公开(公告)号：WO2016069088A1

公开(公告)日：2016-05-06

申请号：PCT/US2015/044686

申请日：2015-08-11

Applicant: INTEL CORPORATION

Inventor： FREEDMAN, Barak ,  BERKOVITCH, Nikolai ,  HIRSHBERG, Arnon

IPC: H01L43/02 ,  H01L43/10 ,  H01L43/12

CPC classification number: G02B26/085 ,  B81B7/02 ,  B81B2201/038 ,  B81B2201/042 ,  B81C1/00174 ,  B81C1/00523 ,  G02B26/105

Abstract: Embodiments of the present disclosure are directed toward techniques and configurations for a magnetic MEMS apparatus that in some instances may comprise a magnetic circuit and a MEMS device. The magnetic circuit may include two magnets that may be disposed on the substantially flat base and magnetized vertically to the base and in opposite directions to each other to produce a substantially horizontal magnetic field between the magnets. The MEMS device may comprise a mirror and a conductor to pass electric current to interact with the magnetic field created by the magnets. The MEMS device may be disposed substantially between the magnets of the magnetic circuit and above a plane formed by top surfaces of the magnets, to provide an unobstructed field of view for the mirror. The MEMS device may include a ferromagnetic layer to concentrate the magnetic field toward the conductor. Other embodiments may be described and/or claimed.

Abstract translation: 本公开的实施例涉及在一些情况下可以包括磁路和MEMS装置的磁MEMS装置的技术和配置。 磁路可以包括两个磁体，其可以设置在基本上平坦的基底上并且垂直于基底并且彼此相反的方向被磁化，以在磁体之间产生基本上水平的磁场。 MEMS器件可以包括反射镜和导体以传递电流以与由磁体产生的磁场相互作用。 MEMS器件可以基本上设置在磁路的磁体之间并且在由磁体的顶表面形成的平面之上，以为镜提供无障碍的视场。 MEMS器件可以包括将磁场集中到导体的铁磁层。 可以描述和/或要求保护其他实施例。

公开(公告)号：WO2015103078A1

公开(公告)日：2015-07-09

申请号：PCT/US2014/072367

申请日：2014-12-24

Applicant: PIXTRONIX, INC.

Inventor： DUNN, Tyler ,  ANDERSSON, Mark B.

IPC: G02B26/02 ,  H02N1/00 ,  B81B3/00

CPC classification number: G09F9/372 ,  B81B3/0021 ,  B81B3/007 ,  B81B2201/038 ,  B81B2201/045 ,  B81B2203/0109 ,  B81B2203/0163 ,  G02B26/04 ,  H02N1/002

Abstract: This disclosure provides systems, methods and apparatus for shutter-based EMS light modulators controlled by electrode actuators that include complementary sets of corrugations or teeth along the opposing beams of the actuators. The complementary sets of corrugations substantially engage one another when drawn together via an actuation voltage. By applying the actuation voltage across the opposing beams of such an actuator, the beams are drawn together both by the electromotive force resulting from the electric field acting between the portions of the beams that are substantially perpendicular to the direction of actuation of the actuator, and by fringing fields between the sides of the corrugations, which are substantially parallel to the direction of actuation. The additional fringing fields provide for increased electromotive force for a given input voltage.

Abstract translation: 本公开提供了由电极致动器控制的基于快门的EMS光调制器的系统，方法和装置，其包括沿着致动器的相对梁的互补的波纹或齿。 互补的波纹组在通过致动电压拉在一起时基本上彼此接合。 通过将致动电压施加在这种致动器的相对梁上，通过作用在基本上垂直于致动器的致动方向的梁的部分之间的电场产生的电动势将光束拉在一起，以及 通过在波纹的两侧之间划线，其基本上平行于致动方向。 额外的边缘场为给定输入电压提供增加的电动势。

公开(公告)号：WO2013169545A1

公开(公告)日：2013-11-14

申请号：PCT/US2013/039128

申请日：2013-05-01

Applicant: LUXVUE TECHNOLOGY CORPORATION

Inventor： BIBL, Andreas ,  HIGGINSON, John A. ,  HU, Hsin-Hua

IPC: H01L21/677 ,  H01L21/50 ,  B65G49/07

CPC classification number: B41J2/385 ,  B25J15/0052 ,  B25J15/0085 ,  B41J2/39 ,  B81B2201/038 ,  B81C99/002 ,  H01L21/67144 ,  H01L21/6835 ,  H01L24/75 ,  H01L24/83 ,  H01L24/97 ,  H01L25/0753 ,  H01L33/0079 ,  H01L2221/68322 ,  H01L2221/68354 ,  H01L2221/68363 ,  H01L2221/68381 ,  H01L2224/29036 ,  H01L2224/29101 ,  H01L2224/2919 ,  H01L2224/7565 ,  H01L2224/7598 ,  H01L2224/83815 ,  H01L2224/83855 ,  H01L2224/97 ,  H01L2924/12041 ,  H01L2924/00 ,  H01L2224/83 ,  H01L2924/00014

Abstract: A compliant micro device transfer head and head array are disclosed. In an embodiment a micro device transfer head includes a spring portion that is deflectable into a space between a base substrate and the spring portion.

