公开(公告)号：JPH0590126A

公开(公告)日：1993-04-09

申请号：JP27695391

申请日：1991-09-27

Applicant: CANON KK

Inventor： MATSUMOTO TAKAHIRO ,  NOSE TETSUSHI ,  YOSHII MINORU ,  SAITO KENJI ,  CHITOKU KOICHI ,  HASEGAWA MASANORI

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To detect position deviation in two directions by using a diffraction grating wherein grating lines are arranged in the oblique direction. CONSTITUTION:A Zeeman laser light source 30 outputs two luminous fluxes having different frequencies. The outputted light is branched in two paths according to polarization directions by a polarization beam splitter 31. The branched beams pass a mirror 32 and a mirror 34, respectively, and illuminate a linear diffraction grating 35 formed on a mask 34 and a linear diffraction grating 37 formed on a wafer 36. Grating lines are arranged in the oblique directions to constitute the above gratings 35, 37. Diffracted lights from them pass mirrors 38, 39 and are collected in a beam splitter 40. Further said lights pass a Glan- Thompson prism 41, and are made to enter a photo detectors 43 and 44, respectively, by an edge mirror 12, according to the polarization directions. Thus the respective light beat signals are obtained. Said light beat signals are inputted in a phase-meter 45, and the deviation of the diffraction gratings 35, 37 is detected from the phase difference.

公开(公告)号：JPH0587529A

公开(公告)日：1993-04-06

申请号：JP24921691

申请日：1991-09-27

Applicant: CANON KK

Inventor： CHITOKU KOICHI ,  MATSUMOTO TAKAHIRO ,  NOSE TETSUSHI ,  YOSHII MINORU ,  SAITO KENJI

IPC: G01B11/00 ,  G01D5/38 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable a setting to be facilitated and a measurement accuracy to be improved by separating

公开(公告)号：JPH04207013A

公开(公告)日：1992-07-29

申请号：JP33990890

申请日：1990-11-30

Applicant: CANON KK

Inventor： YOSHII MINORU ,  SAITO KENJI ,  ABE NAOTO

IPC: H01L21/027 ,  G03F9/00

Abstract: PURPOSE:To eliminate the adverse influence of noise light so as to detect the relative positional deviation between a mask and wafer with high accuracy by oscillating an alignment luminous flux on the mask and wafer in a direction in which the oscillation is insensible from the detecting direction. CONSTITUTION:Alignment marks 5 on a mask 1 are scanned with a laser beam from a light source 10 by oscillating a mirror GM to which the laser loam is made incident through a collimator lens 12 and the transmit and diffracted luminous flux of the laser beam is made incident to an alignment mark 3 on the surface of a waver 2. The luminous flux made incident to the surface of the wafer 2 is condensed by means of a light receiving lens 13 and made incident to the surface of a detecting section 11. The luminous flux made incident to the section 11 is photoelectrically converted and an A/D-converting section 19 and computing means 20 find the relative in-plane positional deviation between the mask 1 and wafer 2 from the incident position of the alignment luminous flux to the detecting section 11. When the light noise caused by speckles is averaged by slightly oscillating the alignment luminous flux in a direction (y) which is insensible from the position detection, highly accurate positioning can be realized.

公开(公告)号：JPH04177985A

公开(公告)日：1992-06-25

申请号：JP30406990

申请日：1990-11-13

Applicant: CANON KK

Inventor： KATO TAKASHI ,  SUDA SHIGEYUKI ,  YOSHII MINORU ,  TOKUMITSU JUN

IPC: H04N5/335 ,  H04N5/341 ,  H04N5/353 ,  H04N5/372 ,  H04N5/378

Abstract: PURPOSE:To obtain a video picture with high sensitivity by outputting a picture picked up by an image pickup element repetitively after pickup under a specific condition or interpolating and synthesizing plural pictures and outputting an output video signal without changing the field rate of the output signal. CONSTITUTION:Let a field rate of an output video signal be (a) (fields/sec), a field rate picked up actually be (b) (fields/sec), and a shutter speed be (c) (1/sec), then an object is picked up by an image pickup element through an image pickup lens under the condition of a slower field rate than an output video signal (b 1/a). Then a picked-up picture is repetitively outputted from the image pickup element or plural pictures are interpolated and synthesized and the video signal is outputted without changing the field rate (a) of the output video signal. Thus, the sensitivity against the object at a dark place is improved and each picked-up picture is subject to picture processing with a weight to send the video image of the dark object as the video picture in real time.

