公开(公告)号：JPH06317534A

公开(公告)日：1994-11-15

申请号：JP9954193

申请日：1993-04-26

Applicant: CANON KK

Inventor： TSUJI TOSHIHIKO ,  TAKEUCHI SEIJI ,  MIYAZAKI KYOICHI ,  YOSHII MINORU ,  NOSE TETSUSHI ,  MORI TETSUZO

IPC: G01B11/24 ,  G01B11/30 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956

Abstract: PURPOSE:To detect micro foreign mater or defects at a high S/N ratio by radiating two light fluxes, which are different from each other in polarization status and wavelength, on the inspection position and generating a heterodyne interference between one light flux in which the polarization status of scattered light changed and the other light flux. CONSTITUTION:A laser beam 12a is led through an optical scanning system consisting of a scanning mirror 13 and an ftheta lens system 14 and then it is divided into a P polarization laser beam 15a and an S polarization laser beam 15b through a polarization beam splitter 15. The beam 15a is set by a filter system 16 in a manner to have an intensity most suitable to the foreign matter inspection and it is converged on an inspection surface 21 by a mirror 18 to form a spot 20. On the other hand, the beam 15b is also converged on the spot 20 on the surface of a face to be inspected 21 by a mirror 19 after passing through a filter system 17. Then, a P-polarized zero-th order diffracted light 23 out of the scattered light, which are directed in a photoelectric detector 29 direction from the spot 20, and a P-polarized element of backscattered light 24 caused by foreign matter or defects generate heterodyne interference because of the alignment of polarization plane, so that only the scattered light caused by the foreign matters or defects can be detected as a beat signal.

公开(公告)号：JPH06207808A

公开(公告)日：1994-07-26

申请号：JP28019293

申请日：1993-10-12

Applicant: CANON KK

Inventor： CHITOKU KOICHI ,  MATSUMOTO TAKAHIRO ,  SAITO KENJI ,  NOSE TETSUSHI ,  TSUJI TOSHIHIKO ,  YOSHII MINORU

IPC: G01B9/02 ,  G01B11/00 ,  G01J9/04 ,  G03F9/00

Abstract: PURPOSE:To enable highly accurate measurement by reducing leak-in light contained in a luminous flux. CONSTITUTION:An optical element 44 composed of a plurality of polarization beam splitters is provided on an optical path of a 2-frequency linearly polarized laser light source 41 and a luminous flux from the 2-frequency linearly polarized laser light source 41 is divided in two with the optical element 44 and then, enters diffraction gratings 46 and 48 provided respectively on a 2-luminous flux mask 45 and a wafer 47. Mirrors 49 and 50 paired are provided above vertical to the mask 45 and lenses 51 and 54 paired polarizing plates 52 and 55 paired and photoelectric detectors 53 and 56 paired are arranged sequentially in directions of reflection thereof. Outputs of the two photoelectric detectors 53 and 56 turn to beat signals and a phase difference between the beat signals is measured to position the mask 45 with the wafer 47. Here, the optical element 44 is made up of the plurality polarization beam splitters thereby reducing leak-in light contained in the respective luminous fluxes.

公开(公告)号：JPH06201601A

公开(公告)日：1994-07-22

申请号：JP1884993

申请日：1993-02-05

Applicant: CANON KK

Inventor： TSUJI TOSHIHIKO ,  MIYAZAKI KYOICHI ,  TAKEUCHI SEIJI ,  YOSHII MINORU ,  NOSE TETSUSHI

IPC: G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

Abstract: PURPOSE:To provide an inspecting device which can detect a very small foreign matter, a defect which has been heretofore difficult to be detected at a high S/N ratio. CONSTITUTION:A laser beam 34 which includes two light components in which frequencies are different by DELTAomega and polarizing directions are coincide is generated. It is branched by a half mirror 13, and one is detected by a photoelectric detector 24, and input as a reference light to a sync detector 25. The other is scanned as a laser beam 35 on an inspecting surface 18 by a scanning optical system having a polygonal mirror 15 and an ftheta lens 16. The beam 35 is intensity- modulated by a beat frequency DELTAomega at a scanning spot position on the surface 18 by a light heterodyne interference. Scattered lights 35 scattered by the matter, a defect existing on the surface 18 are detected by a photoelectric detector 22, and input to the detector 25. The detector 25 detects a scattered light signal in synchronization with the frequency DELTAomega of the previous reference light.

