公开(公告)号：DE69524298T2

公开(公告)日：2002-06-13

申请号：DE69524298

申请日：1995-06-19

Applicant: CANON KK

Inventor： MATSUMOTO TAKAHIRO ,  SENTOKU KOICHI

IPC: G01B9/02 ,  G01D5/26 ,  G01J9/04

Abstract: A displacement measuring method for measuring displacement of an object to be examined is disclosed, wherein light which contains two components having a small difference in frequency is separated into a first light of a firs wavelength and a second light of a second wavelength, having different frequencies. First light beam of the first light and a second light beam of the second light interfere with each other, wherein at least one of the first and second light beams is directed via the object, whereby a first light beat signal is produced. Third light beam of the first light and a fourth light beam of the second light interfere with each other, wherein at least one of the third and fourth light beams is directed via the object, whereby a second light beat signal having a predetermined phase difference as compared with the first light beat signal is produced. Then, displacement of the object is measured on the basis of a phase resulting from comparison of the phases of the first and second light beat signals.

公开(公告)号：DE69225858T2

公开(公告)日：1998-11-12

申请号：DE69225858

申请日：1992-09-24

Applicant: CANON KK

Inventor： NOSE NORIYUKI ,  YOSHII MINORU ,  SAITOH KENJI ,  OSAWA HIROSHI ,  SENTOKU KOICHI ,  TSUJI TOSHIHIKO ,  MATSUMOTO TAKAHIRO

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

Abstract: A device and method for measuring the positional deviation between a plurality of diffraction gratings (2a,2b) formed on the same object (1) include an illumination optical system (3,6,20,21) for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system (22,23,10) for forming at least one interference light beam from the plurality of diffracted light beams, a detector (12,14) for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion (31-33,41-44) for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

公开(公告)号：DE69207657T2

公开(公告)日：1996-10-17

申请号：DE69207657

申请日：1992-07-09

Applicant: CANON KK

Inventor： MATSUMOTO TAKAHIRO ,  YOSHII MINORU ,  SAITO KENJI ,  NOSE HIROYASU ,  SENTOKU KOICHI ,  TAKEUCHI SEIJI

IPC: G01B9/02 ,  G03F9/00

公开(公告)号：CA2078731A1

公开(公告)日：1993-03-28

申请号：CA2078731

申请日：1992-09-21

Applicant: CANON KK

Inventor： NOSE NORIYUKI ,  YOSHII MINORU ,  SAITOH KENJI ,  OSAWA HIROSHI ,  SENTOKU KOICHI ,  TSUJI TOSHIHIKO ,  MATSUMOTO TAKAHIRO

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G01B9/02

Abstract: A device and method for measuring the positional deviation between a plurality of diffraction gratings (2a,2b) formed on the same object (1) include an illumination optical system (3,6,20,21) for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system (22,23,10) for forming at least one interference light beam from the plurality of diffracted light beams, a detector (12,14) for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion (31-33,41-44) for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

公开(公告)号：CA2078726A1

公开(公告)日：1993-03-28

申请号：CA2078726

申请日：1992-09-21

Applicant: CANON KK

Inventor： MATSUMOTO TAKAHIRO ,  NOSE NORIYUKI ,  YOSHII MINORU ,  SAITOH KENJI ,  HASEGAWA MASANOBU ,  SENTOKU KOICHI

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B9/00

Abstract: A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object, The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.

公开(公告)号：CA2078732A1

公开(公告)日：1993-03-28

申请号：CA2078732

申请日：1992-09-21

Applicant: CANON KK

Inventor： SENTOKU KOICHI ,  MATSUMOTO TAKAHIRO ,  NOSE NORIYUKI ,  YOSHII MINORU ,  SAITOH KENJI

IPC: G03F7/20 ,  G03F9/00 ,  G01B9/02

Abstract: A method and device for measuring the relative displacement between first and second diffraction gratings includes an interference optical system forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first detector for detecting the first interference ray of light to generate a first detection signal, a second detector for detecting the second interference ray of light to generate a second detection signal, and signal processing section for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.

公开(公告)号：SG11201605280UA

公开(公告)日：2016-08-30

申请号：SG11201605280U

申请日：2015-01-20

Applicant: CANON KK

Inventor： SATO KAZUHIRO ,  HASEGAWA NORIYASU ,  MATSUMOTO TAKAHIRO

IPC: H01L21/027 ,  B29C59/02 ,  G03F7/20

Abstract: The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.

公开(公告)号：DE69225858D1

公开(公告)日：1998-07-16

申请号：DE69225858

申请日：1992-09-24

Applicant: CANON KK

Inventor： NOSE NORIYUKI ,  YOSHII MINORU ,  SAITOH KENJI ,  OSAWA HIROSHI ,  SENTOKU KOICHI ,  TSUJI TOSHIHIKO ,  MATSUMOTO TAKAHIRO

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

Abstract: A device and method for measuring the positional deviation between a plurality of diffraction gratings (2a,2b) formed on the same object (1) include an illumination optical system (3,6,20,21) for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system (22,23,10) for forming at least one interference light beam from the plurality of diffracted light beams, a detector (12,14) for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion (31-33,41-44) for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

公开(公告)号：DE69223207D1

公开(公告)日：1998-01-02

申请号：DE69223207

申请日：1992-09-24

Applicant: CANON KK

Inventor： SENTOKU KOICHI ,  MATSUMOTO TAKAHIRO ,  NOSE NORIYUKI ,  YOSHII MINORU ,  SAITOH KENJI

IPC: G03F7/20 ,  G03F9/00

Abstract: A method and device for measuring the relative displacement between first and second diffraction gratings (7,8) includes an interference optical system (2,4a,4b,10) forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first Detector (11a) for detecting the first interference ray of light to generate a first detection signal, a second detector (11b) for detecting the second interference ray of light to generate a second detection signal, and signal processing section (12,13) for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.

公开(公告)号：DE69223207T2

公开(公告)日：1998-04-16

申请号：DE69223207

申请日：1992-09-24

Applicant: CANON KK

Inventor： SENTOKU KOICHI ,  MATSUMOTO TAKAHIRO ,  NOSE NORIYUKI ,  YOSHII MINORU ,  SAITOH KENJI

IPC: G03F7/20 ,  G03F9/00

Abstract: A method and device for measuring the relative displacement between first and second diffraction gratings (7,8) includes an interference optical system (2,4a,4b,10) forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first Detector (11a) for detecting the first interference ray of light to generate a first detection signal, a second detector (11b) for detecting the second interference ray of light to generate a second detection signal, and signal processing section (12,13) for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.