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公开(公告)号：JPH01209304A
公开(公告)日：1989-08-23
申请号：JP3466988
申请日：1988-02-16
Applicant: CANON KK
Inventor： SUDA SHIGEYUKI , YOSHII MINORU
Abstract: PURPOSE:To homogenize a distribution of outgoing beams and improve positioning accuracy by a method wherein a plural number of light fluxes are provided and a light flux having a cross section according to the shape of a physical optical element is formed by overlapping a portion of the light fluxes. CONSTITUTION:Light beams emitted from light sources 1, 1a are made parallel by projector lenses 2, 2', respectively, and enters an exposure region including an alignment mark 41M via a beam splitter 92. the alignment mark 41M has a function of a convex lens which focuses the beam to a point Q on a transmission-type zone plate. A wafer alignment mark 41W has a function as a convex mirror which focuses the beams focused to the point Q and forms an image on a detecting plane 90 of a photodetector 38. Difference in position is calculated by the photodetector 38 and a wafer stage 102 is transferred according to this calculated value so as to align a mask 101 and a wafer 102.
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公开(公告)号：JPH01150813A
公开(公告)日：1989-06-13
申请号：JP30942187
申请日：1987-12-09
Applicant: CANON KK
Inventor： SAITO KENJI , KAWASE TOSHIMITSU , KAWAKAMI EIGO , YOSHII MINORU
Abstract: PURPOSE:To obtain the resolution of an atomic order of about several Angstrom by constituting an encoder by using a tunnel current flowing between against a conductive probe, based on periodical unevenness by a regular atomic arrangement of the surface of a substance as a reference. CONSTITUTION:An object 101 and 102 are installed so that they can move relatively only in the horizontal direction, and on the objects 101, 102, a conductive reference scale 103 and a conductive probe 104 are provided, respectively. Between them, a bias voltage is applied by a bias power source 106, they are allowed to approach to the extent that a tunnel current 105 flows, and this tunnel current 105 is detected by a current detecting means 107. A tunnel current signal 118 which has been amplified 108 is binarized 110 and converted to a pulse in a horizontal direction relative position extracting means 109, brought to processing such as converted to a motion quantity signal 112 and a direction signal 113, etc., and a horizontal direction relative displacement quantity 117 from an initial position of the object 101 and 102 is derived. In this case, the resolution of this encoder is several Angstrom , if a periodical arrangement of a conductive substance surface atom. is used as a scale.
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公开(公告)号：JPS6469933A
公开(公告)日：1989-03-15
申请号：JP22773287
申请日：1987-09-11
Applicant: CANON KK
Inventor： KURODA AKIRA , MATSUGI MASAKAZU , YOSHII MINORU
Abstract: PURPOSE:To obtain a hearing amount highly accurately, by measuring the surface shape of a reference material, whose surface shape is known with a shearing interferometer, and using the measured value and the data of the known surface shape. CONSTITUTION:At first, a material to be checked, whose surface is not known, is measured by another method (1), which can measure the surface shape W (3) of the material to be checked, other than a shearing interferometer, in which a shearing amount to be obtained is set. Then, a known surface shape, which has been measured with preset accuracy beforehand, or the known surface shape of a primary standard and the like is measured with the shearing interferometer. Then, the preset shearing amount of the shearing interferometer is obtained from the measured result that is obtained with the shearing interferometer and the known surface-shape data of a body based on the expression of relation. Since the preset shearing amount of the shearing interferometer is introduced by the computation without depending on the actually measured value in an apparatus, the accurate shearing amount can be obtained highly precisely.
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公开(公告)号：JPS63277923A
公开(公告)日：1988-11-15
申请号：JP11226387
申请日：1987-05-11
Applicant: CANON KK
Inventor： NOSE TETSUSHI , YOSHII MINORU , NIWA YUKICHI , KURODA AKIRA
IPC: G01B11/00 , G01D5/38 , H01L21/027 , H01L21/30 , H01L21/68
Abstract: PURPOSE:To improve the reliability of a light source to wavelength variation and to improve the measurement accuracy by providing two gratings, i.e. fixed grating and moving grating, and refracting the (+ or -1)th-order light of the fixed grating by the moving grating again and guiding the diffracted light to a photosensor. CONSTITUTION:Luminous flux which is emitted by the light source LD and made into parallel light by a collimator lens CL is split into two by a beam splitter HM1; and one is incident on an objective LN and the other is incident on a diffraction grating GS through a beam splitter HM2. The (+ or -1)th-order light beams which are diffracted by the diffraction grating GS are incident on the diffraction grating GS again through phase difference plates EP1 and EP2 and corner cubes CC1 and CC2. The light which is diffracted by the diffraction grating GS again is incident on photodetectors PD1 and PD2 through the polarization beam splitter BS. Output pulses of the photodetectors PD1 and PD2 are counted to measure the relative movement quantity between a length measurement head MH and the diffraction grating GS.
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公开(公告)号：JPS63277909A
公开(公告)日：1988-11-15
申请号：JP11226087
申请日：1987-05-11
Applicant: CANON KK
Inventor： YOSHII MINORU , NOSE TETSUSHI , NIWA YUKICHI , KURODA AKIRA
Abstract: PURPOSE:To perform length measurement with a larger stroke and higher accuracy by putting different length measuring means in charge of large-stroke length measurement covering the entire specific length measurement range and small-stroke, high-accuracy length measurement as to a range corresponding to part of this length measurement area. CONSTITUTION:A small-stroke Y stage YFS is mounted on a base DFS for a small-stroke stage movably along a guide YFG and a small-stroke X stage XFS is mounted on the Y stage YFS movably along an (x)-directional guide XFG. Then an optical probe LP for machining and measurement is fixed to the X stage XFS. The position of the optical probe LP is detected by a high- accuracy length measuring instrument (y)-coordinate detection and a length measuring instrument MX for (x)-coordinate detection. The coordinates of the base DFS, on the other hand, is measured by a laser interference length measuring instrument as the position of the large-stroke stages XS and YS.