Abstract translation: 公开了一种兼容的微器件传送头和头阵列。 在一个实施例中，微装置转移头包括可偏转到基底基板和弹簧部分之间的空间中的弹簧部分。

公开(公告)号：WO2010042502A3

公开(公告)日：2010-07-15

申请号：PCT/US2009059679

申请日：2009-10-06

Applicant: UNIV FLORIDA ,  WIENS GLORIA JEAN ,  RAO KOUSTUBH JAYAPRAKASH ,  RIPPERE TROY BENJAMIN

Inventor： WIENS GLORIA JEAN ,  RAO KOUSTUBH JAYAPRAKASH ,  RIPPERE TROY BENJAMIN

IPC: B81B3/00 ,  B81B7/00

CPC classification number: B81C99/002 ,  B81B2201/038 ,  B81C2203/058

Abstract: Embodiments generally relate to fixturing devices for supporting a workpiece, the devices including modularized cantilevered and fixed beam fixing elements. Each module includes a compliant beam and an interface element in contact with the workpiece and a portion of the compliant beam for transmitting a contact force between the workpiece and the beam. Dynamic adaptability of the beam is configured by selectively varying beam stiffness by varying either beam length or beam width. Varying a width can include varying a beam width, and/or breadth. In a further embodiment, the compliant beam fixed at both ends is slidable in a longitudinal direction of the beam such that a portion of the interface element slides along the beam, thus dynamically adapting the beam stiffness according to a force applied to a workpiece.

Abstract translation: 实施例一般涉及用于支撑工件的夹具装置，所述装置包括模块化的悬臂梁和固定梁固定元件。 每个模块包括柔性梁和与工件和柔性梁的一部分接触的界面元件，用于在工件和梁之间传递接触力。 通过改变光束长度或光束宽度来选择性地改变光束刚度来配置光束的动态适应性。 改变宽度可以包括改变波束宽度和/或宽度。 在另一个实施例中，固定在两端的顺性梁可在梁的纵向方向上滑动，使得界面元件的一部分沿梁移动，从而根据施加到工件上的力动态调整梁的刚度。

公开(公告)号：WO2009133961A1

公开(公告)日：2009-11-05

申请号：PCT/JP2009/058720

申请日：2009-04-28

Applicant: CANON KABUSHIKI KAISHA ,  CHANG, Chienliu

Inventor： CHANG, Chienliu

IPC: B06B1/02 ,  B81B3/00 ,  H01L21/306

CPC classification number: B06B1/0292 ,  B81B2201/038 ,  B81B2203/0127 ,  B81B2203/0315 ,  B81B2203/04 ,  B81C1/00476 ,  B81C2201/0114

Abstract: In a method of manufacturing a capacitive electromechanical transducer, a first electrode (8) is formed on a substrate (4), an insulating layer (9) which has an opening (6) leading to the first electrode is formed on the first electrode (8), and a sacrificial layer is formed on the insulating layer. A membrane (3) having a second electrode (1) is formed on the sacrificial layer, and an aperture is provided as an etchant inlet in the membrane. The sacrificial layer is etched to form a cavity (10), and then the aperture serving as an etchant inlet is sealed. The etching is executed by electrolytic etching in which a current is caused to flow between the first electrode (8) and an externally placed counter electrode through the opening (6) and the aperture of the membrane.

Abstract translation: 在制造电容式机电换能器的方法中，在基板（4）上形成第一电极（8），在第一电极上形成具有通向第一电极的开口（6）的绝缘层（9） 8），并且在绝缘层上形成牺牲层。 在牺牲层上形成具有第二电极（1）的膜（3），并且在膜中设置有作为蚀刻剂入口的孔。 蚀刻牺牲层以形成空腔（10），然后密封用作蚀刻剂入口的孔。 蚀刻通过电解蚀刻进行，其中使电流通过开口（6）和膜的孔径在第一电极（8）和外部放置的对电极之间流动。

公开(公告)号：WO2008011466A1

公开(公告)日：2008-01-24

申请号：PCT/US2007/073790

申请日：2007-07-18

Applicant: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. ,  ARNOLD, David, Patrick ,  AGASHE, Janhavi, Shariniwas

Inventor： ARNOLD, David, Patrick ,  AGASHE, Janhavi, Shariniwas

IPC: B81B3/00 ,  H01H50/00

CPC classification number: H01H50/005 ,  B81B3/0021 ,  B81B2201/038 ,  B81B2203/051 ,  H02K33/18

