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    가스검출방법과 장치
    141.
    发明公开
    가스검출방법과 장치 无效
    用于检测气体的方法和装置

    公开(公告)号：KR1020070121749A

    公开(公告)日：2007-12-27

    申请号：KR1020077023573

    申请日：2006-04-13

    Applicant: 허니웰 애널리틱스 악티엔게젤샤프트

    Inventor： 홀커도날드 ,  수톤스테펜

    IPC: G01N21/3504 ,  G01N21/39

    CPC classification number: G01N21/39 ,  G01N21/3504 ,  G01B11/00 ,  H01J3/14

    Abstract: The invention provides a gas detection system and method for detecting a target gas, in which a transmitter unit (26) directs a primary beam (32) of coherent radiation at a wavelength absorbed by the target gas along a primary optical path, and an optical device (44) directs a secondary beam (46) of coherent radiation along a further optical path. A receiver unit (28) receives the primary and the secondary beams of coherent radiation, and an optical beam combiner (52) combines the two beams of radiation to form a combined beam. The primary beam and the secondary beam are controlled to generate interference in the combined beam, and a measuring detector (35) of the receiver unit is arranged to detect interference fringes generated by the interference.

    Abstract translation: 本发明提供了一种用于检测目标气体的气体检测系统和方法，其中发射器单元（26）沿着主光路引导由目标气体吸收的波长的相干辐射的主光束（32），并且光学 装置（44）沿着另一光路引导相干辐射的次级束（46）。 接收器单元（28）接收相干辐射的主光束和次光束，并且光束组合器（52）将两束辐射组合以形成组合光束。 控制主光束和次光束以在组合光束中产生干涉，并且接收器单元的测量检测器（35）被布置成检测由干涉产生的干涉条纹。

    표본 상의 결함들을 분류하기 위한 컴퓨터-구현 방법 및시스템
    142.
    发明公开
    표본 상의 결함들을 분류하기 위한 컴퓨터-구현 방법 및시스템 无效
    计算机实现方法和系统，用于分析样本中的缺陷

    公开(公告)号：KR1020070104331A

    公开(公告)日：2007-10-25

    申请号：KR1020077009403

    申请日：2005-10-12

    Applicant: 케이엘에이-텐코 코포레이션

    Inventor： 테초확 ,  토렐리토마소 ,  데이비드도미닉 ,  양치우만 ,  스콧마이클고든 ,  발라수브라마니안랄리타에이 ,  가오리솅 ,  후앙통 ,  장지앙친 ,  코왈스키미첼 ,  오클리조나단

    IPC: G01N21/00 ,  H01J3/14

    CPC classification number: G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148 ,  H01J3/14

    Abstract: Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.

    Abstract translation: 提供了用于对样本上的缺陷进行分类的各种计算机实现的方法。 一种方法包括基于单个缺陷的一个或多个特征将在样本上检测到的各个缺陷分配给缺陷组。 该方法还包括向用户显示关于缺陷组的信息。 此外，该方法包括允许用户为每个缺陷组分配分类。 还提供了配置为对样品上的缺陷进行分类的系统。 一个系统包括可在处理器上执行的程序指令，用于根据单个缺陷的一个或多个特征将在样本上检测到的各个缺陷分配给缺陷组。 该系统还包括被配置为向用户显示关于缺陷组的信息的用户界面，并允许用户为每个缺陷组分配分类。

    具有動態射束成形的經改良均勻度控制之方法與設備 METHOD AND APPARATUS FOR IMPROVED UNIFORMITY CONTROL WITH DYNAMIC BEAM SHAPING
    143.
    发明专利
    具有動態射束成形的經改良均勻度控制之方法與設備 METHOD AND APPARATUS FOR IMPROVED UNIFORMITY CONTROL WITH DYNAMIC BEAM SHAPING 审中-公开
    具有动态射束成形的经改良均匀度控制之方法与设备 METHOD AND APPARATUS FOR IMPROVED UNIFORMITY CONTROL WITH DYNAMIC BEAM SHAPING

    公开(公告)号：TW201250761A

    公开(公告)日：2012-12-16

    申请号：TW101111649

    申请日：2012-03-30

    Applicant: 艾克塞利斯科技公司

    Inventor： 艾斯能 愛德華

    IPC: H01J

    CPC classification number: H01J3/14 ,  G21K5/10 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/049 ,  H01J2237/30477 ,  H01J2237/30483

    Abstract: 本揭示係關於一種用於在一離子射束掃描於一工件的表面上之時,變化該離子射束的橫截面形狀之方法與設備,以產生一時均的離子射束,其具有經改良離子射束電流輪廓均勻度。在一實施例中,該離子射束的橫截面形狀係隨著該離子射束跨越該工件的表面移動而變化。該離子射束的橫截面形狀分別具有不同的射束輪廓(例如,沿著該射束輪廓在不同的場所具有峰値),以至於迅速地改變該離子射束的橫截面形狀會造成被暴露到該工件的射束電流輪廓平滑(例如,相關於個別射束輪廓的峰値會減少)。造成的平滑射束電流輪廓會提供該射束電流經改良均勻度以及經改良工件劑量均勻度。

