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    Illumination optical system and exposure apparatus
    121.
    发明授权
    Illumination optical system and exposure apparatus 失效
    照明光学系统和曝光装置

    公开(公告)号：US07110084B2

    公开(公告)日：2006-09-19

    申请号：US10769373

    申请日：2004-01-30

    Applicant: Toshihiko Tsuji

    Inventor： Toshihiko Tsuji

    IPC: G03B27/42

    CPC classification number: G03F7/702 ,  G21K2201/06

    Abstract: Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.

    Abstract translation: 为了提供照明光学系统和使用该照明光学系统的曝光装置，其提供了比现有技术更光亮的用于照射掩模的光的角度分布，用于照射物体表面的照明光学系统包括：光学单元，其将来自 光源部分成近似平行的光，并且包括第一和第二反射镜，其中第一反射镜具有开口，第二反射镜反射的光穿过该开口。

    Method for producing the image of the internal structure of an object with X-rays and a device for its embodiment
    123.
    发明申请
    Method for producing the image of the internal structure of an object with X-rays and a device for its embodiment 失效
    利用X射线产生物体的内部结构的图像的方法及其实施例的装置

    公开(公告)号：US20050031078A1

    公开(公告)日：2005-02-10

    申请号：US10872777

    申请日：2004-06-22

    Applicant: Muradin Kumakhov

    Inventor： Muradin Kumakhov

    IPC: G01N23/22 ,  A61B6/00 ,  A61B6/03 ,  G01N23/18 ,  G01N23/223 ,  G01T1/00 ,  G21K1/02 ,  G21K1/06 ,  G21K5/02 ,  G01N23/201 ,  G21K5/10

    CPC classification number: G01N23/223 ,  G01N2223/076 ,  G21K2201/06

    Abstract: Inventions related to the intra-vision means, designed for production of visually sensed images of the internal structure of an object, in particular, of a biological object, are aimed at higher accuracy of determining the relative density indices of the object's substance in the obtained image together with avoiding complex and expensive engineering; when used for diagnostic purposes in medicine, the dosage of tissues surrounding those that are examined is decreased. X-rays from source 1 is concentrated (for example, using X-ray lens 2) in the zone that includes the current point 4, to which the measurement results are attributed and which is located within the target area 7 of the object 5. Excited in this zone secondary scattered radiation (Compton, fluorescent) is transported (for example, using X-ray lens 3) to one or more detectors 6. By moving the said zone, the target area 7 of object 5 is scanned, and based upon population of the intensity values of the secondary radiation, which are obtained with the help of one or more detectors 6 and which are determined concurrently with coordinates of the current point 6, judgment on the density of the object's substance in this point is made. Density values together with respective coordinate values obtained using sensors 11 are used in the means 12 for data processing and imaging to build up a picture of substance density distribution in the target area of the object.

    Abstract translation: 旨在用于生产对象的内部结构，特别是生物体的视觉感测图像的视觉内装置的发明旨在提高确定所获得物体物质的相对密度指数的精度 形象与避免复杂和昂贵的工程; 当在医学中用于诊断目的时，减少了被检查的组织周围的组织的剂量。 来自源1的X射线在包括当前点4的区域中被集中（例如，使用X射线透镜2），测量结果被归因于并且位于对象5的目标区域7内的区域。 在该区域激发二次散射辐射（康普顿荧光灯）被传送（例如，使用X射线透镜3）到一个或多个检测器6.通过移动所述区域，对象5的目标区域7被扫描并基于 在通过一个或多个检测器6的帮助下获得的并且与当前点6的坐标同时确定的二次辐射的强度值的群体上，进行关于该点物体的密度的判断。 在用于数据处理和成像的装置12中使用密度值以及使用传感器11获得的各个坐标值，以建立物体的目标区域中物质密度分布的图像。

    Illumination system, particularly for EUV lithography
    125.
    发明授权
    Illumination system, particularly for EUV lithography 有权
    照明系统，特别适用于EUV光刻

