公开(公告)号：US08443630B2

公开(公告)日：2013-05-21

申请号：US13082080

申请日：2011-04-07

Applicant: Igor Milicevic ,  Mattheus Jacobus Nicolaas Van Stralen ,  Johannes Antoon Hartsuiker ,  Eugen Aldea ,  Eric Aloysius Kuijpers

Inventor： Igor Milicevic ,  Mattheus Jacobus Nicolaas Van Stralen ,  Johannes Antoon Hartsuiker ,  Eugen Aldea ,  Eric Aloysius Kuijpers

IPC: C03B37/018

CPC classification number: C03B37/0183 ,  C03B37/01807 ,  C03B2201/12 ,  C03B2201/24 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/42

Abstract: A method for manufacturing a primary preform for optical fibers using an internal vapor deposition process, including the steps of: i) providing a hollow glass substrate tube having a supply side and a discharge side, ii) surrounding at least part of the hollow glass substrate tube by a furnace, iii) supplying a gas flow, doped or undoped, of glass-forming gases to the interior of the hollow glass substrate tube via the supply side thereof, iv) creating a reaction zone in which conditions such that deposition of glass will take place on the interior of the hollow glass tube are created, and v) moving the reaction zone back and forth in longitudinal direction over the hollow glass substrate tube between a reversal point located near the supply side and a reversal point located near the discharge side of the hollow glass substrate tube.

Abstract translation: 一种使用内部气相沉积工艺制造用于光纤的初级预制棒的方法，包括以下步骤：i）提供具有供给侧和排出侧的中空玻璃基板管，ii）至少部分中空玻璃基板 通过炉子管，iii）通过其供应侧向中空玻璃基底管的内部供应玻璃形成气体的掺杂或未掺杂的气流，iv）产生反应区，其中使玻璃沉积的条件 将产生在中空玻璃管​​的内部，并且v）使反应区域在纵向方向上前后移动到中空玻璃基板管之间，位于靠近供应侧的反转点和位于放电附近的反转点 一侧的中空玻璃基板管。

公开(公告)号：US20130047669A1

公开(公告)日：2013-02-28

申请号：US13563882

申请日：2012-08-01

Applicant: Sezhian Annamalai

Inventor： Sezhian Annamalai

IPC: C03B19/06

CPC classification number: C03B19/06 ,  C03B19/063 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42

Abstract: In one aspect the disclosure is directed to a binary silica-titania glass blank having a CTE of 0±30 ppb/° C. or less over a temperature range of 5° C. to 35° C., and a doped silica-titania glass critical zone, wherein the dopant(s) are selected from the group consisting of aluminum oxide, and transition metal oxides, and amount of the dopant(s) is in the range of 0.05 wt. % to 8 wt. %. In various embodiments the dopants are selected from the group consisting of 0.25 wt. % to 8 wt. % Al2O3, 0.05 wt. % to 3 wt. % Nb2O5, and 0.25 wt. % to 6 wt. % Ta2O5, and mixtures thereof.

Abstract translation: 一方面，本公开涉及在5℃至35℃的温度范围内CTE为0±30ppb /℃或更低的二氧化硅 - 二氧化钛玻璃坯料，掺杂的二氧化硅 - 二氧化钛 玻璃临界区，其中所述掺杂剂选自氧化铝和过渡金属氧化物，并且所述掺杂剂的量在0.05重量％的范围内。 ％至8wt。 ％。 在各种实施方案中，掺杂剂选自0.25wt。 ％至8wt。 ％Al 2 O 3，0.05重量％ ％〜3重量％ ％Nb2O5和0.25wt。 ％至6wt。 ％Ta 2 O 5，及其混合物。

公开(公告)号：US08356494B2

公开(公告)日：2013-01-22

申请号：US13210673

申请日：2011-08-16

Applicant: Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

Inventor： Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

IPC: C03B37/018 ,  C03C3/06

CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44

Abstract: A process for producing a porous quartz glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

Abstract translation: 一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积并生长在基材上，其中燃烧器具有 至少两个喷嘴，其中含有（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体，以及（D）选自以下的一种或多种气体： 一组稀有气体，N 2，CO 2，卤化氢和H 2 O，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

