Optical element of multilayered thin film for x-rays and neutrons
    151.
    发明授权
    Optical element of multilayered thin film for x-rays and neutrons 失效
    用于x射线和中子的多层薄膜的光学元件

    公开(公告)号:US5799056A

    公开(公告)日:1998-08-25

    申请号:US755294

    申请日:1996-11-22

    Applicant: George Gutman

    Inventor: George Gutman

    Abstract: This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.

    Abstract translation: 本发明涉及生产具有横向和深度梯度多层薄膜的平面和弯曲光学元件的新方法,特别是具有极高精度的多层,用于软和硬x射线和中子以及通过这些方法实现的光学元件。 为了提高光学元件的性能,分离出d间隔和曲率的误差并随后进行补偿。

    Grating monochromators and spectrometers based on surface normal rotation
    152.
    发明授权
    Grating monochromators and spectrometers based on surface normal rotation 失效
    基于表面正常旋转的光栅单色仪和光谱仪

    公开(公告)号:US5274435A

    公开(公告)日:1993-12-28

    申请号:US841421

    申请日:1992-02-26

    Abstract: An optical system and method comprising a diffraction grating which rotates about its surface normal to change the magnitude of the wavelength diffracted to an image location. At grazing incidence, such a rotation is determined to maintain the diffracted image in focus over a wide range in scanned wavelength. Monochromator and spectrometer embodiments include plane and curved surface gratings with both classical and varied-spaced groove patterns, and a variety of illumination geometries. In the simplest case, a grazing incidence monochromator is constructed in which a self-focusing classical spherical grating scans the value in wavelength which is transmitted between fixed slits located on the Rowland circle of the grating. The diffracted image remains in perfect focus over two octaves in wavelength at high efficiency, with both entrance and exit slits fixed in position, and the radiation aperture is constant.

    Abstract translation: 一种光学系统和方法,包括围绕其表面法线旋转的衍射光栅,以将衍射的波长的大小改变为图像位置。 在掠入射处,确定这样的旋转以使衍射图像在扫描波长的宽范围内保持焦点。 单色器和光谱仪实施例包括具有经典和不同间隔的凹槽图案的平面和曲面光栅以及各种照明几何形状。 在最简单的情况下,构建了掠入射单色仪,其中自聚焦经典球形光栅扫描位于光栅的罗兰圆上的固定狭缝之间传输的波长值。 衍射图像以高效率保持在两个八度波长上的完美对焦,入射和出射狭缝均固定在适当位置,辐射孔径恒定。

    X-ray lithography source
    153.
    发明授权
    X-ray lithography source 失效
    X射线光刻源

    公开(公告)号:US5077774A

    公开(公告)日:1991-12-31

    申请号:US570210

    申请日:1990-08-21

    CPC classification number: G03F7/70033 G21K1/06 G21K5/08 H01J35/00 G21K2201/064

    Abstract: A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.

    Abstract translation: 用于生产集成电路的X射线光刻的高强度,便宜的X射线源。 用25至250MeV的高能电子束轰击箔堆,以产生500eV至3keV的软X射线通量。 描述了增加X射线总功率并使X射线束横截面均匀的方法。 全部描述了获得期望的X射线束场尺寸,最佳频谱和中和通量的方法。 还描述了获得多个站操作的方法,其使得该过程更有效和经济。 令人满意的这些问题使过渡辐射成为一种中等价格的X光源,用于光刻。

    System of mirrors for guiding an electromagnetic wave
    154.
    发明授权
    System of mirrors for guiding an electromagnetic wave 失效
    用于引导电磁波的镜子系统

    公开(公告)号:US5042931A

    公开(公告)日:1991-08-27

    申请号:US343375

    申请日:1989-04-26

    Inventor: Georges Mourier

    CPC classification number: G21K1/06 G02B19/0023 G02B19/0033 G21K2201/064

    Abstract: A system of at least three concave mirrors (M1, M2, M3 . . . ) of cylindrical form are arranged with the concave part of the first mirror M1 facing towards the second mirror M2 and with the planes defined by the straight sections of the two mirrors which are perpendicular to each other. The arrangement further has the concave part of the third mirror M3 facing towards the second mirror M2 with the planes defined by the straight sections of the two mirrors M3, M2 perpendicularly to each other. Successive mirrors are placed in a crosswise fashion with respect to their nearest neighbor in order to provide for applications in the guiding of millimeter and sub-millimeter electromagnetic waves for plasma physics.

    Focusing and guiding X-rays with tapered capillaries
    155.
    发明授权
    Focusing and guiding X-rays with tapered capillaries 失效
    用锥形毛细管聚焦和引导X射线

    公开(公告)号:US5001737A

    公开(公告)日:1991-03-19

    申请号:US492401

    申请日:1990-03-07

    CPC classification number: G21K1/06 G21K1/02 G21K2201/064

    Abstract: Apparatus for directing and focusing X-rays by the new method of confinement is disclosed. A capillary having an inlet end and an outlet end with a generally tubular or rectangular inner wall surface defines a longitudinal central opening. The central opening is tapered inwardly from the inlet end to the outlet end. X-rays are directed into the inlet end at angles less than the critical glancing angle for the inner wall surface to direct X-rays through the capillary to a focus point near the capillary outlet end.