    公开(公告)号：US06400794B1

    公开(公告)日：2002-06-04

    申请号：US09705662

    申请日：2000-11-03

    Applicant: Jörg Schultz ,  Johannes Wangler

    Inventor： Jörg Schultz ,  Johannes Wangler

    IPC: G21K504

    CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K2201/06

    Abstract: The invention concerns an illumination system for wavelengths (193 nm, particularly for EUV lithography with at least one light source, which has an illumination A in one surface; at least one device for producing secondary light sources; at least one mirror or lens device, comprising at least one mirror or one lens, which is (are) divided into raster elements; one or more optical elements, which are arranged between the mirror or lens device that comprises at least one mirror or one lens, which is (are) divided into raster elements, and the reticle plane, wherein the optical elements image the secondary light sources in the exit pupil of the illumination system. The illumination system is characterized by the fact that the light source is a light source for producing radiation with a wavelength ≦193 nm, which irradiates in a well-defined plane with a wavelength spectrum, wherein the range of wavelengths used for the application, particularly for lithography, has a beam divergence perpendicular to this plane that is smaller than 5 mrads.

    Abstract translation: 本发明涉及用于波长的照明系统（193nm，特别是对于具有至少一个光源的EUV光刻，其在一个表面中具有照明A;至少一个用于产生二次光源的装置;至少一个反射镜或透镜装置， 包括被分成光栅元件的至少一个反射镜或一个透镜;布置在反射镜或透镜装置之间的一个或多个光学元件，其包括至少一个反射镜或一个透镜，其被分割 光栅元件和光罩平面，其中光学元件对照明系统的出射光瞳中的次级光源进行成像。照明系统的特征在于光源是用于产生波长< = 193nm，其在具有波长谱的明确定义的平面中照射，其中用于应用的波长范围，特别是用于光刻的波长范围具有光束偏离 相当于该平面小于5 mrads。

    X-ray optics, especially for phase contrast
    126.
    发明授权
    X-ray optics, especially for phase contrast 失效
    X射线光学元件，特别适用于相位对比度

    公开(公告)号：US5850425A

    公开(公告)日：1998-12-15

    申请号：US845211

    申请日：1997-04-21

    Applicant: Stephen W. Wilkins

    Inventor： Stephen W. Wilkins

    IPC: G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/29 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06

    CPC classification number: A61B6/484 ,  G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/2914 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/062 ,  G21K2201/068 ,  G21K2207/005

    Abstract: An x-ray or neutron optic configuration includes a plurality of single crystal portions formed with respective spaced x-ray or neutron reflection faces formed at predetermined asymmetry angles to a Bragg diffraction plane in the respective crystal portion. The crystal portions are interconnected to maintain a first and second of these faces spaced apart for receipt of a sample between them and to allow small adjustments of the relative angle of the faces about the normal to the plane of diffraction while maintaining the normals to the Bragg planes for the first and second faces substantially in the plane of diffraction. A first face is arranged to be a monochromator and collimator with respect to x-rays or neutrons of appropriate wavelength incident reflected through the sample for receipt by the second face, which thereby serves as analyzer face.

    Abstract translation: X射线或中子光学配置包括多个单晶部分，其形成有各自间隔开的x射线或中子反射面，其以相应的晶体部分中的布拉格衍射平面以预定的不对称角度形成。 晶体部分相互连接以保持这些面中的第一和第二面间隔开以便在它们之间接收样品，并且允许小面调整相对于衍射平面的法线的相对角度，同时保持与布拉格的法线 第一和第二面的平面基本上在衍射平面中。 第一面被布置为相对于通过样品反射的x射线或适当波长的中子的单色仪和准直器，由第二面接收，从而用作分析器面。

    Method and device for controlling beams of neutral and charged particles
    127.
    发明授权
    Method and device for controlling beams of neutral and charged particles 失效
    用于控制中性和带电粒子束的方法和装置

    公开(公告)号：US5744813A

    公开(公告)日：1998-04-28

    申请号：US602844

    申请日：1996-02-26

    Applicant: Muradin Abubekirovich Kumakhov

    Inventor： Muradin Abubekirovich Kumakhov

    IPC: G01N23/04 ,  G21K1/06 ,  G02B5/124

    CPC classification number: B82Y10/00 ,  G01N23/04 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/068

    Abstract: The present invention provides for bending the beams, their focusing, transforming a divergent radiation into a quasi-parallel one, and vice versa, its filtering and monochromatization. Also attained are reduced radiation transfer losses, extended range of energies used, and higher radiation concentration. A possibility is provided for the use of larger radiation sources without decreasing the proportion of the captured particles, as well as for controlling the radiation spectrum. With this purpose in view, provision is made in the proposed method, apart from multiple reflection of particles upon interaction with different-density alternating media, for diffuse and potential scattering or interference of particles that diffract on multilayer structures applied to reflecting surfaces. In a device carrying the proposed method into effect, the aforementioned surfaces are coated with layers differing in electromagnetic properties. The optical system of the device appears principally as a set of miniature lenses or bemilenses 28, built up of a plurality of capillaries or polycapillaries, the walls of whose channels 24 are provided with an appropriate coating 22. No use of any support structures for forming the profiles of the optical system is required.