公开(公告)号：US20120327384A1

公开(公告)日：2012-12-27

申请号：US13531315

申请日：2012-06-22

Applicant: Wilfried CLAUSS

Inventor： Wilfried CLAUSS

IPC: G02B5/08 ,  G03B27/54 ,  B05D3/12 ,  B05D5/06 ,  B05D3/06

CPC classification number: C03C23/0005 ,  C03B32/005 ,  C03B2201/42 ,  C03C17/00 ,  C03C17/40 ,  C03C2218/31 ,  G02B1/12 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70316 ,  G03F7/7095 ,  G21K1/062

Abstract: A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either the pre-compacting of the substrate (10b) is performed until a saturation value of the compaction of the substrate (10b) by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate (10b) is irradiated, preferably homogeneously, with ions (16) and/or with electrons in a surface region (15) in which the coating (10a) has been or will be applied. A mirror element (10) for the EUV wavelength range associated with the method has a substrate (10b) pre-compacted by hot isostatic pressing. Such a mirror element (10) is suitable to be provided in an EUV projection exposure system.

Abstract translation: 一种用于生产具有用于EUV波长范围的反射涂层（10a）的反射镜元件（10）的方法和一种基板（10b）。 基板（10b）通过热等静压进行预压实，并将反射涂层（10a）施加到预压实的基板（10b）上。 在该方法中，进行基板（10b）的预压实，直到达到通过长期EUV照射的基板（10b）的压实的饱和值，或者为了进一步压缩，预压实基板 （10b）在涂层（10a）已经或将被施加的表面区域（15）中与离子（16）和/或电子被优选均匀地照射。 用于与该方法相关联的EUV波长范围的镜元件（10）具有通过热等静压预压制的基底（10b）。 这种镜子元件（10）适合于设置在EUV投影曝光系统中。

公开(公告)号：US20120258389A1

公开(公告)日：2012-10-11

申请号：US13442550

申请日：2012-04-09

Applicant: Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

IPC: G03F1/24 ,  C03B19/06

CPC classification number: G03F1/24 ,  C03B19/1415 ,  C03B19/1423 ,  C03B2201/42 ,  C03B2207/64 ,  C03C3/06 ,  C03C4/0085 ,  C03C4/08 ,  C03C2201/42 ,  C03C2203/42 ,  G03F1/50

Abstract: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.

Abstract translation: 在二氧化钛掺杂的石英玻璃的EUV光反射表面上，包括在连接反射表面中心的原点（O）到双折射测量点（A）的直线和快速轴线之间的角度（＆amp; 在测量点（A）处的双折射的平均值大于45度。 由于双折射的快轴以同心的方式分布，所以可获得适用于EUV光刻的具有高平坦度的二氧化钛掺杂石英玻璃基板。

公开(公告)号：US20120121857A1

公开(公告)日：2012-05-17

申请号：US13295652

申请日：2011-11-14

Applicant: Akio Koike ,  Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Tomonori Ogawa

Inventor： Akio Koike ,  Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Tomonori Ogawa

IPC: C03C3/04 ,  B32B3/00 ,  C03B25/00

CPC classification number: C03B19/1453 ,  B82Y10/00 ,  B82Y40/00 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/42 ,  C03C2203/52 ,  G03F1/24

Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.

Abstract translation: 本发明涉及一种制备TiO 2 -SiO 2玻璃体的方法，包括以下步骤：当将透明玻璃化后的TiO 2 -SiO 2玻璃体的退火点作为T1（℃）时，将玻璃体 在从T1-90（℃）到T1-220（℃）的温度区域透明玻璃化120小时以上。

公开(公告)号：US20110301015A1

公开(公告)日：2011-12-08

申请号：US13210673

申请日：2011-08-16

Applicant: Takahiro MITSUMORI ,  Yasutomi Iwahashi ,  Akio Koike

Inventor： Takahiro MITSUMORI ,  Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/04 ,  C03B20/00

CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44

Abstract: The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

Abstract translation: 本发明涉及一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积和生长在基材上， 其中燃烧器具有至少两个喷嘴，其中包含（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体和（D）一种或 选自稀土气体，N 2，CO 2，卤化氢和H 2 O的更多气体，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

公开(公告)号：US08055115B2

公开(公告)日：2011-11-08

申请号：US11773869

申请日：2007-07-05

Applicant: Bertrand Morasse ,  Jean-Philippe De Sandro ,  Eric Gagnon

Inventor： Bertrand Morasse ,  Jean-Philippe De Sandro ,  Eric Gagnon

IPC: G02B6/00

CPC classification number: C03C13/046 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/34 ,  C03B2201/36 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2203/30 ,  C03B2203/42 ,  C03C3/097 ,  C03C4/065 ,  Y10T428/2913 ,  Y10T428/2933

Abstract: An optically active glass and an optical fiber comprising such glass, having reduced photodarkening properties are provided. The optically active glass is mainly composed of silica representing from about 50 to 98 mol % of the glass. It also includes at least one active ion, such as a rear-earth ion, which induces a photodarkening effect in optical properties of the glass. Moreover, the glass includes an effective amount of phosphorus oxide providing the photodarkening reducing effect, preferably in an amount of from about 1 to 30 mol %. A method for reducing a photodarkening effect in optical properties of an optically active glass including the step of introducing phosphorus oxide to the glass is also provided.

Abstract translation: 提供了具有降低的光暗化性能的光学活性玻璃和包含这种玻璃的光纤。 光学活性玻璃主要由表示玻璃的约50至98摩尔％的二氧化硅构成。 它还包括至少一种活性离子，例如后土离子，其引起玻璃的光学性质的光暗化效果。 此外，玻璃包括提供光暗化还原效果的有效量的氧化磷，优选为约1至30mol％的量。 还提供了一种用于降低光学活性玻璃的光学性能的光暗化效果的方法，包括将氧化磷引入玻璃的步骤。

公开(公告)号：US20110256329A1

公开(公告)日：2011-10-20

申请号：US13044684

申请日：2011-03-10

Applicant: Windsor P. Thomas ,  Daniel Warren Hawtof

Inventor： Windsor P. Thomas ,  Daniel Warren Hawtof

IPC: B32B17/00 ,  C03B19/01 ,  B32B1/00 ,  C03B19/06

CPC classification number: C03B19/1492 ,  C03B19/1453 ,  C03B2201/31 ,  C03B2201/42 ,  C03B2201/58 ,  F42B10/46 ,  F42B15/34 ,  Y10T428/131 ,  Y10T428/1317

Abstract: A near-net or net shape fused silica glass article, such as a radome. The article is formed by depositing silica soot onto a mandrel having a shape that corresponds to the shape of the fused silica glass article. In some embodiments, the mandrel is inductively heated to a temperature that is sufficient to consolidate or sinter the silica soot upon deposition onto the mandrel to form fused silica glass. The fused silica glass article may have an outer layer that is under compression and/or multiple layers comprising various dopants that can alter or affect physical, mechanical, electrical, and/or optical properties.

Abstract translation: 近净或净形熔融石英玻璃制品，如天线罩。 该制品通过将二氧化硅烟灰沉积到具有对应于熔融石英玻璃制品的形状的形状的心轴上而形成。 在一些实施例中，心轴被感应加热到足以在沉积到心轴上时固化或烧结二氧化硅烟炱以形成熔融石英玻璃的温度。 熔融石英玻璃制品可以具有处于压缩下的外层和/或包含可以改变或影响物理，机械，电和/或光学性质的各种掺杂剂的多层。

公开(公告)号：US08039409B2

公开(公告)日：2011-10-18

申请号：US12904236

申请日：2010-10-14

Applicant: Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

Inventor： Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

IPC: C03C3/06 ,  C03C3/076

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/42 ,  C03C3/076 ,  C03C4/0085 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3,000, of 70% or more.

Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃，可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量％的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃， 在400〜700nm波长范围内，每1mm厚的内透射率，T400-700，97％以上; 在400〜3000nm的波长范围内，每1mm厚的内透射率，T400-3,000，70％以上。