Abstract: Embodiments of the subject invention relate to a method and apparatus for electromagnetic actuation. Embodiments of an electromagnet actuator in accordance with the subject invention can include a fixed main body and a deformable membrane or displaceable piston-like member. In the case of piston motion, in specific embodiments, the piston can be supported by a corrugated diaphragm or bellows. In various embodiments, all or portions of the electromagnet actuator can be produced using microfabrication techniques. Specific embodiment of the subject invention can incorporate a plurality of magnets providing magnetic flux to a plurality of coil conductor elements so as to provide a plurality of locations that a force is applied to the moveable body portion of the electromagnetic actuator. Specific embodiments can incorporate an array of magnets interdigitated with an array of coil conductor elements, where the arrays can include 2, 5, 10, 20, or more each. Further specific embodiments allow the relative position of the magnetic flux and coil conductor elements to remain substantially the same during the movement of the moveable body by positioning the magnets and coil conductor elements on the moveable body so that the relative position of the magnets and the coil conductor elements on the moveable body do not change with the movement of the moveable body.

Abstract translation: 本发明的实施例涉及一种用于电磁致动的方法和装置。 根据本发明的电磁致动器的实施例可以包括固定主体和可变形膜或可移动的活塞状构件。 在活塞运动的情况下，在具体实施例中，活塞可由波纹膜片或波纹管支撑。 在各种实施例中，电磁致动器的全部或部分可以使用微细加工技术制造。 本发明的具体实施例可以包括向多个线圈导体元件提供磁通量的多个磁体，以便提供将力施加到电磁致动器的可移动主体部分的多个位置。 具体实施例可以包括与线圈导体元件阵列相互指向的磁体阵列，其中阵列可以包括2,5,10,20或更多个。 进一步的具体实施例允许通过将磁体和线圈导体元件定位在可移动体上使得磁通量和线圈导体元件的相对位置在可移动体移动期间保持基本相同，使得磁体和线圈的相对位置 可移动体上的导体元件不随着可移动体的移动而变化。

公开(公告)号：WO2007098277A2

公开(公告)日：2007-08-30

申请号：PCT/US2007/005055

申请日：2007-02-26

Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY ,  CULPEPPER, Martin, L. ,  GOLDA, Dariusz

Inventor： CULPEPPER, Martin, L. ,  GOLDA, Dariusz

IPC: B81B7/02

CPC classification number: B81B3/0062 ,  B81B2201/038 ,  B81B2203/0109 ,  B81B2203/053 ,  B81B2203/055 ,  B81B2203/058 ,  Y10T74/20348

Abstract: A MEMS actuator includes a coil stack in the form of microf abricated, electrically conductive first and second superposed layers. A magnet: array is superposed in magnetic communication with the coil stack, with first and second coils being selectively, electrically actuatable to generate relative movement between the coil stack and the magnet array both in-plane and out-of -plane. In various embodiments, a plurality of the actuators are integrally coupled to a microf abricated compliant mechanism to provide a high bandwidth, six degree of freedom nanopositioner.

Abstract translation: MEMS致动器包括微细的，导电的第一和第二叠置层的形式的线圈叠层。 磁体：阵列与线圈组叠置成磁通，其中第一和第二线圈是可选择地电致动的，以在平面内和平面外产生线圈堆叠和磁体阵列之间的相对运动。 在各种实施例中，多个致动器一体地联接到微型磨擦顺应机构，以提供高带宽六自由度的纳米定位器。

公开(公告)号：WO2007045885A2

公开(公告)日：2007-04-26

申请号：PCT/GB2006/003898

申请日：2006-10-20

Applicant: BAE SYSTEMS PLC ,  HUCKER, Martyn, John ,  WARSOP, Clyde

Inventor： HUCKER, Martyn, John ,  WARSOP, Clyde

IPC: B81C5/00

CPC classification number: B81C1/00103 ,  B81B2201/038 ,  B81B2203/033 ,  B81B2203/0376 ,  B81B2203/0384 ,  B81C2201/034

Abstract: A method of forming a surface of micrometer dimensions conforming to a desired contour for a MEMS device, the method comprising providing a crystalline silicon substrate with a recess in an upper surface, providing a thinner layer of crystalline silicon over the upper surface of the substrate, fusion bonding the layer to the substrate under vacuum conditions, and applying heat to the layer and applying atmospheric pressure on the layer, such as to plastically deform the diaphragm within the recess to the desired contour. The substrate may form the fixed electrode of an electrostatic MEMS actuator, operating on the zip principle.

