System for measuring polarimetric spectrum and other properties of sample
    151.
    发明专利
    System for measuring polarimetric spectrum and other properties of sample 有权
    测量极性光谱和样品的其他性质的系统

    公开(公告)号:JP2011141288A

    公开(公告)日:2011-07-21

    申请号:JP2011055357

    申请日:2011-03-14

    CPC classification number: G01J4/02 G01J3/447 G01N21/21

    Abstract: PROBLEM TO BE SOLVED: To provide a system which relates to a non-destructive technology for measuring a surface parameter of a sample for measuring the birefringence of a surface, a film thickness, etc. using a polarimetric spectrum. SOLUTION: A polarized sample beam 46 of broadband radiation is focused to the surface of a sample 3 and the radiation polarized by the sample is collected by a mirror system in different planes of incidence. The modulated radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Thickness and refractive information may then be derived from the spectrum. The polarization of the sample beam is altered by the focusing and the sample, and the collection of the modulated radiation is repeated employing two different apertures 28 to detect the presence or absence of a birefringence axis in the sample. In the other preferred embodiment, the technology may be combined with ellipsometry for determining the thicknesses and refractive indices of thin films. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种涉及用于测量样品的表面参数的非破坏性技术的系统,用于使用偏振光谱测量表面的双折射,膜厚等。 解决方案:将宽带辐射的极化样品束46聚焦到样品3的表面,并且由样品偏振的辐射由不同入射平面中的反射镜系统收集。 相对于偏振平面分析调制的辐射以提供偏振光谱。 然后可以从光谱导出厚度和折射信息。 通过聚焦和样品改变样品光束的偏振,并且重复使用两个不同的孔28来检测调制的辐射的收集,以检测样品中双折射轴的存在或不存在。 在另一个优选实施例中,该技术可以与用于确定薄膜的厚度和折射率的椭偏仪相结合。 版权所有(C)2011,JPO&INPIT

    Spectroscopic ellipsometer and film thickness measuring apparatus
    152.
    发明专利
    Spectroscopic ellipsometer and film thickness measuring apparatus 审中-公开
    光谱仪和薄膜厚度测量仪器

    公开(公告)号:JP2009068937A

    公开(公告)日:2009-04-02

    申请号:JP2007236277

    申请日:2007-09-12

    Inventor: HORIE MASAHIRO

    CPC classification number: G01B11/0641 G01J3/447 G01N21/211 G01N2021/213

    Abstract: PROBLEM TO BE SOLVED: To detect the size and shape of an irradiation region on an object in a spectroscopic ellipsometer.
    SOLUTION: In a spectroscopic ellipsometer 1 of a film thickness measuring apparatus 10, reflected light reflected on the measurement surface 91 of a substrate 9 is divided into a first polarized light which is a linearly polarized component in a predetermined polarization direction, and a second polarized light which is a linearly polarized component, in a polarization direction perpendicular to the first polarized light, by an analyzer 42 of a light-receiving part 4. The polarization state at each wavelength of the reflected light is measured with the first polarized light, and the size and shape of the irradiation region on the measurement surface 91 of the substrate 9 are detected by using the second polarized light. In the spectroscopic ellipsometer 1, since the detection of the size and shape of the irradiation region is performed with the second polarized light which is a polarized component that is not used in the measurement of the polarization state, of the reflected light from the measurement surface 91, to detect the size and shape of the irradiation region on the measurement surface 91 of the substrate 9 can be detected with high accuracy, while maintaining the measurement accuracy of the polarization state of the reflected light to be high.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:在分光椭偏仪中检测物体上的照射区域的尺寸和形状。 解决方案:在膜厚测量装置10的分光椭偏仪1中,将在基板9的测量表面91上反射的反射光分成预定偏振方向的线偏振分量的第一偏振光, 通过受光部分4的分析器42在垂直于第一偏振光的偏振方向上的线偏振分量的第二偏振光。反射光的每个波长处的偏振状态用第一偏振 通过使用第二偏振光来检测基板9的测量表面91上的照射区域的尺寸和形状。 在分光椭偏仪1中,由于在来自测量表面的反射光中,以偏振态测量中未使用的偏振分量的第二偏振光进行照射区域的尺寸和形状的检测 如图91所示,为了检测基板9的测量面91上的照射区域的尺寸和形状,可以高精度地检测反射光的偏振状态的测量精度。 版权所有(C)2009,JPO&INPIT

