公开(公告)号：US3885153A

公开(公告)日：1975-05-20

申请号：US48142174

申请日：1974-06-20

Applicant: US ENERGY

Inventor： SCHOENBORN BENNO P ,  CASPAR DONALD L D

IPC: G01N23/00 ,  G21K1/06 ,  G01T1/36

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/068

Abstract: This invention provides an artificial monochromator crystal for efficiently selecting a narrow band of neutron wavelengths from a neutron beam having a Maxwellian wavelength distribution, by providing on a substrate a plurality of germanium layers, and alternate periodic layers of a different metal having tailored thicknesses, shapes, and volumetric and neutron scattering densities.

Abstract translation: 本发明提供一种人造单色器晶体，用于通过在衬底上提供多个锗层和具有定制的厚度，形状的不同金属的交替周期性层，从具有麦克斯韦波长分布的中子束有效地选择中子波长窄带 ，以及体积和中子散射密度。

公开(公告)号：WO2013096974A1

公开(公告)日：2013-06-27

申请号：PCT/US2013/020561

申请日：2013-01-07

Applicant: THE UNITED STATES OF AMERICA, as represented by THE SECRETARY DEPT. OF HEALTH AND HUMAN SERVICES

Inventor： WEN, Han

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/067

Abstract: Transmission X-ray gratings (100) include a periodically stepped surface having a plurality of steps (104-109). A multilayer coating (114-119) is situated on each step in one set of substantially parallel step surfaces. The multilayer coating can be a series of alternating bilayers having different complex refractive indices at X-ray wavelengths. In one example, an etched silicon substrate (102) having periodic steps in a surface is provided with suitable multilayer coatings having a common height (H) selected to correspond to a step height. A cap layer is formed over the multilayer coatings, so that the resultant X-ray grating has opposing parallel surfaces (124,126).

Abstract translation: 透射X射线光栅（100）包括具有多个台阶（104-109）的周期性阶梯面。 多层涂层（114-119）位于一组基本平行的台阶表面中的每个台阶上。 多层涂层可以是在X射线波长处具有不同复折射率的一系列交替双层膜。 在一个实例中，在<100>表面中具有周期性步骤的蚀刻硅衬底（102）设置有合适的多层涂层，其具有选择为对应于台阶高度的共同高度（H）。 在多层涂层上形成覆盖层，使得所得到的X射线光栅具有相对的平行表面（124,126）。

公开(公告)号：WO2012039338A1

公开(公告)日：2012-03-29

申请号：PCT/JP2011/071064

申请日：2011-09-08

Applicant: CANON KABUSHIKI KAISHA ,  KOMOTO, Atsushi ,  OKAMOTO, Kohei ,  MIYATA, Hirokatsu

Inventor： KOMOTO, Atsushi ,  OKAMOTO, Kohei ,  MIYATA, Hirokatsu

IPC: G21K1/06

CPC classification number: G21K1/062 ,  G21K1/067 ,  G21K2201/061

Abstract: An X-ray waveguide includes a core (101) to guide X-rays in a wavelength band where the real part of the refractive index of a material is 1 or less, and a cladding (102) to confine the X-rays to the core, in which the core includes a periodic structure having basic structures that contain materials having different real parts of refractive indices, the basic structures being periodically arranged, a low electron density layer (103) is arranged between the core and the cladding and has a lower electron density than that of a material having the highest electron density of all the materials constituting the core, and the critical angle for total reflection of the X-rays at the boundary between the cladding and the low electron density layer is larger than the Bragg angle attributed to the periodicity of the basic structures in the periodic structure of the core.