    Abstract translation: PCT No. PCT / RU94 / 00146 Sec。 371日期1996年2月26日 102（e）日期1996年2月26日PCT提交1994年7月8日PCT公布。 第WO96 / 02058号公报 日期1996年1月25日本发明提供了弯曲梁，它们的聚焦，将发散辐射变换成准并联辐射，反之亦然，其过滤和单色化。 还获得了减少辐射传输损失，使用的能量的扩大范围和更高的辐射浓度。 提供了使用更大辐射源的可能性，而不会降低捕获的颗粒的比例，以及用于控制辐射光谱。 鉴于此目的，在所提出的方法中，除了在与不同密度的交替介质相互作用之间的多个反射颗粒之外，提供了用于扩散和潜在的散射或衍射到施加到反射表面的多层结构上的颗粒的干涉。 在实施所提出的方法的装置中，上述表面涂覆有不同电磁特性的层。 该装置的光学系统主要表现为由多个毛细管或多毛细管构成的一组微型透镜或壳体28，其通道24的壁设置有合适的涂层22.不使用任何支撑结构用于形成 需要光学系统的轮廓。

    Spherical mirror grazing incidence x-ray optics
    128.
    发明授权
    Spherical mirror grazing incidence x-ray optics 失效
    球面镜掠入射x射线光学

    公开(公告)号：US5604782A

    公开(公告)日：1997-02-18

    申请号：US514134

    申请日：1995-08-11

    Applicant: Webster C. Cash, Jr.

    Inventor： Webster C. Cash, Jr.

    IPC: G02B5/08 ,  G21K1/06

    CPC classification number: G21K1/06 ,  G21K2201/06

    Abstract: An optical system for x-rays combines at least two spherical or near spherical mirrors for each dimension in grazing incidence orientation to provide the functions of a lens in the x-ray region. To focus x-ray radiation in both the X and the Y dimensions, one of the mirrors focusses the X dimension, a second mirror focusses the Y direction, a third mirror corrects the X dimension by removing comatic aberration and a fourth mirror corrects the Y dimension. Spherical aberration may also be removed for an even better focus. The order of the mirrors is unimportant.

    Abstract translation: 用于x射线的光学系统在掠射入射取向中针对每个尺寸组合至少两个球形或近球形镜，以提供X射线区域中的透镜的功能。 为了将X射线辐射聚焦在X和Y维度中，其中一个镜子聚焦于X尺寸，第二个镜子聚焦于Y方向，第三个镜子通过去除彗形像差来校正X尺寸，第四个镜子校正Y 尺寸。 也可以去除球面像差以获得更好的聚焦。 镜子的顺序是不重要的。

    Monochromator for continuous spectrum x-ray radiation
    129.
    依法登记的发明
    Monochromator for continuous spectrum x-ray radiation 失效
    用于连续光谱X射线辐射的单色器

    公开(公告)号：USH313H

    公开(公告)日：1987-07-07

    申请号：US854708

    申请日：1986-04-23

    Applicant: Jean-Louis Staudenmann ,  Gerald L. Liedl

    Inventor： Jean-Louis Staudenmann ,  Gerald L. Liedl

    IPC: G21K1/06 ,  G01N23/20 ,  G01J1/00

    CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/062 ,  G21K2201/067

    Abstract: A monochromator for use with synchrotron x-ray radiation comprises two diffraction means which can be rotated independently and independent means for translationally moving one diffraction means with respect to the other. The independence of the rotational and translational motions allows Bragg angles from 3.5.degree. to 86.5.degree., and facilitates precise and high-resolution monochromatization over a wide energy range. The diffraction means are removably mounted so as to be readily interchangeable, which allows the monochromator to be used for both non-dispersive and low dispersive work.

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