Synthetic quartz glass optical material and optical member for f2 excimer lasers
    154.
    发明申请
    Synthetic quartz glass optical material and optical member for f2 excimer lasers 有权
    合成石英玻璃光学材料和用于f2准分子激光器的光学构件

    公开(公告)号:US20020151425A1

    公开(公告)日:2002-10-17

    申请号:US10048309

    申请日:2002-01-29

    Abstract: An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5null1016 molecules/cm3 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2null10null5 or lower.

    Abstract translation: 本发明的目的是提供一种合成石英玻璃光学材料,其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率,并且具有高的对F2准分子激光辐射照射的抗性,但具有适合的均匀性 对于使用F2准分子激光器的精细图案化,并提供使用其的光学部件。 上述问题通过具有OH基浓度为0.5ppm以下,氟浓度为0.1〜2mol%,氢分子浓度为5×1016分/ cm 3以下的F2准分子激光的合成石英玻璃光学材料来解决,a 最大和最小氟浓度在20 mol ppm内的差异,以及最大和最小折射率之间的差异为2×10-5或更低。

    Photolithography methods and systems
    155.
    发明申请
    Photolithography methods and systems 失效
    光刻方法和系统

    公开(公告)号:US20020077244A1

    公开(公告)日:2002-06-20

    申请号:US09967841

    申请日:2001-09-27

    Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02null1018 molecules/cm3 and about 0.18null1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

    Abstract translation: 公开了平版印刷方法。 在一种这样的方法中,用于产生波长短于约300nm的波长小于10mJ / cm 2 /脉冲的紫外光刻辐射的脉冲紫外辐射源和具有分子氢浓度的高纯度熔融石英光刻玻璃 提供约0.02×10 18分子/ cm 3和约0.18×10 18分子/ cm 3。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将还原的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成,还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。

    Projection lithography photomasks and methods of making
    159.
    发明授权
    Projection lithography photomasks and methods of making 失效
    投影光刻光掩模和制作方法

    公开(公告)号:US06319634B1

    公开(公告)日:2001-11-20

    申请号:US09397572

    申请日:1999-09-16

    Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

    Abstract translation: 本发明是制造光刻光掩模和光掩模坯料的方法。 制造光刻光掩模和光掩模坯料的方法包括提供OH含量低于50ppm的氟氧化硅玻璃管。 该方法还包括切割氟氧化硅玻璃管,使氟氧化硅玻璃管扁平化,并将扁平切割的氟氧化硅玻璃管形成具有平坦表面的光掩模坯料。 本发明包括玻璃光刻掩模预制件。 玻璃光刻掩模预制件是具有OH含量<= 10ppm的纵向硅氧氟化物玻璃管,F wt。 %浓度> = 0.5wt。 %。

    Synthetic quartz glass and production process
    160.
    发明申请
    Synthetic quartz glass and production process 失效
    合成石英玻璃及生产工艺

    公开(公告)号:US20010018834A1

    公开(公告)日:2001-09-06

    申请号:US09747953

    申请日:2000-12-27

    Abstract: A process for producing synthetic quartz glass using a burner composed of a plurality of concentric nozzles involves the steps of feeding a silica-forming raw material gas and a fluorine compound gas to a reaction zone from a center nozzle, feeding oxygen gas from a second nozzle outside the center nozzle, and feeding oxygen gas and/or hydrogen gas from a third nozzle. The silica-forming raw material gas is hydrolyzed to form fine particles of silica, which particles are deposited on a rotatable substrate so as to form a porous silica matrix, which is then fused to give the quartz glass. The flow rate of the oxygen gas fed from the second nozzle and the flow rate of the raw material gas are controlled so as to provide a 1.1- to 3.5-fold stoichiometric excess of oxygen. The excess oxygen suppresses SinullSi bond formation in the quartz glass, enabling the production of synthetic quartz glass having a high transmittance in the vacuum ultraviolet region.

    Abstract translation: 使用由多个同心喷嘴构成的燃烧器来生产合成石英玻璃的方法包括以下步骤:将来自中心喷嘴的二氧化硅生成原料气体和氟化合物气体供给到反应区域,从第二喷嘴 在中心喷嘴外部,并且从第三喷嘴供给氧气和/或氢气。 二氧化硅形成原料气体被水解以形成二氧化硅细颗粒,该颗粒沉积在可转动的基底上,以便形成多孔二氧化硅基质,然后熔化以得到石英玻璃。 控制从第二喷嘴供给的氧气的流量和原料气体的流量,从而提供1.1-3.5倍化学计量的过量的氧气。 过量的氧抑制石英玻璃中的Si-Si键的形成,能够在真空紫外线区域中制造具有高透射率的合成石英玻璃。

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