Abstract translation: X射线波导包括用于引导材料的折射率的实部的1个以下的波长带的X射线的芯部（101）以及将X射线限制到 芯，其中芯包括具有包含具有不同实际折射率部分的材料的基本结构的周期性结构，基本结构周期性地布置，低电子密度层（103）布置在芯和包层之间，并且具有 比构成芯的全部材料的电子密度最高的材料的电子密度低，并且包层和低电子密度层之间的边界处的X射线的全反射的临界角大于布拉格 角度归因于核心周期性结构中基本结构的周期性。

公开(公告)号：WO2011113591A3

公开(公告)日：2011-12-01

申请号：PCT/EP2011001305

申请日：2011-03-16

Applicant: ETH ZUERICH ,  DIETERICH FRANZ ,  ABHARI REZA ,  GIOVANNINI ANDREA ,  AGA VIPLUV

Inventor： DIETERICH FRANZ ,  ABHARI REZA ,  GIOVANNINI ANDREA ,  AGA VIPLUV

IPC: G03F7/20 ,  G02B5/10 ,  G02B7/18

CPC classification number: G03F7/70891 ,  B82Y10/00 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/065

Abstract: An optical collector (15) for collecting extreme ultraviolet radiation or EUV light generated at a central EUV production site comprises a reflective shell (25). To cope with the thermal loading of the collector and thereby avoid deformations, the reflective shell (25) preferably is mounted on and supported by a support structure (24), such that a cooling channel (29) is established between the back side of the reflective shell (25) and the support structure (24), the thickness of the reflective shell (25) is substantially reduced, such that the convective heat transfer between the back side of the reflective shell (25) and a cooling medium (26) flowing through the cooling channel (29) dominates the process of removing heat from the reflective shell (25) with respect to heat conduction, and a cooling circuit (33) is connected to the cooling channel (29) to supply a cooling medium (26) to the cooling channel (29) with a controlled coolant pressure and/or mass flow.

Abstract translation: 用于收集在中央EUV生产现场产生的极紫外辐射或EUV光的光学收集器（15）包括反射壳（25）。 为了应对集热器的热负荷并由此避免变形，反射壳体（25）优选地安装在支撑结构（24）上并由支撑结构（24）支撑，使得冷却通道（29）建立在支撑结构 （25）和所述支撑结构（24）之间的厚度，所述反射壳体（25）的厚度基本上减小，使得所述反射壳体（25）的背侧和冷却介质（26）之间的对流传热， 流过冷却通道29的过程支配着从反射壳25去除热量相对于热传导的过程，并且冷却回路33与冷却通道29连接以供应冷却介质26 ）以受控的冷却剂压力和/或质量流量流到冷却通道（29）。

公开(公告)号：WO2011097115A1

公开(公告)日：2011-08-11

申请号：PCT/US2011/022724

申请日：2011-01-27

Applicant: RIGAKU INNOVATIVE TECHNOLOGIES, INC ,  VERMAN, Boris ,  YOUNG, Michael ,  JIANG, Licai

Inventor： VERMAN, Boris ,  YOUNG, Michael ,  JIANG, Licai

IPC: G21K1/06 ,  H05G1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multi-beam x-ray system includes an x-ray source (24) which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics (20, 22, 120, 122) of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location (30).

Abstract translation: 多光束X射线系统包括发射x射线的X射线源（24）和具有第一部分和第二部分的壳体。 第二部分可相对于第一部分移动，并且包括具有不同性能特征的多个光学器件（20,22，120，122）。 每个光学元件通过第二部分相对于第一部分的移动被定位到工作位置，使得光学器件接收来自x射线源的x射线，并将具有所需性能属性的x射线引导到 所需位置（30）。

公开(公告)号：WO2011068223A1

公开(公告)日：2011-06-09

申请号：PCT/JP2010/071738

申请日：2010-12-03

Applicant: 旭硝子株式会社 ,  三上 正樹

Inventor： 三上　正樹

IPC: H01L21/027 ,  G02B5/08 ,  G03F1/16 ,  G03F7/20

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0891 ,  G03F7/70958 ,  G21K2201/061