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Patent Agency Ranking
公开(公告)号：JPS6336213A
公开(公告)日：1988-02-16
申请号：JP18039686
申请日：1986-07-31
Applicant: CANON KK
Inventor： BABA TAKESHI , YOSHII MINORU , NIWA YUKICHI
Abstract: PURPOSE:To detect a focusing direction on the basis of a focusing state and chromatic aberration and to attain rapid focusing by providing the titled device with a means for changing an image forming state, a means for converting object image information into two chrominance signals and a means for detecting the focusing state of an image corresponding to the two colors. CONSTITUTION:An image is focused by a lens 101 on an optical axis, a focal distance is changed by a lens 1-2, the position of the lens 1-2 is detected by a position detector 3 and the aberration comparing information C' of color G with colors R, B and the chromatic aberration direction AC of the color G are stored in a ROM15. The color information of the object is converted into three chromatic signals and a luminance signal Y by an image pickup element 4 and either one C of R and B is selected by an analog SW5 by controlling a microprocessor 16 to extract signals corresponding to the center of a screen through gates 6, 8. The intensity of their HF components is normalized, sharpness QC, QG are outputted through sharpness detectors 7, 9, the peaks of the output signals are held, the shaded degree is evaluated by a microprocessor 16, the size of the HF component of the object image is detected by the luminance signal or through prescribed processing and the invalidity of focusing direction decision due to large out-of-focus is processed by the signal F. Thus, rapid focusing can be attained by holding the image surface S at the intermediate state between G and C (R or B).
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公开(公告)号：JPS61269572A
公开(公告)日：1986-11-28
申请号：JP11147285
申请日：1985-05-24
Applicant: CANON KK
Inventor： OGINO YASUO , SUDA SHIGEYUKI , YOSHII MINORU , KAWAKAMI EIGO , OWADA MITSUTOSHI , NIWA YUKICHI
Abstract: PURPOSE:To apply tracking of an objective image and vibration-proofness by providing an image input means movable to a camera case, detecting the moving direction of an image and moving quantity of drive a paper of the image input means by detection information. CONSTITUTION:A drive actuator 6 is supported by a mirror barrel 2 to a camera case 8 and drives an image pickup system 1 and an image pickup sensor 3 constituting an image input means via a moving mechanism 7. An image signal (a) obtained by a sensor 3 via the optical system 1 is inputted to a detection means 4, the means 4 detects the moving direction and quantity on the sensor 3 of the object image to output a signal (b) with respect to the moving direction and phase shift quantity to a drive control means 5. A control signal is fed to the actuator 6 via the means 5 from the signal (b) and other signal (c) to drive an image input means comprising the optical system 1 and the sensor 3 to the case 8. Thus, the vibration-proofness of the case 8 or the tracking of a specific object is attained.
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公开(公告)号：JP2000228356A
公开(公告)日：2000-08-15
申请号：JP32805599
申请日：1999-11-18
Applicant: CANON KK
Inventor： INE HIDEKI , HASEGAWA MASANORI , SATO TAKASHI , YOSHII MINORU
IPC: H01L21/027 , G03F9/00
Abstract: PROBLEM TO BE SOLVED: To enable accurate positioning of a wafer by executing position detection of mark having formed a surface layer film using a position detecting offset after formation of the surface layer film in the mark forming area on the wafer. SOLUTION: A wafer is supplied to a stepper ST to detect an alignment mark signal with an alignment scope and a signal information of the alignment mark is sent to an offset analyzer OA from the stepper ST. Subsequently, from the three-dimensional relative positional relationship of the resist obtained previously with an offset analyzer OA and a wafer mark, relationship between the alignment mark signal and the wafer mark position is obtained to calculate the offset in the alignment measurement and it is then sent to the stepper ST. The stepper ST executes the exposure through alignment based on such an offset and thereafter carries the wafer to a developer DV for the purpose of development. The circuits are then formed through several processes and thereby a semiconductor device can be obtained.
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公开(公告)号：JP2000021714A
公开(公告)日：2000-01-21
申请号：JP18404498
申请日：1998-06-30
Applicant: CANON KK
Inventor： SUZUKI AKIYOSHI , YOSHII MINORU
IPC: G03F7/20 , G03F7/22 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To improve the total throughput by reducing the number of exchange of a mask pattern or wasteful movements of a wafer. SOLUTION: Plural mask patterns are exchanged and transferred by multiplex exposure or switching exposure for a wafer 228 having plural regions, and at successive operating this to each wafer while exchanging those plural wafers, when the wafer (mask pattern) is exchanged, the first exposure is operated with the mask pattern used last (with respect to a shot region operated at least) before the exchange.
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公开(公告)号：JPH11329919A
公开(公告)日：1999-11-30
申请号：JP14660698
申请日：1998-05-12
Applicant: CANON KK
Inventor： YOSHII MINORU , INE HIDEKI , HASEGAWA MASANORI
IPC: H01L21/027
Abstract: PROBLEM TO BE SOLVED: To detect the three-dimensional form of a sample at a high speed with high accuracy by use of a confocal microscope. SOLUTION: In a position detector, by which the mark on an object to be measured is illuminated by a detecting optical system via micro-openings and the mark is detected through the micro-openings, the micro-openings comprise the light valves 20 which can be individually controlled. Detection time for one pixel can be shortened by the use of light valve 20. When information about the overall image is not required, the flexibility of detection is increased by selectively performing on/off control of the pixels the light valve means, detection at a high speed can be attained. Thus, a highly integrated device can be easily manufactured.
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