构。 构成：1×N光开关包括用于接收入射光束（1）的输入端口，N个用于输出透射光束（3）的输出端口和放置在输入端口和输出端之间的光学折射板 端口，用于允许透射光束（3）的光路通过折射入射光束（1）平行平移。 光学折射板包括透明板（2），安装在透明板（2）的两侧的一对防反射层（8），用于防止入射光束（1）反射，以及旋转轴线（9）形成在 一个防反射层（8）的中心部分。 位于入射光束（1）的入射面的光折射板能够通过相对于直线旋转而选择输出端口以输出N个输出端口中的透射光束（3） 通过入射光束（1）的入射点。
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公开(公告)号：KR100322482B1
公开(公告)日：2002-06-24
申请号：KR1019980005940
申请日：1998-02-25
Applicant: 전자부품연구원
IPC: H01L21/304
Abstract: PURPOSE: A bulk micro-machining system is provided to improve yield of micro-sensors and micro-actuators fabricated on a wafer by uniformly keeping concentration of an etch solution and by overcoming temperature gradient of the etch solution. CONSTITUTION: A micro-machining system includes an apparatus for overcoming the temperature gradient of an etch solution in a bath(3) receiving a wafer(1). The bath(3) is provided with a washing apparatus for injecting a washing solution onto the etched wafer. The bath(3) has a drying apparatus for injecting a drying gas onto the washed wafer. The bath(3) also has a circulation apparatus for inflow and exhaust of the etch solution into/from the container. The apparatus for overcoming the temperature gradient of the etch solution includes a heater(9) adjusting the temperature of the etch solution and a condenser(11) adjusting the concentration of the etch solution. The condenser(11) is in the form of a plate, having a cooling water flowing path(33) therein.
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公开(公告)号：KR1020020047651A
公开(公告)日：2002-06-22
申请号：KR1020000076149
申请日：2000-12-13
Applicant: 전자부품연구원
IPC: H01J9/02
CPC classification number: H01L51/0011 , H01L27/32
Abstract: PURPOSE: A method for fabricating an organic electro-luminescence shadow mask is provided to enhance resolution of the organic electro-luminescence shadow mask by using a photo-resist layer of high density and a metal plating process. CONSTITUTION: A photo-resist layer of high density is formed on a silicon substrate by using a spin coating method. The photo-resist layer of high density is exposed and developed by using a chrome mask. A photo-resist layer pattern of a desired size and a desired shape is formed by the exposing process and the developing process. A nickel layer is formed on the photo-resist layer pattern. The photo-resist layer pattern is exposed and a metal layer(32) is formed by polishing the nickel layer. An empty space(24) is formed by removing the photo-resist layer pattern from the nickel layer. The silicon substrate is removed by performing an etch process.
Abstract translation: 目的：提供一种制造有机电致发光荫罩的方法，通过使用高密度和金属电镀工艺的光致抗蚀剂层来提高有机电致发光荫罩的分辨率。 构成：通过使用旋涂法在硅衬底上形成高密度的光致抗蚀剂层。 通过使用镀铬掩模使高密度的光致抗蚀剂层曝光和显影。 通过曝光处理和显影处理形成期望尺寸和期望形状的光致抗蚀剂层图案。 在光致抗蚀剂层图案上形成镍层。 曝光光刻胶层图案，通过研磨镍层形成金属层（32）。 通过从镍层去除光致抗蚀剂层图案来形成空的空间（24）。 通过执行蚀刻工艺去除硅衬底。
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公开(公告)号：KR100327619B1
公开(公告)日：2002-03-15
申请号：KR1020000006053
申请日：2000-02-09
IPC: G01P15/08
Abstract: 본 발명의 반도체 실리콘 가속도센서는 측정하고자 하는 외부가속도가 발생하였을 때 가속도 크기에 비례하는 힘을 발생시키는 중앙 부분의 X, Y축 대칭으로 이루어진 네 부분의 진동질량부(20)와, 상기 진동질량을 지지대에 연결하고 쉽게 움직일 수 있도록 해주는 스프링부(22)와, 진동질량의 가속도에 비례하는 변위의 크기를 전기적 신호로 변환시켜주는 진동질량에 있는 빗살모양의 이동전극부(24) 및 외측 지지대에 위치하는 고정전극부(26)로 구성되어 진다.