Abstract: 　Ｒｕ保護層の酸化による反射率の低下が抑制されたＥＵＶ光学部材、および該ＥＵＶ光学部材の製造に使用される機能膜付基板、ならびに該機能膜付基板の製造方法の提供。　基板上に、ＥＵＶ光を反射する反射層と、該反射層を保護する保護層とがこの順に形成されたＥＵＶリソグラフィ用反射層付基板であって、前記反射層が、Ｍｏ／Ｓｉ多層反射膜であり、前記保護層が、Ｒｕ層、または、Ｒｕ化合物層であり、前記反射層と、前記保護層と、の間に、酸素を０．５～２０ａｔ％含有し、Ｓｉを８０～９９．５ａｔ％含有する中間層が形成されていることを特徴とするＥＵＶリソグラフィ用反射層付基板。

Abstract translation: 公开了一种EUV光学构件，其中可以防止由Ru保护层的氧化引起的反射率的降低; 具有附着功能膜的基板，可用于制造EUV光学部件; 以及具有附着功能膜的基板的制造方法。 具体公开了一种用于EUV光刻的反射层附着衬底，其包括能够反射EUV光的反射层和能够依次层压在衬底上的两层层叠的反射层的保护层，其特征在于， 反射层包括Mo / Si多层反射膜，保护层包括Ru层或Ru化合物层，并且在第一反应层之间形成含有0.5至20原子％的氧和80至99.5原子％的Si的中间层 反射层和保护层。

公开(公告)号：WO2011003278A1

公开(公告)日：2011-01-13

申请号：PCT/CN2010/001010

申请日：2010-07-06

Applicant: 清华大学 ,  同方威视技术股份有限公司 ,  黄志峰 ,  陈志强 ,  张丽 ,  王振天 ,  邢宇翔 ,  赵自然 ,  肖永顺

Inventor： 黄志峰 ,  陈志强 ,  张丽 ,  王振天 ,  邢宇翔 ,  赵自然 ,  肖永顺

IPC: G01N23/04 ,  G02B27/50

CPC classification number: G01N23/04 ,  B82Y10/00 ,  G01N23/20075 ,  G21K2201/061 ,  G21K2207/005

公开(公告)号：WO2009126868A1

公开(公告)日：2009-10-15

申请号：PCT/US2009/040178

申请日：2009-04-10

Applicant: RIGAKU INNOVATIVE TECHNOLOGIES, INC. ,  VERMAN, Boris ,  JIANG, Licai

Inventor： VERMAN, Boris ,  JIANG, Licai

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061

Abstract: An x-ray generating system includes a source of x-ray radiation, a waveguide bundle optic for collimating the x-ray radiation produced by the source, a focusing optic for focusing the collimated x-ray radiation to a focal point.

Abstract translation: X射线产生系统包括X射线辐射源，用于准直由源产生的x射线辐射的波导束光学器件，用于将准直X射线辐射聚焦到焦点的聚焦光学器件。

公开(公告)号：WO2009095220A2

公开(公告)日：2009-08-06

申请号：PCT/EP2009/000539

申请日：2009-01-28

Applicant: MEDIA LARIO S.R.L. ,  WALLHEAD, Ian ,  ZOCCHI, Fabio

Inventor： WALLHEAD, Ian ,  ZOCCHI, Fabio

IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: A collector optical system for extreme ultraviolet (EUV) or X-ray applications, including lithography and imaging, for example at 13 5 nm, comprising a grazing incidence collector in combination with a laser produced plasma (LPP) source In one embodiment, one or more further optical elements act upon one or more laser beams used to generate the EUV or X-ray plasma source, whereby said laser beam(s) ιmpact(s) on the fuel target from a side thereof on which an intermediate focus is disposed Also disclosed is a collector for EUV and X-ray applications, in which radiation from a laser produced plasma source is reflected by the collector to an intermediate focus, the line joining the source and intermediate focus defining an optical axis, a first direction on the optical axis being defined from the source to the intermediate focus, characterised by the collector comprising one or more grazing incidence mirrors, and by the collector comprising one or more further optical elements for redirecting a received laser beam so as to be incident upon the source (a) in a second direction, opposite to said first direction, or (b) at an acute angle to said second direction The further optical elements may comprise plane or spherical mirrors and/or lenses, for example disposed on the optical axis Also disclosed is a collector for application at about 13 5 nm with Laser Produced Plasma sources, the collector comprising between 5 and 16 concentrically aligned mirrors, and preferably between 6 and 12 mirrors, that operate at grazing incidence such that the maximum grazing angle between the incident radiation and the reflective surface of the mirrors is about 30°, and more preferably about 25°, in order to allow a maximum collection angle from the source of about 40° to about 85°, and preferably about 45° to about 75° Also disclosed is an EUV lithography system comprising a radiation source, for example a LPP source, the collector, an optical condenser, and a reflective mask