    Spectroscopic ellipsometer, its focus adjusting method, and film thickness measuring apparatus
    153.
    发明专利
    Spectroscopic ellipsometer, its focus adjusting method, and film thickness measuring apparatus 有权
    光谱仪,其重点调整方法,薄膜厚度测量仪

    公开(公告)号:JP2009058259A

    公开(公告)日:2009-03-19

    申请号:JP2007223897

    申请日:2007-08-30

    CPC classification number: G01J3/447 G01J3/4412

    Abstract: PROBLEM TO BE SOLVED: To highly accurately adjust the focus of a spectroscopic ellipsometer. SOLUTION: In the spectroscopic ellipsometer 1, light from a light source 31 is made incident at an angle onto the measuring surface 91 of a substrate 9 via an optical system of an illumination part 3 and guided to a light-receiving device 422 via an optical system of a light-receiving part 4 to analyze polarization on the basis of the spectral intensity of reflected light from the measuring surface 91 acquired by the light-receiving device 422. In the adjustment of the focus of the spectroscopic ellipsometer 1, the focal position of the measuring surface 91 is determined on the basis of the sum quantity of light in a prescribed wavelength band of the reflected light from the measuring surface 91 acquired by the light-receiving device 422. By sharing an optical system used for polarization analysis and an optical system used for focus adjustment in this way in the spectroscopic ellipsometer 1, it is possible to exclude the effects of changes in the optical systems due to temperature changes etc. and perform highly accurate focus adjustment. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:高精度地调整光谱椭偏仪的焦点。 解决方案:在分光椭偏仪1中,通过照明部分3的光学系统以一定角度将来自光源31的光入射到基板9的测量表面91上,并被引导到光接收装置422 通过光接收部分4的光学系统,基于由光接收装置422获取的来自测量表面91的反射光的光谱强度来分析偏振。在调整分光椭偏仪1的焦点时, 基于由光接收装置422获取的来自测量表面91的反射光的规定波长带中的光的总量来确定测量表面91的焦点位置。通过共享用于偏振的光学系统 分析和用于以这种方式在光谱椭偏仪1中进行焦点调整的光学系统,可以排除由于温度导致的光学系统变化的影响 改变等等,并进行高精度的焦点调整。 版权所有(C)2009,JPO&INPIT

    Parallel detection spectroscopic ellipsometer / polarimeter

    公开(公告)号:JP2003508772A

    公开(公告)日:2003-03-04

    申请号:JP2001521964

    申请日:2000-07-27

    CPC classification number: G01J4/04 G01J3/447 G01J4/00 G01N21/211

    Abstract: (57)【要約】 平行検出分光楕円偏光計/偏光計センサ10は、可動部分を有することなくかつ処理室内でサンプル22の薄膜表面特性の随時モニタリングのためにリアルタイムに作動する。 該センサは偏光子16を介してサンプルの表面に向けられたコリメートビーム14を形成するための多重スペクトル光源源12を有する。 このようにコリメートされたビームはサンプル22の表面に当たりかつサンプル22の表面から反射され、それによってサンプル22の固有の材料特性のための偏光状態が変化する。 サンプル22から反射された光は偏光フィルタを通った別々のビーム36,38,58,62に分離され、各ビームは個別の分光強度を有する。 該4つの個別の分光強度についてのデータは、処理室内に集められ、1つ又はそれ以上の分光計に送られる。 その後全部で4つの個別の分光強度のデータは変換アルゴリズムを使用してリアルタイムに分析される。

    Optical spectrum analyzer with tunable interference filter
    157.
    发明专利
    Optical spectrum analyzer with tunable interference filter 审中-公开
    具有可控干涉滤光片的光谱分析仪