公开(公告)号：JPH04168717A

公开(公告)日：1992-06-16

申请号：JP29355490

申请日：1990-11-01

Applicant: CANON KK

Inventor： TAKAYAMA HIDEMI ,  SAKAMOTO EIJI ,  YOSHII MINORU

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To shorten a square and reduce the effect of disturbance, to improve the reliability of positional measurement and to facilitate the alignment of a wafer by installing a rotation-angle detecting mechanism onto the shaft of a theta stage while providing a movement detecting means. CONSTITUTION:A wafer 2 coarsely adjusted so that wafer coordinates and absolute coordinates coincide is loaded and fixed onto a theta stage 1, and the initial position of the stage 1 is conformed to absolute coordinates. The quantity of displacement of wafer coordinates and absolute coordinates is measured, the stage 1 is turned and wafer coordinates and absolute coordinates are made parallel, and the angle of rotation of the stage 1 is detected by a rotation-angle detector 7. An arbitrary position on the wafer 2 is moved to an absolute- coordinate origin from the quantity of parallel displacement detected and the angle of rotation and the wafer is exposed under the state in which coordinates are mated, the stage 1 is revolved, and a movement section by revolution generated from the deviation between the rotation axis and the absolute-coordinate origin is corrected. Accordingly, the length of a square shortened and manufacturing cost is reduced while the effect of disturbance is lowered, and alignment is enabled easily.

公开(公告)号：JPH0436605A

公开(公告)日：1992-02-06

申请号：JP14386990

申请日：1990-06-01

Applicant: CANON KK

Inventor： NOSE TETSUSHI ,  SUDA SHIGEYUKI ,  SAITO KENJI ,  YOSHII MINORU

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To detect the relative positions of a 1st and a 2nd bodies with high accuracy by determining the incidence position of a light beam from a projecting means on a physical optical element provided on the 1st or 2nd bodies. CONSTITUTION:A reference mark 100 is formed on a diffraction grating pattern on the surface of a mask (1st body) 18 first and scanned with luminous flux from a light source 1, and a light receiving means 11 detects the variation of diffracted light 16 generated with the mark 100 by the scanning. The output signal of the light receiving means 11 is utilized to detect the relative positions of the projecting means (light source 1, lens 5, etc.) and the mask 18, relaxing the machine accuracy and assembly accuracy. Physical optical elements are formed on the surface of the mask 18 and the surface of a wafer 19, diffracted light 16 generated by making light incident on one optical element from the light source 1 is made incident on the other optical element, and a sensor 11 detects the luminous flux position of the diffraction pattern formed on the other optical element, thereby detecting the relative positions of the mask 18 and wafer 19 with high accuracy.

公开(公告)号：JPH0431704A

公开(公告)日：1992-02-03

申请号：JP13682890

申请日：1990-05-25

Applicant: CANON KK

Inventor： HORYU SAKAE ,  YOSHII MINORU

IPC: G01B11/00 ,  H01L21/027

Abstract: PURPOSE:To align positions highly accurately by obtaining the position deviation between a first body and a second body and the interval between the first body and the second body. CONSTITUTION:The relative positions of a first body 1 and a second body 2 are detected. At this time, a deviation amount DELTA and an interval (g) between the two bodies are obtained based on the following combinations. The two amounts depending on the relative deviation amount DELTA between the first body 1 and the second body 2 and the interval (g) between the first body 1 and the second body 2 are combined with the amount which does not depend on both the deviation amount DELTA and the interval (g). Or the amounts depending on the deviation DELTA and the interval (g), the amount depending on only the interval (g) and the amount which does not depend on both of the deviation amount DELTAand the interval (g) are combined. The relative positions of the body 1 and the body 2 are detected by utilizing the deviation amount DELTA and the interval (g).

