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    SILICA CONTAINER FOR PULLING SINGLE CRYSTAL SILICON AND METHOD FOR MANUFACTURING THE SAME
    152.
    发明申请
    SILICA CONTAINER FOR PULLING SINGLE CRYSTAL SILICON AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    用于拉伸单晶硅的硅砂容器及其制造方法

    公开(公告)号：US20150114284A1

    公开(公告)日：2015-04-30

    申请号：US14398880

    申请日：2014-03-25

    Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

    Inventor： Shigeru Yamagata

    IPC: C03B19/09 ,  C30B15/10

    CPC classification number: C03B19/095 ,  C03B2201/03 ,  C03B2201/04 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y10T117/1032

    Abstract: The present invention provides a silica container for pulling single crystal, the container having a straight body portion, a curved portion, and a bottom portion, wherein an outer side of the container is made of opaque silica glass containing bubbles, and an inner side of the container is made of transparent silica glass, and a mixed silica layer in which a phase in which a crystalline silica powder is fused and a phase in which an amorphous silica powder is fused are mixed in a granular texture is provided on at least an inner surface layer portion of the straight body portion. As a result, there is provided the silica container for pulling single crystal silicon which can suppress melt surface vibration of a silicon melt in the silica container at a high temperature.

    Abstract translation: 本发明提供一种用于牵引单晶的二氧化硅容器，容器具有直的主体部分，弯曲部分和底部，其中容器的外侧由含有气泡的不透明的石英玻璃制成，内侧 该容器由透明的二氧化硅玻璃制成，并且在至少一个内部的内部设置混合二氧化硅层的混合二氧化硅层，其中结晶二氧化硅粉末熔融的相和熔融无定形二氧化硅粉末的相混合在一起， 直体部的表层部。 结果，提供了可以抑制二氧化硅容器中的硅熔体在高温下的熔融表面振动的用于拉出单晶硅的二氧化硅容器。

    SILICA CONTAINER FOR PULLING SINGLE CRYSTAL SILICON AND METHOD FOR PRODUCING THE SAME
    153.
    发明申请
    SILICA CONTAINER FOR PULLING SINGLE CRYSTAL SILICON AND METHOD FOR PRODUCING THE SAME 审中-公开
    用于拉伸单晶硅的硅砂容器及其制造方法

    公开(公告)号：US20140041575A1

    公开(公告)日：2014-02-13

    申请号：US14112190

    申请日：2013-01-22

    Applicant: Shigeru Yamagata

    Inventor： Shigeru Yamagata

    IPC: C30B15/10

    CPC classification number: C30B15/10 ,  C03B19/095 ,  C03B2201/03 ,  C30B29/06 ,  C30B35/002 ,  Y02P40/57 ,  Y10T117/1032

    Abstract: The present invention is directed to a silica container for pulling single crystal silicon, the silica container including a straight body portion, a curved portion, and a bottom portion, wherein the outside of the silica container is made of opaque silica glass containing gaseous bubbles, the inside of the silica container is made of transparent silica glass containing substantially no gaseous bubble, and, on the inner surface of the bottom portion, a silica glass layer containing the OH group in a concentration of more than 300 ppm by mass but 3000 ppm by mass or less, the silica glass layer having a thickness of 20 μm or more but 1000 μm or less, is formed. As a result, a low-cost silica container for pulling single crystal silicon, the silica container that can reduce cavity defects called voids and pinholes in pulled single crystal silicon, is provided.

    Abstract translation: 本发明涉及一种用于拉取单晶硅的二氧化硅容器，该二氧化硅容器包括直体部分，弯曲部分和底部部分，其中二氧化硅容器的外部由含有气泡的不透明二氧化硅玻璃制成， 二氧化硅容器的内部由基本上不含气泡的透明石英玻璃制成，并且在底部的内表面上含有浓度大于300质量ppm但为3000ppm的OH基的二氧化硅玻璃层 以下，形成厚度为20μm以上且1000μm以下的石英玻璃层。 结果，提供了一种用于拉制单晶硅的低成本二氧化硅容器，可以减少被拉制的单晶硅中称为空洞和针孔的空洞缺陷的二氧化硅容器。

    FUSED SILICA GLASS AND PROCESS FOR PRODUCING THE SAME
    157.
    发明申请
    FUSED SILICA GLASS AND PROCESS FOR PRODUCING THE SAME 有权
    熔融二氧化硅玻璃及其制造方法