Abstract translation: 用于极紫外（EUV）或X射线应用的收集器光学系统，包括例如13 5nm的光刻和成像，包括与激光产生的等离子体（LPP）源组合的掠入射收集器。在一个实施例中，一个或 更多的光学元件作用于用于产生EUV或X射线等离子体源的一个或多个激光束，由此所述激光束从其上放置中间焦点的一侧在燃料靶上形成 还公开了一种用于EUV和X射线应用的收集器，其中来自激光器产生的等离子体源的辐射被集电器反射到中间焦点，连接源和中间焦点的线限定光轴，第一方向在 光轴从源极到中间焦点定义，其特征在于收集器包括一个或多个掠入射镜，并且由收集器包括一个或多个另外的用于重新发射的光学元件 接收的激光束以与所述第一方向相反的第二方向入射在源（a）上，或（b）与所述第二方向成锐角。另外的光学元件可以包括平面或球面镜， /或透镜，例如设置在光轴上。还公开了一种用于在约13 5nm处用激光产生的等离子体源施加的收集器，该收集器包括5至16个同心对准的反射镜，优选在6和12个反射镜之间，其操作 在掠射入射处，使得入射辐射与反射镜的反射表面之间的最大掠射角为约30°，更优选为约25°，以便允许来自约40°至约85°的源的最大收集角 °，优选约45°至约75°。还公开了一种EUV光刻系统，其包括辐射源，例如LPP源，收集器，光学冷凝器和反射掩模

公开(公告)号：WO2009002161A1

公开(公告)日：2008-12-31

申请号：PCT/NL2008/050390

申请日：2008-06-17

Applicant: STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE ,  WIEGGERS, Rob Carlo ,  GOEDHEER, Willem Jan ,  BIJKERK, Frederik

Inventor： WIEGGERS, Rob Carlo ,  GOEDHEER, Willem Jan ,  BIJKERK, Frederik

IPC: G03F7/20 ,  H05G2/00

CPC classification number: H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

Abstract: Method for protecting an optical element in a radiation source for electromagnetic radiation with a wavelength in the extreme ultraviolet (XUV) wavelength range, in particular with a wavelength in the wavelength range between 1 nm and 15 nm, this radiation source at least comprising a chamber for receiving therein a plasma generating XUV radiation, the optical element, in particular a collector for bundling XUV radiation generated by the plasma, and a quantity of background gas for scattering between the plasma and the optical element particles exiting the plasma, characterized by admitting into the chamber a quantity of cooling gas for cooling the electrons in a secondary plasma occurring in the vicinity of the optical element, and radiation source provided with inlet means for such a cooling gas.

Abstract translation: 用于保护用于具有在极紫外（XUV）波长范围内的波长的电磁辐射的光学元件的光学元件，特别是波长在1nm和15nm之间的波长的方法，该辐射源至少包括腔室 用于在其中接收等离子体产生XUV辐射，光学元件，特别是用于捆扎由等离子体产生的XUV辐射的收集器，以及用于等离子体和离开等离子体的光学元件颗粒之间散射的背景气体的量，其特征在于， 该腔室内用于冷却在光学元件附近发生的次级等离子体中的电子的冷却气体，以及设置有用于这种冷却气体的入口装置的辐射源。