公开(公告)号：JPH03263985A

公开(公告)日：1991-11-25

申请号：JP6121390

申请日：1990-03-14

Applicant: CANON KK

Inventor： UNNO YASUYUKI ,  TOKUMITSU JUN ,  YOSHII MINORU ,  SUDA SHIGEYUKI

IPC: H04N5/66 ,  G09F9/00 ,  H04N5/74 ,  H04N9/31

Abstract: PURPOSE:To prevent picture lights from each projector from being overlapped at a border by differentiating a rate of dividing each scanning line in the horizontal direction by a division means and a vertical position of a scanning line switching a projection device from each one scanning line or plural scanning lines respectively. CONSTITUTION:A signal division circuit 3 stores a part corresponding to a left side and a right side to line memories 4, 5 respectively and processes the luminance distribution at the division point simultaneously. In this case, the signal division point is decided to a different position in I field and II field. Since a signal for each scanning line is fed successively to a line memory 2, the processing is implemented by the control of a microprocessor 13 for the horizontal blanking period. Each signal read out of the line memories 4, 5 is reproduced as one scanning line on the screen. Thus, the change in the brightness distribution of a picture on the screen is slow when the lightness of the video light differs from each projector.

公开(公告)号：JPH02238308A

公开(公告)日：1990-09-20

申请号：JP5795389

申请日：1989-03-13

Applicant: CANON KK

Inventor： ABE NAOTO ,  YOSHII MINORU

IPC: G01B11/00 ,  H01L21/027

Abstract: PURPOSE:To accurately calculate the positional relation between two objects by detecting the relative positional relation between a mask and a wafer by utilizing the correlation value between the shape of the luminous intensity of luminous flux and the shape of the luminous intensity distribution of luminous flux at the time of measurement. CONSTITUTION:The luminous flux emitted from a semiconductor laser 101 becomes parallel light by a collimator lens 102 to be reflected in the direction of a wafer by a half mirror 103 and the parallel light is diffracted by a mask alignment mark 104a and a wafer alignment mark 105a. The diffracted luminous flux is transmitted through the half mirror 103 to reach a photoelectric converter 107. In this case, luminus flux 106a having alignment data is positioned on the photoelectric converter 107 corresponding to the relative positional relation between a mask and the wafer. Since the mask alignment mark 105a constitutes a double grating physical optics element, the mask and wafer are moved on the photoelectric converter 107 in such a state that the shift of both of them is magnified, for example, by 100 times. By this method, the positional relation between the first and second objects can be accurately calculated regardless of a fluctuation factor.

公开(公告)号：JPH02167408A

公开(公告)日：1990-06-27

申请号：JP3673989

申请日：1989-02-16

Applicant: CANON KK

Inventor： MATSUGI MASAKAZU ,  SUDA SHIGEYUKI ,  SAITO KENJI ,  ABE NAOTO ,  YOSHII MINORU ,  KURODA AKIRA

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable high-accuracy position detection by passing the luminous flux which is emitted by a light source through a collimator lens and reflecting it by the reflecting mirror of a projection lens system. CONSTITUTION:The luminous flux emitted by the light source 10 is passes through the collimator lens 11 and reflected 13 by the projection lens system 12 to irradiate slantingly a 1st physical optic element 3 provided to a 1st body 1. Further, the element 3 converges the projection light on a point at a specific distance from the element 3. Then the luminous flux which is diverged from the point is made incident on a 2nd physical optic element provided to a 2nd body 2 arranged at a specific distance. This 2nd physical optic element provides converging operation as well as the element 3 to pass the emitting light from the 2nd physical optical element through the element 3 and then converges the light on the detection surface 9 of a detector 8 by 14. Namely, the convergence point is formed by the element 3 and the luminous flux emitted from the 1st diffraction image is converged by the 2nd physical optic element to form the diffraction image again.