公开(公告)号：US07069768B2

公开(公告)日：2006-07-04

申请号：US10863810

申请日：2004-06-08

Applicant: Kurt Weckström ,  Heikki Haveri ,  Mika Hietala

Inventor： Kurt Weckström ,  Heikki Haveri ,  Mika Hietala

IPC: G01N25/00

CPC classification number: G01N21/3504 ,  G01N21/274 ,  G01N21/61 ,  G01N2201/023 ,  G01N2201/1211 ,  G01N2201/12792

Abstract: The invention concerns a gas analyzer comprising: a measuring volume (2), a radiation source (1) for providing a beam to pass said measuring volume; a heat sink (16) for said radiation source; at least one thermal detector (3) having a hot junction within a support structure and receiving the radiation and a cold junction for reference within the same support structure and protected from said radiation; at least one optical bandpass filter (9) between said hot junction and said radiation source; and a thermal mass (11), which is formed of a material having high thermal conductance. The thermal mass has a cavity with a bottom step (34) and a rim (32), and a first length therebetween. The support structure has a frontal edge (35) and a base plate lip (33), and a second length therebetween. There is a radial gap between the thermal mass and the support structure. Press means urge said support structure in the cavity, whereupon a more efficient thermal contact is either between said frontal edge and said bottom step, or between said base plate lip and said rim. A first thermal barrier (17) is between the heat sink and the thermal mass, and a second thermal barrier (22) surrounds the thermal mass. A shield (19) formed of a material having high thermal conductance covers said second thermal barrier and is in thermal contact with said heat sink.

Abstract translation: 本发明涉及一种气体分析仪，包括：测量体积（2），用于提供光束以通过所述测量体积的辐射源（1） 用于所述辐射源的散热器（16）; 至少一个热探测器（3），其在支撑结构内具有热接合部，并且在相同的支撑结构内接受辐射和冷接点供参考，并保护免受所述辐射; 在所述热接头和所述辐射源之间的至少一个光学带通滤波器（9）; 以及由具有高导热性的材料形成的热质（11）。 热质量具有具有底部台阶（34）和边缘（32）的空腔，并且其间具有第一长度。 支撑结构具有前边缘（35）和基板唇缘（33），并且其间具有第二长度。 在热质和支撑结构之间存在径向间隙。 压制装置促使空腔中的所述支撑结构，由此在所述正面边缘和所述底部台阶之间或所述基板唇缘和所述边缘之间更有效的热接触。 第一热障（17）在散热器和热质量之间，第二热障（22）围绕热质量。 由具有高导热性的材料形成的屏蔽（19）覆盖所述第二热障，并与所述散热器热接触。

公开(公告)号：US07068370B2

公开(公告)日：2006-06-27

申请号：US11151218

申请日：2005-06-13

Applicant: Allan Rosencwaig ,  Lanhua Wei

Inventor： Allan Rosencwaig ,  Lanhua Wei

IPC: G01J4/00

CPC classification number: H01L21/02046 ,  G01N21/211 ,  G01N21/9501 ,  G01N2201/0227 ,  G01N2201/023 ,  H01L21/02054 ,  H01L21/67028 ,  H01L21/67115 ,  H01L22/20

Abstract: A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeatability can be enhanced by removing this contamination layer prior to measurement. This contamination layer can be effectively removed in a non-destructive fashion by subjecting the wafer to a cleaning step. In one embodiment, the cleaning is performed by exposing the wafer to microwave radiation. Alternatively, the wafer can be cleaned with a radiant heat source. These two cleaning modalities can be used alone or in combination with each other or in combination with other cleaning modalities. The cleaning step may be carried out in air, an inert atmosphere or a vacuum. Once the cleaning has been performed, the wafer can be measured using any number of known optical measurement systems.

Abstract translation: 公开了一种改善半导体晶片测量的方法。 在过去，由于在有意沉积的介电层上的污染层的不可预测的增长，测量的重复性受到不利影响。 在测量之前，通过去除这个污染层可以提高重复性。 通过使晶片进行清洁步骤，可以非破坏性地有效地去除该污染层。 在一个实施例中，通过将晶片暴露于微波辐射来进行清洁。 或者，可以用辐射热源清洁晶片。 这两种清洁方式可以单独使用或彼此组合使用或与其他清洁模式组合使用。 清洁步骤可以在空气，惰性气氛或真空中进行。 一旦执行了清洁，就可以使用任何数量的已知光学测量系统测量晶片。