    公开(公告)号:JPH11271679A

    公开(公告)日:1999-10-08

    申请号:JP1807499

    申请日:1999-01-27

    CPC classification number: G01J3/26 G01J3/447

    Abstract: PROBLEM TO BE SOLVED: To prevent a band width and an insertion loss of a filter from increasing according to that a tilt angle of an (optical spectrum analyzer) interference filter is fluctuated and an OSA from becoming unsuitable for measurement of an optical signal in a DWDM(high density wavelength division multiplex) optical communication system. SOLUTION: The OSA contains a polarization correcting device 12. The polarization correcting device 12 splits spatially the orthogonal polarization component of the added optical signal to make it an independent light beam, and rotates the relative polarization component of the light beam, and constitutes so that the light beam is made multi-path constitution in the single polarization state, and is made incident on a tunable interference filter 14. The light beam is directed, and passes through the areas 14a, 14b of the interference filter 14 placed on a contour line of a substantially equal central wavelength, and filter band width are narrowed equally by respective plural paths passing through the interference filter 14. The narrow band width and a low insertion loss are kept over a wide tuning range by tilting the interference filter around a tilt axis A intersecting with the area of the interference filter 14 placed on the contour line of the substantially equal central wavelength.

    Abstract translation: 要解决的问题:为了防止滤波器的带宽和插入损耗随着(光谱分析仪)干涉滤波器的倾斜角度的波动而增加,并且OSA变得不适合于测量光信号 DWDM(高密度波分复用)​​光通信系统。 解决方案:OSA包含偏振校正装置12.偏振校正装置12将附加的光信号的正交偏振分量在空间上分开,使其成为独立的光束,并旋转光束的相对偏振分量,并构成为 光束成为单极化状态的多路径结构,并入射到可调谐干涉滤光器14上。光束被引导并穿过放置在轮廓线上的干涉滤光器14的区域14a,14b 基本上相等的中心波长,并且滤波器带宽通过穿过干涉滤光器14的相应的多个路径被均匀地变窄。窄带宽和低插入损耗通过围绕倾斜轴倾斜干涉滤光器而保持在宽的调谐范围内 A与干涉滤光器14的放置在基本相等的中心波长的轮廓线上的区域相交。

    Spectrophotometer
    158.
    发明专利
    Spectrophotometer 失效
    分光光度计

    公开(公告)号:JPS6134429A

    公开(公告)日:1986-02-18

    申请号:JP15634584

    申请日:1984-07-26

    Applicant: Hitachi Ltd

    CPC classification number: G01J3/447

    Abstract: PURPOSE:To measure the reflected spectrum accurately, by separately measuring and recording the reflected spectrums of light beams, which are polarized into two different angles, and operating the reflected spectrum with regard to the light at the other angle of polarization based on the two kinds of spectrums. CONSTITUTION:A sample light beam and a compensating light beam are inputted to a detector 4. These light beams are converted into electric signals. The signals are sent to an A/D converter 10 through an amplifier 9 and further converted into a digital signals. The digital signals are processed by a computer 11. Based on the command from an input device 12, the reflection spectrum of polarized light at 0 deg. (a) is measured. The measured result is stored in a memory device 13. Then the reflected spectrum of polarized light at 90 deg. (b) is measured and stored. Thereafter, the reflected spectrum at theta degrees is measured by an operator 14 based on the expression 1 in the Figure.

    Abstract translation: 目的:通过分别测量和记录被偏振成两个不同角度的光束的反射光谱,并根据两种方法对另一个偏振角的光进行反射光谱的测量,准确地测量反射光谱 的光谱。 构成:将样本光束和补偿光束输入到检测器4.这些光束被转换为电信号。 信号通过放大器9发送到A / D转换器10,并进一步转换为数字信号。 数字信号由计算机11处理。根据来自输入装置12的命令,偏振光在0度的反射光谱。 (a)。 将测量结果存储在存储器件13中。然后将偏振光的反射光谱在90度。 (b)被测量和存储。 此后,基于图中的表达式1,由操作者14测量θ度处的反射光谱。

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