公开(公告)号：JPH0642914A

公开(公告)日：1994-02-18

申请号：JP21817292

申请日：1992-07-24

Applicant: CANON KK

Inventor： HASEGAWA MASANORI ,  YOSHII MINORU ,  SEKINE MASAYOSHI ,  MISHIMA SEIJI ,  OGURI NOBUAKI

IPC: G01B11/00 ,  G01B11/02

Abstract: PURPOSE:To obtain a displacement measuring apparatus which can detect displacement data of an article in the simple constitution with high accuracy. CONSTITUTION:The apparatus has a light source part 5, an optical member 4 which emits a beam of light from the light source part 5 as a linear beam, a reflecting mirror 3 for reflecting the linear beam form the optical member toward an object, and a detecting part 2 which detects the entering position of the reflecting light from the object onto a predetermined surface. These parts are set on the same stage. The displacement data of the object is obtained by using output signals from the detecting part 2.

公开(公告)号：JPH068726B2

公开(公告)日：1994-02-02

申请号：JP11226687

申请日：1987-05-11

Applicant: CANON KK

Inventor： YOSHII MINORU ,  KURODA AKIRA ,  NOSE TETSUSHI ,  NIWA JUKICHI

IPC: G01B11/00 ,  G01D5/38 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

公开(公告)号：JPH0590143A

公开(公告)日：1993-04-09

申请号：JP27695291

申请日：1991-09-27

Applicant: CANON KK

Inventor： NOSE TETSUSHI ,  SAITO KENJI ,  CHITOKU KOICHI ,  OSAWA MASARU ,  YOSHII MINORU ,  TSUJI TOSHIHIKO ,  MATSUMOTO TAKAHIRO

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

Abstract: PURPOSE:To obtain position deviation between grating patterns, by using interference light of two grating patterns on the same object. CONSTITUTION:The luminous flux of a laser light source 3 is divided into two directions according to the polarization directions, by a polarization beam split surface 20a in a prism 20, and guided to a wafer 1 by mirror surfaces 20b, 20c. Two diffraction gratings 2a, 2b are so arranged on the upper surface of the wafer 1 that the grating directions are in parallel to each other. The diffracted lights from the wafer 1 are combined and made to interfere by a Glan-Thompson prism 10, and detected by photo detectors 12, 14 according to the polarization directions. From the outputs of the photo detectors 12, 14, phase difference is measured by a phase meter 13, and the position deviation between the diffraction gratings 2a, 2b are obtained. In particular, a means for sensing mutual position relation between the wafer 1 and an irradiation optical system of laser light is installed.

公开(公告)号：JPH0412523A

公开(公告)日：1992-01-17

申请号：JP11544690

申请日：1990-05-01

Applicant: CANON KK

Inventor： NOSE TETSUSHI ,  SUDA SHIGEYUKI ,  YOSHII MINORU

IPC: G01B11/00 ,  G01B11/14 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable the detection of surface interval and position slip to be performed with high precision by a method wherein the surface interval between a mask and a wafer is detected by slipping the mutual positions of the mask and the wafer by specific amount corresponding to the dimensions of AA marks. CONSTITUTION:The distance between a spot 30 on the primary focussing surface 32 formed by diffracting the pattern of AA alignment marks (AA marks) 20M1, 20W1 and another spot 31 on the primary focussing surface 32 formed by diffracting the pattern of AA marks 20M2, 20W2 is fluctuated corresponding to the position slip amount between a mask 18 and a wafer 19. On the other hand, the distance between these two spots 30 and 31 is projected on an AA line sensor 12 surface of a photodetector 11 by a photodetecting lens 10. Next, the light intensity of the two spots 30, 31 is detected by the AA line sensor 12 so as to detect the relative position slip between the mask 18 and the wafer 19. Through these procedures, the detection of surface interval and the position slip can be performed with high precision.