본 발명에 의하면 타축가속도에 의해 센서구조물이 움직이더라도 이것이 구조적으로 자체 상쇄됨으로써 센서의 최종출력에는 영향을 미치지 않을 뿐만 아니라, 과대변위에 따른 센서파손을 막을 수 있다.-
公开(公告)号：KR100324716B1
公开(公告)日：2002-02-16
申请号：KR1020000006057
申请日：2000-02-09
IPC: H01L23/52
Abstract: 본 발명은 반도체의 미세구조물을 패키징하는 방법에 관한 것으로서 보다 구체적으로는 구조물의 움직임을 가능하게 하는 구조물 웨이퍼의 희생층을 먼저 식각한 후, 덮게 웨이퍼로 접합한 상태에서 스루홀 형성 및 금속화 공정을 행하는 미세구조물의 패키징에 관한 것이다.
본 발명에 의하면 본딩패드의 식각으로 인한 수율저하를 방지함과 전극형성 공정을 단순화시킴으로 동시에 제작비면에서도 저렴한 신규한 미세구조물 패키징 방법을 제공할 수 있다.-
Patent Agency Ranking
公开(公告)号：KR100320040B1
公开(公告)日：2002-01-09
申请号：KR1019990063040
申请日：1999-12-27
Applicant: 전자부품연구원
IPC: B29D11/00
Abstract: 이발명은비구면렌즈의제조방법및 비구면렌즈사출용금형제조방법을개시한다. 기판상에감광막이형성되어있는노광시편위에비구면렌즈제조를위한노광마스크를위치시키고상기노광시편의회전축과노광마스크의중심축을정렬시킨다음에, 노광마스크는고정시키고상기노광시편은회전시키면서상기노광마스크위로 X-선을조사하여감광막을노광시킨다. 그리고감광막을현상하여비구면렌즈를형성한다. 또한, 현상된감광막즉, 감광막구조물위에도금기저층을형성하고, 도금기저층위에전기도금공정을수행하여도금층을형성한다음에, 상기도금층을상기감광막구조물로부터분리하여비구면렌즈를사출성형하기위한금형틀에결합하여사출금형을제조한다. 이와같이 X-선사진식각공정을이용하여저가의비용으로보다정밀한형상을가지는비구면렌즈를용이하게제조할수 있다. 또한비구면렌즈를사출성형하기위한금형이 X-선사진식각공정에따라제조됨으로써, 보다정밀하고미세한크기의비구면렌즈를대량으로제조할수 있다.
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公开(公告)号：KR1020010086618A
公开(公告)日：2001-09-15
申请号：KR1020000006053
申请日：2000-02-09
IPC: G01P15/08
CPC classification number: G01P15/10 , B06B1/045 , G01P15/125 , G01P15/18
Abstract: PURPOSE: An apparatus composed of a semiconductor silicon for sensing an acceleration is provided to prevent a damage due to the overrange without interfering the final output of a sensor by compensating for a displacement in itself even if the structure of the sensor is moved. CONSTITUTION: Four vibration-mass unit(20) generate a force proportional to the magnitude of an acceleration when an external acceleration to be measured is generated, wherein the center of each vibration-mass unit is composed of crossed X and Y axes. A spring unit(22) connects the vibration-mass units(20) to a supporting member to make it to easily be moved. A mobile electrode(24) converts into an electrical signal the magnitude of a displacement proportional to the acceleration of the vibration-mass units(20). The mobile electrode(24) is provided on the vibration-mass units(20) and a fixed electrode(26) is placed on an outer supporting member.
