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    Refractory metal plates with uniform texture and methods of making the same
    143.
    发明申请
    Refractory metal plates with uniform texture and methods of making the same 审中-公开
    具有均匀质地的耐火金属板和制造相同的方法

    公开(公告)号：US20020112789A1

    公开(公告)日：2002-08-22

    申请号：US10079286

    申请日：2002-02-20

    Applicant: H.C. Starck, Inc.

    Inventor： Peter R. Jepson ,  Henning Uhlenhut ,  Prabhat Kumar

    IPC: C22C027/02 ,  C23C014/34 ,  C21C001/00

    CPC classification number: C23C14/3414 ,  C22C27/02 ,  C22F1/18

    Abstract: A method (10) of forming sputtering target (11) from ingots of tantalum or niobium of requisite purity by the process of cutting the ingot to short lengths (12) and pressure working (14, 22, 30, 34) the ingot along alternating essentially orthogonal work axes. Intermediate anneals (18, 26, 38) are applied as necessary to establish a uniform texture thickness-wise and area-wide throughout the target, including the center. The uniform texture is a substantially constant mix of grains with orientation null100null and null111null, thereby improving sputtering performance by providing a more predictable sputter rate to control film thickness.

    Abstract translation: 通过将铸锭切割成短的长度（12）和压力加工（14,22,30,34）的方法，通过将铸锭沿着交替的方式将铸锭切割成具有必需纯度的钽或铌锭的溅射靶（11）的方法（10） 基本上是正交的工作轴。 根据需要应用中间退火（18,26,38），以在整个目标（包括中心）建立均匀纹理厚度和面积。 均匀纹理是具有取向{100}和{111}的颗粒的基本恒定的混合物，从而通过提供更可预测的溅射速率来控制膜厚度来改善溅射性能。

    MOLYBDENUM CONTAINING TARGETS
    147.
    发明申请
    MOLYBDENUM CONTAINING TARGETS 有权

    公开(公告)号：US20210079512A1

    公开(公告)日：2021-03-18

    申请号：US17038325

    申请日：2020-09-30

    Applicant: H.C. STARCK, INC.

    Inventor： Gary Alan Rozak ,  Mark E. Gaydos ,  Patrick Alan Hogan ,  Shuwei Sun

    IPC: C23C14/18 ,  C22C1/04 ,  C22C27/04 ,  C23C14/34 ,  C23C14/58 ,  G06F3/041

    Abstract: The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of niobium or vanadium, and a third metal element selected from the group consisting of titanium, chromium, niobium, vanadium, and tantalum, wherein the third metal element is different from the second metal element, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in the second metal element, and a phase that is rich in the third metal element.

    REFRACTORY METAL PLATES
    150.
    发明申请
    REFRACTORY METAL PLATES 审中-公开

    公开(公告)号：US20190228954A1

    公开(公告)日：2019-07-25

    申请号：US16260274

    申请日：2019-01-29

    Applicant: H.C. STARCK INC.

    Inventor： Peter R. Jepson ,  Dincer Bozkaya

    IPC: H01J37/34 ,  C22F1/18 ,  C23C14/34 ,  B21B1/22 ,  B22F3/18

    Abstract: A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through, thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND, which is substantially uniform throughout the plate.

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