公开(公告)号：JPH0412207A

公开(公告)日：1992-01-16

申请号：JP11544790

申请日：1990-05-01

Applicant: CANON KK

Inventor： SUDA SHIGEYUKI ,  SAITO KENJI ,  YOSHII MINORU

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To detect the relative position between a first and a second objects with high accuracy by providing a reference mark on a first object surface, utilizing a diffracted light of a prescribed degree generated from the reference mark, and detecting the relative position of a projecting means and a first object. CONSTITUTION:A pickup housing in which a projecting means is contained is moved, and a reference mark 100 is radiated by a projected luminous flux L2. Subsequently, based on a calculated relative misalignment value, the pickup housing is moved. In this case, since a relative position of the reference mark 100 and alignment marks 5, 6 is a known value from the time of generation of a mask pattern, the projecting means can be driven, based on its value. In such a way, by setting initially a first object and the pickup housing containing the projecting means, a precise alignment of a first and a second objects can be executed. Accordingly, the misalignment between a first and a second objects can be detected with high accuracy.

公开(公告)号：JPH0411468A

公开(公告)日：1992-01-16

申请号：JP11266490

申请日：1990-04-29

Applicant: CANON KK

Inventor： TOKUMITSU JUN ,  SEKINE MASAYOSHI ,  YOSHII MINORU ,  SUDA SHIGEYUKI

IPC: G02B7/28 ,  H04N5/232

Abstract: PURPOSE:To attain highly stable detection at all times with high accuracy by providing a correction means detecting the movement of a picture and correcting the movement and detecting a focus based on a signal component whose movement is corrected by the movement detection means. CONSTITUTION:An X axis projection circuit 7 obtains an X axis component signal 8 from a moving vector obtained from a moving vector arithmetic circuit 6. an edge detection circuit 9 detects an edge from information such as a tilt with respect to a picture signal and selects an edge with a larger tilt with respect to the X axis as an edge for focus discrimination, for example. An edge calculation circuit 10 calculates the edge from the density difference of the edge and the tilt of the edge and outputs the result as an edge width signal 11. The signal 11 is subtracted from a signal 8 and the result is fed to a comparator 12, and the signal is a corrected edge width signal. The comparator 12 writes a smaller edge width signal to a memory 13 in two corrected edge width signals and gives a control signal to a lens control circuit 14. Thus, the deterioration in the accuracy such as an unsharpened edge is prevented.

公开(公告)号：JPH0235304A

公开(公告)日：1990-02-05

申请号：JP33473388

申请日：1988-12-29

Applicant: CANON KK

Inventor： SUDA SHIGEYUKI ,  SAITO KENJI ,  MATSUGI MASAKAZU ,  NOSE TETSUSHI ,  NIWA YUKICHI ,  YOSHII MINORU

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To obtain a highly accurate position aligning apparatus having a wide detecting range by condensing an alignment mark on a first body on a specified plane, expanding said light condensed point on a detecting plane with an alignment mark on a second body, and forming an image. CONSTITUTION:Luminous flux which is emitted from a light source 7 is made to be parallel light through a light projecting lens system 8. A first alignment pattern 4 which is a reticle 1 as a first body is illuminated. The first alignment pattern 4 is condensed at a point P through a physical optical element constituting the pattern. Thereafter, the light is condensed at a point Q which is separated by a distance (a) from a wafer 2 as a second body through a light condensing optical system 3. A physical optical element having a second alignment pattern 5 is provided on the wafer 2. The incident luminous flux which is condensed at the point Q is reflected. The image of the luminous flux is formed on a detecting plane 6 of a light detecting means through a half mirror 9. The amount delta of the relative position deviation between the reticle 1 and the wafer 2 is obtained based on the amount epsilon of the deviation of the center of gravity from the specified position of the amount of the luminous flux which is guided on the detecting plane 6.