    Abstract in simplified Chinese: 本揭示系关于一种用于在一离子射束扫描于一工件的表面上之时,变化该离子射束的横截面形状之方法与设备,以产生一时均的离子射束,其具有经改良离子射束电流轮廓均匀度。在一实施例中,该离子射束的横截面形状系随着该离子射束跨越该工件的表面移动而变化。该离子射束的横截面形状分别具有不同的射束轮廓(例如,沿着该射束轮廓在不同的场所具有峰値),以至于迅速地改变该离子射束的横截面形状会造成被暴露到该工件的射束电流轮廓平滑(例如,相关于个别射束轮廓的峰値会减少)。造成的平滑射束电流轮廓会提供该射束电流经改良均匀度以及经改良工件剂量均匀度。

    Charged particle beam device
    146.
    发明专利
    Charged particle beam device 有权
    充电颗粒光束装置

    公开(公告)号：JP2014022297A

    公开(公告)日：2014-02-03

    申请号：JP2012162258

    申请日：2012-07-23

    Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

    Inventor： DOI HIDETO ,  IKEGAMI AKIRA ,  KAZUMI HIDEYUKI

    IPC: H01J37/153 ,  H01J37/147 ,  H01J37/28

    CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1508

    Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device which, in a relatively simple configuration, corrects off-axis chromatic aberration and deflection coma aberration at the same time.SOLUTION: The present invention is a charged particle beam device provided with a tilting purpose deflector 08 disposed between a charged particle source 01 and an objective lens 09 and used to tilt a charged particle beam, the charged particle beam device having a first optical element 07 including an electromagnetic quadrupole which generates dispersion to suppress the dispersion caused by deflection by the tilting purpose deflector 08 and provided with a second optical element comprising the deflector 06 for deflecting the charged particle beam incident upon the first optical element 07 or an electromagnetic quadrupole which causes dispersion different from the dispersion generated by the first optical element to occur in the charged particle beam.

    Abstract translation: 要解决的问题：提供一种带电粒子束装置，其以相对简单的构造同时校正离轴色差和偏转彗形像差。解决方案：本发明是一种带电粒子束装置，其具有倾斜 设置在带电粒子源01和物镜09之间并用于倾斜带电粒子束的目的偏转器08，带电粒子束装置具有包括电磁四极杆的第一光学元件07，其产生色散以抑制由偏转引起的色散 倾斜目的偏转器08并且设置有第二光学元件，该第二光学元件包括用于偏转入射在第一光学元件07上的带电粒子束的偏转器06或电磁四极杆，其导致与由第一光学元件产生的色散不同的色散发生在 带电粒子束。

    Ion beam system and method of manipulating the same
    149.
    发明专利
    Ion beam system and method of manipulating the same 有权
    离子束系统及其操作方法

    公开(公告)号：JP2012079700A

    公开(公告)日：2012-04-19

    申请号：JP2011219560

    申请日：2011-10-03

    Applicant: Carl Zeiss Nts Gmbh ,  カール・ツァイス・エヌティーエス・ゲーエムベーハーCarl Zeiss NTS GmbH

    Inventor： BIBERGER JOSEF ,  PULWEY RALPH ,  ANDREAS ADOLF

    IPC: H01J37/147 ,  H01J37/28 ,  H01J37/317

    CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

    Abstract: PROBLEM TO BE SOLVED: To enable an ion beam in an ion beam system having a scanning deflector to be deflected with high accuracy at a high deflection frequency (high speed) and without expanding the dynamic range of a deflection voltage in both high energy and low energy operation modes.SOLUTION: A deflector 39 is composed of three deflection electrode pairs consisting of first deflection electrodes 51a, 51b and 51c disposed at given intervals in the direction of an optical axis 5 of an ion beam 19 and second deflection electrodes 52a, 52b and 52c opposing the foregoing, and is so designed that different electric potentials can be applied to each deflection electrode from a controller 7 via a switch 61. In a first operation mode (for example, 30 keV ion beam energy), a deflection electric field is generated for all of the deflection electrode pairs, as shown by an arrow 55. In a second operation mode (for example, 1 keV ion beam energy), a deflection electric field is generated for only the deflection electrode pair 51a and 52a.

    Abstract translation: 要解决的问题：为了使具有扫描偏转器的离子束系统中的离子束以高偏转频率（高速）的高精度偏转，并且不使两个高的偏转电压的动态范围扩大 能源和低能量运行模式。 解决方案：偏转器39由三个偏转电极对构成，该偏转电极对由沿离子束19的光轴5的方向以一定间隔设置的第一偏转电极51a，51b和51c以及第二偏转电极52a，52b和 52c与上述相反，并且被设计成可以通过开关61从控制器7向每个偏转电极施加不同的电位。在第一操作模式（例如，30keV离子束能量）中，偏转电场为 对于所有偏转电极对产生，如箭头55所示。在第二操作模式（例如，1keV离子束能量）中，仅为偏转电极对51a和52a产生偏转电场。 版权所有（C）2012，JPO＆INPIT

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