Abstract translation: 根据MEMS器件的期望轮廓形成微米尺寸的表面的方法，所述方法包括：提供具有上表面中的凹部的晶体硅衬底，提供更薄的晶体硅层 在基底的上表面上，在真空条件下将该层熔合粘结到基底上，并对该层施加热量并在该层上施加大气压力，例如使凹陷内的隔膜塑性变形到所需的轮廓。 基板可以形成静电MEMS致动器的固定电极，按拉链原理工作。

公开(公告)号：WO2005069057A9

公开(公告)日：2005-10-13

申请号：PCT/FR2004050758

申请日：2004-12-23

Applicant: COMMISSARIAT ENERGIE ATOMIQUE ,  DIVOUX CLAIRE ,  VAUDAINE MARIE-HELENE ,  ENOT THIERRY

Inventor： DIVOUX CLAIRE ,  VAUDAINE MARIE-HELENE ,  ENOT THIERRY

IPC: B81B3/00 ,  B81C1/00 ,  G02B26/08

CPC classification number: G02B26/085 ,  B81B2201/038 ,  B81B2201/047 ,  B81B2203/0127 ,  B81B2203/0361 ,  B81C1/00626 ,  B81C2201/0136 ,  G02B26/0833 ,  G02B26/0841 ,  Y10S29/016 ,  Y10S438/924 ,  Y10T29/42

Abstract: The invention relates to a method for production of an operation system for an optical component, comprising the engraving of a first face of a component to form blocks thereon, the engraving of a second face of the component to release a membrane of the same material as the blocks and the production of operating means of the blocks and the membrane.

Abstract translation: 本发明涉及一种用于制造用于光学部件的操作系统的方法，该方法包括对部件的第一面进行雕刻以在其上形成块，雕刻该部件的第二面以释放与 砌块和砌块和隔膜的操作装置的制造。

公开(公告)号：WO2005001863A1

公开(公告)日：2005-01-06

申请号：PCT/US2004/017137

申请日：2004-06-02

Applicant: CARNEGIE MELLON UNIVERSITY ,  GARY, Fedder ,  ALTUG, Oz

Inventor： GARY, Fedder ,  ALTUG, Oz

IPC: H01H1/00

CPC classification number: B81B7/0003 ,  B81B2201/038 ,  H01G5/16 ,  H01G5/40 ,  H01H1/0094 ,  H01H2061/006

Abstract: The present disclosure is broadly directed to a method for designing new MEMS micro-movers, particularly suited for, but not limited to, CMOS fabrication techniques, that are capable of large lateral displacement for tuning capacitors, fabricating capacitors, self-assembly of small gaps in CMOS processes, fabricating latching structures and other applications where lateral micro-positioning on the order of up to 10 µm, or greater, is desired. Principles of self-assembly and electro-thermal actuation are used for designing micro-movers. In self-assembly, motion is induced in specific beams by designing a lateral effective residual stress gradient within the beams. The lateral residual stress gradient arises from purposefully offsetting certain layers of one material versus another material. For example, lower metal layers may be side by side with dielectric layers, both of which are positioned beneath a top metal layer of a CMOS-MEMS beam. In electro-thermal actuation, motion is induced in specific beams by designing a lateral gradient of temperature coefficient of expansion (TCE) within the beams. The lateral TCE gradient is achieved in the same manner as with self-assembly, by purposefully offsetting the lower metal layers with layers of dielectric with respect to the top metal layer of a CMOS-MEMS beam. A heater resistor, usually made from a CMOS polysilicon layer, is embedded into the beam or into an adjacent assembly to heat the beam. When heated, the TCE gradient will cause a stress gradient in the beam, resulting in the electro-thermal actuation. Because of the rules governing abstracts, this abstract should not be used to construe the claims.

Abstract translation: 本公开广泛地涉及用于设计新的MEMS微动幅器的方法，其特别适用于但不限于CMOS制造技术，其能够用于调谐电容器的大横向位移，制造电容器，小间隙的自组装 在CMOS工艺中，制造闭锁结构和其它应用，其中需要高达10μm或更大的横向微定位。 自组装和电热驱动的原理用于设计微动员。 在自组装中，通过在梁内设计横向有效残余应力梯度，在特定梁中引起运动。 侧向残余应力梯度是由有目的地抵消一种材料的某些层与另一种材料相抵消的。 例如，下金属层可以与电介质层并排，它们均位于CMOS-MEMS光束的顶部金属层的下方。 在电热驱动中，通过设计梁内的温度膨胀系数（TCE）的横向梯度，在特定光束中感应运动。 横向TCE梯度以与自组装相同的方式实现，通过相对于CMOS-MEMS光束的顶部金属层有目的地抵消具有电介质层的下部金属层。 通常由CMOS多晶硅层制成的加热电阻器嵌入到光束或相邻组件中以加热光束。 加热时，TCE梯度将导致光束中的应力梯度，导致电热致动。 由于管理摘要的规则，本摘要不应用于解释索赔。