Abstract:
Iron, such as ferric chloride, and other metallic impurities, contained in liquid chlorinated hydrocarbon waste streams, is removed by treatment of such streams with dilute aqueous mineral acid.
Abstract:
Reaction mixtures for forming curable epoxy resin compositions comprise a major amount of epoxy resin, a minor amount of monoethylenically unsaturated monomer capable of forming polyacrylate rubber, and a monomer soluble initiator. Optional ingredients include a crosslinking agent for the rubber-forming monomer, a grafting agent for rubber and epoxy resin, and an epoxy curing agent, preferably having activation conditions which are not satisfied when the initiator is activated. Heating the reaction mixture gives epoxy resin compositions containing polyacrylate rubber, the latter being optionally crosslinked and/or grafted to the epoxy resin. Activation of the curing agent, e.g., by heating, yields cured adhesive compositions.
Abstract:
A process for the production of a thermoset composition containing oxazolidone and urethane linkages characterised in that it comprises reacting a polyisocyanate and a prepolymer containing at least one terminal epoxy group and at least one non-terminal, secondary hydroxy group is disclosed. A thermoset composition characterised in that it comprises oxazolidone and urethane linkages in the recurring unit which is substantially free of isocyanurate linkages, the said oxazolidone linkages being present in the polymer backbone and being separated from one another by ester linkages and the said urethane linkages being present in side chains attached to the polymer backbone is also disclosed. The present invention offers advantages over the prior art.
Abstract:
A grease composition suitable as a lubricating sealant which is resistant to aprotic solvents such as chloroform and carbon disulfide comprises glycerine, fumed silica, polyethylene glycol and a minor amount of water. A preferred grease composition is one in which the amount of glycerine ranges is from 50 to 95 weight % of the total composition, the amount of fumed silica is from 1 to 25% by weight of the total composition, the amount of polyethylene glycol ranges is from 0.5% to 50% by weight of total composition and the amount of water is from 0.01% to 1.0% by weight of total composition, the total composition amounting to 100%.
Abstract:
A new leavening acid comprises a slow-acting phosphate leavening acid having a 2 minute donut dough rate of reaction between 15% and 35% evolved C0 2 and a 10 minute donut dough rate of reaction of between 20% and 60% evolved CO 2 and an organic acid such as fumaric acid, citric acid, malic acid, tartaric acid, lactic acid, succinic acid, adipic adic and mixtures thereof. The new leavening acid is useful in overcoming the difficulties such as browning and uneven color associated with the use of reducing sugars and particularly fructose in baked goods.
Abstract:
Compounds having the formula in which Y is hydrogen, halogen, C 1 -C 4 alkoxy, or C 1 -C 4 alkyl; R 1 and R 2 are independently hydrogen or methyl; and n is 1 or 2, are effective biocides or biostats for protection of plastic, polymeric or cellulosic materials against attack by microorganisms.
Abstract:
Trialkylsulfonium salts of N-phosphonomethylglycine having the formula in which R represents C 1 -C 3 alkyl and n is zero or one are useful in regulating the natural growth or development of plants and as herbicides, and can be prepared from N-phosphonomethylglycine directly or by in a two stage reaction with a trialkylsulfonium or sulfoxonium halide.
Abstract:
Aryl sulfonylureas as new compositions and included in a two-part herbicide system comprising at least one or more thioicarbamate, thiolcarbamate sulfoxide or haloacetanilide herbicide, and as the second part a non-phytotoxic antidotally effective amount of aryl sulfonylurea as an antidote therefor of the formula
in which X is oxygen or sulfur; n is an integer; R is lower alkyl, lower alkylthio, halogen, trifluoromethyl, cyano, nitro, lower alkyl sulfonyl; R 4 is hydrogen, lower alkyl, lower alkoxyalkyl, phenyl and chlorophenyl; R 2 is hydrogen, lower alkyl, alkoxyalkyl and phenyl; R' is lower alkyl, alkenyl, alkynyl, haloalkyl, alkoxyalkyl, 1-phenylpropenyl, benzyl, chlorobenzyl, haloalkenyl, phenyl and alkyl substituted phenyl; and
AR is phenyl, benzyl, naphthyl, pyridyl or styryl; and the inorganic base salts sodium, potassium, ammonium and other inorganic salts; and organic base salts thereof.