Abstract translation: 目的：提供一种由用于感测加速度的半导体硅组成的装置，以便即使传感器的结构移动，也可以通过补偿位移本身来防止由于超范围造成的损坏而不干扰传感器的最终输出。 构成：当产生要测量的外部加速度时，四个振动质量单元（20）产生与加速度的大小成比例的力，其中每个振动质量单元的中心由交叉的X和Y轴组成。 弹簧单元（22）将振动质量单元（20）连接到支撑构件以使其容易地移动。 移动电极（24）将与振动质量单元（20）的加速度成比例的位移的大小转换为电信号。 移动电极（24）设置在振动质量单元（20）上，固定电极（26）被放置在外部支撑构件上。
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公开(公告)号：KR1020010060635A
公开(公告)日：2001-07-07
申请号：KR1019990063040
申请日：1999-12-27
Applicant: 전자부품연구원
IPC: B29D11/00
Abstract: PURPOSE: Provided is a process for producing non-spherical surface lens, which is very easy and can make precisely by using X-ray lithography process. CONSTITUTION: The process contains the steps of: i) installing an exposure mask for producing the non-spherical surface lens at an exposure sample formed a sensitive film on a plate and arranging a shaft of the exposure sample and the center axis of the exposure mask; ii) fixing the exposure mask and irradiating light on the exposure mask to exposure the sensitive film while the exposure sample rotates; and then iii) developing the sensitive film.
Abstract translation: 目的：提供非球形表面透镜的制造方法，这是非常容易的，并且可以通过使用X射线光刻工艺精确地制造。 构成：该方法包括以下步骤：i）在曝光样品上安装用于制造非球形表面透镜的曝光掩模，在曝光样品上形成敏感膜并且布置曝光样品的轴和曝光掩模的中心轴 ; ii）固定曝光掩模并在曝光掩模上照射光以在曝光样品旋转时曝光敏感膜; 然后iii）开发敏感膜。
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公开(公告)号：KR1020010009173A
公开(公告)日：2001-02-05
申请号：KR1019990027428
申请日：1999-07-08
Applicant: 전자부품연구원
IPC: B29D11/00
Abstract: PURPOSE: Provided are a process for producing a high accurate microlens of various shapes by using X-ray lithography and a process for producing a die for injecting the microlens. CONSTITUTION: The process for producing the microlens(40) comprises the steps of: forming PMMA or a photosensitive film on a substrate(11); arraying an X-ray mask(20) and the substrate(11); exposing the substrate(11) by using the X-ray mask(20); eliminating the exposed PMMA or photosensitive film by using a developer; arraying the X-ray mask(20) and the rotary shaft(30) of the substrate(11); fixing the X-ray mask(20) and rotating the substrate(11) and exposing the substrate(11) in order to form the geometric shapes according to the shapes of absorbed bodies(21) on the X-ray mask and the position of the rotary shaft(30); eliminating the exposed PMMA or photosensitive film by using the developer to develop the geometric shapes.
Abstract translation: 目的：提供通过使用X射线光刻制造各种形状的高精度微透镜的方法以及用于制造用于注射微透镜的模具的方法。 构成：微透镜（40）的制造方法包括以下步骤：在基板（11）上形成PMMA或感光膜; 排列X射线掩模（20）和衬底（11）; 通过使用X射线掩模（20）使衬底（11）暴露; 通过使用显影剂消除曝光的PMMA或感光膜; 排列基板（11）的X射线掩模（20）和旋转轴（30）; 固定X射线掩模（20）并旋转衬底（11）并暴露衬底（11），以便根据X射线掩模上的吸收体（21）的形状和位置来形成几何形状 旋转轴（30）; 通过使用显影剂来除去暴露的PMMA或感光膜以形成几何形状。
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公开(公告)号：KR100248194B1
公开(公告)日：2000-03-15
申请号：KR1019970036540
申请日：1997-07-31
Applicant: 전자부품연구원
Abstract: 본 발명은 실리콘 기판의 표면 중앙 상에 형성된 사각형의 다이아프램 영역과, 상기 다이아프램 영역내에서 상기 다이아프램 영역의 각 측면의 중간부분과 인접하여 배열된 4개의 압저항들과, 브릿지 회로를 형성하도록 상기 압저항들과 전기적으로 연결된 저항층들과, 상기 다이아프램 영역의 밖에서 상기 저항층들을 전기적으로 연결하는 금속층으로 구성된 압저항형 압력 센서에 있어서, 상기 압저항들은 복수개의 저항들이 직렬연결된 형태로 되어 있고, 상기 세 개의 저항들을 연결하는 부분과 상기 저항층은 상기 다이아프램 영역의 각 측면에서 직각이 아닌 예각을 갖게 배열되어 있다. 따라서, 본 발명의 압저항형 압력센서는 압저항들의 불일치로 인한 옵셋전압 및 드리프트 감소로 고정밀의 압력센서를 필요로 하는 곳에 응용할 수 있다.
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