    公开(公告)号：US20100041538A1

    公开(公告)日：2010-02-18

    申请号：US12440683

    申请日：2007-09-11

    Applicant: Kazuyoshi Arai ,  Tsutomu Takahata ,  Shinkichi Hasimoto ,  Masahito Uchida ,  Nobusuke Yamada ,  Yoshinori Harada ,  Hideharu Horikoshi

    Inventor： Kazuyoshi Arai ,  Tsutomu Takahata ,  Shinkichi Hasimoto ,  Masahito Uchida ,  Nobusuke Yamada ,  Yoshinori Harada ,  Hideharu Horikoshi

    IPC: C03C3/04 ,  C03C10/00

    CPC classification number: C03C4/0085 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/10 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2201/54 ,  Y02P40/57

    Abstract: Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10−10 cm2/sec in a depth range of greater than 20 μm up to 100 μm, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by crystobalitizing powdery silica raw material; then, fusing the crystobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.

    Abstract translation: 具有245nm波长的UV的内部透射率，10mm厚度至少95％，OH含量不大于5ppm，Li，Na，K，Mg，Ca和Cu的含量的熔融石英玻璃 小于0.1ppm。 优选地，玻璃的1215℃下的粘度系数至少为1011.5Pa·s; 在大于20μm至100μm的深度范围内的Cu离子扩散系数不大于1×10 -10 cm 2 / sec，在1050℃在空气中放置24小时时， 。 玻璃由硅胶粉末二氧化硅原料精制而成; 然后，在非还原气氛中将经晶化的二氧化硅材料熔融。 该玻璃的紫外线，可见光和红外线的透射率高，纯度高，耐热性高，金属杂质的扩散速度降低，因此适用于各种光学制品，半导体制造装置部件和液晶 展示生产设备成员。

    METHOD FOR PRODUCING VITREOUS SILICA CRUCIBLE
    158.
    发明申请
    METHOD FOR PRODUCING VITREOUS SILICA CRUCIBLE 审中-公开
    生产维生素二氧化硅可溶性的方法

    公开(公告)号：US20100000465A1

    公开(公告)日：2010-01-07

    申请号：US12168375

    申请日：2008-07-07

    Applicant: Hiroshi KISHI ,  Minoru KANDA

    Inventor： Hiroshi KISHI ,  Minoru KANDA

    IPC: C03B19/01 ,  C03B19/04 ,  C30B15/00

    CPC classification number: C03B19/095 ,  C03B2201/03 ,  C30B11/002 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y10T117/1032

    Abstract: A method is provided for producing a vitreous silica crucible having excellent shape formability and fewer internal bubbles without excessively heating the curved portion and the bottom part. The method comprises arc melting a quartz powder molded product loaded in a rotating mold while performing vacuum suction, wherein the electrode is moved sideways with respect to the mold center line upon the initiation of arc melting or during the arc melting, and the arc melting is performed at an eccentric position, and preferably the time for total heating is limited to 60% or less of the total arc melting time. A vitreous silica crucible produced by this method is also provided.

    Abstract translation: 提供了一种制造具有优异形状成形性和较少内部气泡而不过度加热弯曲部分和底部的氧化硅石坩埚的方法。 该方法包括在进行真空抽吸的同时对装载在旋转模具中的石英粉末模制品进行电弧熔化，其中在电弧熔化开始时或电弧熔化期间电极相对于模具中心线侧向移动，并且电弧熔化 在偏心位置进行，最好将总加热时间限制在总电弧熔化时间的60％以下。 还提供了通过该方法生产的石英玻璃坩埚。

    Synthetic quartz glass for optical member and its production method
    159.
    发明授权
    Synthetic quartz glass for optical member and its production method 有权
    光学构件合成石英玻璃及其制作方法

    公开(公告)号：US07514382B2

    公开(公告)日：2009-04-07

    申请号：US11398669

    申请日：2006-04-06

    Applicant: Yoshiaki Ikuta ,  Noriyuki Agata

    Inventor： Yoshiaki Ikuta ,  Noriyuki Agata

    IPC: C03C3/06 ,  C03B20/00

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  Y02P40/57

    Abstract: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

    Abstract translation: 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解氧分子或还原型 其浓度最多为50ppm，OH基浓度为100ppm以下，含有缺氧缺陷量为5×1014个/ cm 3以下且至少1×10 13个缺陷/ cm 3以下的缺陷缺陷。 氟浓度优选为100ppm以下。

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