公开(公告)号：US06714300B1

公开(公告)日：2004-03-30

申请号：US09294869

申请日：1999-04-20

Applicant: Allan Rosencwaig ,  Lanhua Wei

Inventor： Allan Rosencwaig ,  Lanhua Wei

IPC: G01J400

CPC classification number: H01L21/02046 ,  G01N21/211 ,  G01N21/9501 ,  G01N2201/0227 ,  G01N2201/023 ,  H01L21/02054 ,  H01L21/67028 ,  H01L21/67115 ,  H01L22/20

Abstract: A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeatability can be enhanced by removing this contamination layer prior to measurement. This contamination layer can be effectively removed in a non-destructive fashion by subjecting the wafer to a cleaning step. In one embodiment, the cleaning is performed by exposing the wafer to microwave radiation. Alternatively, the wafer can be cleaned with a radiant heat source. These two cleaning modalities can be used alone or in combination with each other or in combination with other cleaning modalities. The cleaning step may be carried out in air, an inert atmosphere or a vacuum. Once the cleaning has been performed, the wafer can be measured using any number of known optical measurement systems.

公开(公告)号：EP3333247A1

公开(公告)日：2018-06-13

申请号：EP16203297.3

申请日：2016-12-09

Applicant: EPPENDORF AG

Inventor： Abel, Philipp ,  Graff, Andreas

IPC: C12M1/00 ,  C12M1/34 ,  G01N21/3504

CPC classification number: C12M41/14 ,  C12M41/34 ,  G01N21/3504 ,  G01N2201/023

Abstract: The invention relates to a measurement apparatus for measuring the concentration of a gaseous substance. The apparatus comprises a light source, a light sensor, and a housing comprising at least one first housing member having a low thermal conductivity. A light path is formed from said light source to said light sensor, wherein the light path passes through a measurement region within said housing. The light source is configured to emit light with a spectral distribution such that said light is absorbed by said gaseous substance. Said light sensor is configured to receive the light emitted by the light source after it has passed through the measurement region. The first housing member comprises a thermal shielding region facing said measurement region on its one side and said light sensor on its other side, and is configured to permit the passage of light.

公开(公告)号：EP2761269B1

公开(公告)日：2016-11-02

申请号：EP11873395.5

申请日：2011-09-30

Applicant: Hewlett Packard Development Company, L.P.

Inventor： WU, Wei ,  LI, Zhiyong ,  KIM, Ansoon ,  HU, Min ,  STUKE, Michael Josef

IPC: G01N1/36 ,  G01N21/64 ,  G01N21/65 ,  G01N33/00 ,  B01L3/00

CPC classification number: G01N31/22 ,  B01L3/5085 ,  B01L3/50853 ,  B01L2200/141 ,  B01L2300/0636 ,  B01L2300/069 ,  B01L2300/0819 ,  B82Y15/00 ,  G01N21/648 ,  G01N21/658 ,  G01N2201/0227 ,  G01N2201/023 ,  Y10T436/25

公开(公告)号：EP2820399A4

公开(公告)日：2015-12-30

申请号：EP13754914

申请日：2013-02-28

Applicant: SMART APPLIC LTD

Inventor： ZINN MICHAEL TREVOR ,  WOODS QUINTON ENCOMBE ,  BUYS PETRUS HENDRIK

IPC: G01N21/954 ,  E04G23/00 ,  F23J13/00 ,  F23J99/00 ,  G03B37/00

CPC classification number: G01N21/954 ,  E04G23/008 ,  F23J13/00 ,  F23J99/00 ,  F23J2213/60 ,  G01C19/00 ,  G01N2201/023 ,  G01N2201/025 ,  G01N2201/062 ,  G03B37/005

Abstract: The invention relates to an inspection and repair module for an internal side wall of a vertically erected structure, with the module including a carrier for supporting at least one data recording mechanism and being securable to a hoist, and for an inspection and repair module for an internal wall of a conduit with the module including propulsion means comprising a set of driven tracked wheels controllable by a controller carried by the carrier and configured to provide, within a conduit, longitudinal forward and reverse motion.

公开(公告)号：EP2761269A4

公开(公告)日：2015-04-29

申请号：EP11873395

申请日：2011-09-30

Applicant: HEWLETT PACKARD DEVELOPMENT CO

Inventor： WU WEI ,  LI ZHIYONG ,  KIM ANSOON ,  HU MIN ,  STUKE MICHAEL JOSEF

IPC: G01N1/36 ,  B01L3/00 ,  G01N21/64 ,  G01N21/65 ,  G01N33/00

CPC classification number: G01N31/22 ,  B01L3/5085 ,  B01L3/50853 ,  B01L2200/141 ,  B01L2300/0636 ,  B01L2300/069 ,  B01L2300/0819 ,  B82Y15/00 ,  G01N21/648 ,  G01N21/658 ,  G01N2201/0227 ,  G01N2201/023 ,  Y10T436/25

公开(公告)号：EP2223038A1

公开(公告)日：2010-09-01

申请号：EP08802747.9

申请日：2008-10-01

Applicant: Dr. Johannes Heidenhain GmbH

Inventor： HOLZAPFEL, Wolfgang

IPC: G01B9/02 ,  G01N21/45

CPC classification number: G01B9/0207 ,  G01B9/02027 ,  G01B2290/45 ,  G01B2290/60 ,  G01N21/3504 ,  G01N21/3554 ,  G01N2201/023

Abstract: The present invention relates to an interferometer arrangement and a method for the operation thereof. The interferometer arrangement comprises an interferometer having an interferometer light source, the emitted radiation of which may be divided into a measurement arm and a reference arm, wherein a measured object is disposed in the measurement arm and the interferometer provides interferometer signals as a function of the position of the measured object. Detection means are further provided for detecting fluctuations in the refractive index of the air in the measurement and/or reference arm. The detection means comprise a spectrometer unit; the spectrometer unit comprises at least one spectrometer light source and at least one spectrometer detector unit. The ray bundles emitted by the spectrometer light source are overlaid with the ray bundles of the interferometer light source, wherein the spectrometer light source emits radiation with a wavelength in the range of an absorption line of at least one certain air component. The spectrometer detector unit serves to generate spectrometer signals that characterize the absorption of the air component with regard to the spectrometer light source wavelength in the measurement and/or reference arm.

公开(公告)号：EP1643240A1

公开(公告)日：2006-04-05

申请号：EP04746180.1

申请日：2004-06-21

Applicant: Wako Pure Chemical Industries, Ltd.

Inventor： FUJITA, Takashi ,  YAMAMOTO, Sachiko ,  YAMADA, Hiroyuki ,  AKAHANE, Wataru

IPC: G01N21/78

CPC classification number: G01N21/76 ,  G01N2201/023

Abstract: The present invention discloses a method for measuring an amount of an objective component to bemeasured in a sample, which comprises; preventing an electric charge in an atmosphere in a photometry chamber from transferring to the surface of a solution which generates light due to an energy variation of a substance induced by the objective component in the sample, measuring value of the light, and determining an amount of the objective component in the sample on the basis of the measured value thus obtained, and an instrument used for the method.
According to the present invention, in measurement of an objective component in a sample using a spectrophotometer, problems such as between-day variation of signal values or increase of background value, etc. can be solved, and a trace component can be measured in high accuracy and high sensitivity.

Abstract translation: 本发明公开了一种测量样品中待测量的目标成分的量的方法，包括： 防止测光室中的气氛中的电荷转移到由于样品中由目标成分引起的物质的能量变化而产生光的溶液的表面，测量光的量， 基于由此获得的测量值的样品中的客观成分，以及用于该方法的仪器。 根据本发明，在使用分光光度计测定样品中的目标成分的情况下，能够解决信号值的日间变化或背景值的增加等问题，能够高精度地测定痕量成分 精度高，灵敏度高。

公开(公告)号：EP1605252A3

公开(公告)日：2006-01-18

申请号：EP05104641.5

申请日：2005-05-31

Applicant: GENERAL ELECTRIC COMPANY

Inventor： WECKSTRÖM, Kurt Peter ,  HIETALA, Mika ,  HAVERI, Heikki

IPC: G01N21/35

CPC classification number: G01N21/3504 ,  G01N21/274 ,  G01N21/61 ,  G01N2201/023 ,  G01N2201/1211 ,  G01N2201/12792

Abstract: The invention concerns a gas analyzer comprising: a measuring volume (2), a radiation source (1) for providing a beam to pass said measuring volume; a heat sink (16) for said radiation source; at least one thermal detector (3) having a hot junction within a support structure and receiving the radiation and a cold junction for reference within the same support structure and protected from said radiation; at least one optical bandpass filter (9) between said hot junction and said radiation source; and a thermal mass (11), which is formed of a material having high thermal conductance. The thermal mass has a cavity with a bottom step (34) and a rim (32), and a first length therebetween. The support structure has a frontal edge (35) and a base plate lip (33), and a second length therebetween. There is a radial gap between the thermal mass and the support structure. Press means urge said support structure in the cavity, whereupon a more efficient thermal contact is either between said frontal edge and said bottom step, or between said base plate lip and said rim. A first thermal barrier (17) is between the heat sink and the thermal mass, and a second thermal barrier (22) surrounds the thermal mass. A shield (19) formed of a material having high thermal conductance covers said second thermal barrier and is in thermal contact with said heat sink.