    Abstract translation: 公开了通过新的限制方法引导和聚焦X射线的装置。 具有入口端和具有大致管状或矩形内壁表面的出口端的毛细管限定纵向中心开口。 中心开口从入口端到出口端向内逐渐变细。 X射线以小于内壁表面的临界扫视角度的角度被引导到入口端,以将X射线穿过毛细管到毛细管出口端附近的聚焦点。

    X-ray mirror apparatus and method of manufacturing the same
    156.
    发明授权
    X-ray mirror apparatus and method of manufacturing the same 失效
    X射线镜装置及其制造方法

    公开(公告)号:US4940319A

    公开(公告)日:1990-07-10

    申请号:US342793

    申请日:1989-04-25

    CPC classification number: G21K1/06 G21K2201/064 G21K2201/067

    Abstract: An X-ray mirror apparatus includes a substantially cylindrical mirror body and a pair of light shielding members provided at both open ends of the mirror body. The inner surface of the mirror body constitutes a reflecting mirror surface having a surface of revolution. Each light shielding member has a light shielding plate arranged at the opened end of the mirror body to block it, and an annular slit allowing passage of X-rays entering onto and reflected on the reflecting mirror surface. A cylindrical fitting member is fixed to the light shielding plate to be coaxial with the slit. The fitting member is fitted on the opened end portion of the mirror body, thereby positioning the light shielding member so that the slit is located coaxial with the axis of the reflecting mirror surface.

    Normal incidence X-ray mirror for chemical microanalysis
    157.
    发明授权
    Normal incidence X-ray mirror for chemical microanalysis 失效
    用于化学微量分析的正常入射X射线镜

    公开(公告)号:US4916721A

    公开(公告)日:1990-04-10

    申请号:US81964

    申请日:1987-08-05

    CPC classification number: G21K1/06 G21K2201/064 G21K2201/067

    Abstract: A non-planar, focusing mirror, to be utilized in both electron column instruments and micro-x-ray fluorescence instruments for performing chemical microanalysis on a sample, comprises a concave, generally spherical base substrate and a predetermined number of alternating layers of high atomic number material and low atomic number material contiguously formed on the base substrate. The thickness of each layer is an integral multiple of the wavelength being reflected and may vary non-uniformly according to a predetermined design. The chemical analytical instruments in which the mirror is used also include a predetermined energy source for directing energy onto the sample and a detector for receiving and detecting the x-rays emitted from the sample; the non-planar mirror is located between the sample and detector and collects the x-rays emitted from the sample at a large solid angle and focuses the collected x-rays to the sample.For electron column instruments, the wavelengths of interest lie above 1.5 nm, while for x-ray fluorescence instruments, the range of interest is below 0.2 nm. Also, x-ray fluorescence instruments include an additional non-planar focusing mirror, formed in the same manner as the previously described mThe invention described herein was made in the performance of work under contract with the Department of Energy, Contract No. DE-AC04-76DP00789, and the United States Government has rights in the invention pursuant to this contract.

    Abstract translation: 在用于对样品进行化学微量分析的电子束仪器和微x射线荧光仪器中使用的非平面聚焦镜包括凹的,通常为球形的基底基底和预定数量的高原子的交替层 数字材料和低原子序数材料连续地形成在基底基板上。 每个层的厚度是被反射的波长的整数倍,并且可以根据预定的设计而不均匀地变化。 使用反射镜的化学分析仪器还包括用于将能量引导到样品上的预定能量源和用于接收和检测从样品发射的x射线的检测器; 非平面镜位于样品和检测器之间,并以大的立体角收集从样品发射的x射线,并将收集的x射线聚焦到样品。 对于电子柱仪器,感兴趣的波长在1.5nm以上,而对于x射线荧光仪器,感兴趣的范围低于0.2nm。 此外,x射线荧光仪器包括以与前述反射镜相同的方式形成并位于能量源和样品之间的附加非平面聚焦反射镜,以收集从光源发射的x射线并将其引导到 样品不损失强度。

    Scanning monochromator crystal and related method
    158.
    发明授权
    Scanning monochromator crystal and related method 失效
    扫描单色仪晶体及相关方法

    公开(公告)号:US4882780A

    公开(公告)日:1989-11-21

    申请号:US309304

    申请日:1989-01-03

    Inventor: David B. Wittry

    Abstract: A doubly-curved crystal for use in a scanning monochromator is oriented with respect to a reference plane containing source and image locations of the monochromator. The crystal has concave planes of lattice points and a concave crystal surface which satisfy Johannson geometric conditions within the reference plane for a Rowland circle of radius R. The planes of lattice points are substantially spherically curved to a radius of 2R, and the crystal surface is substantially toroidally curved with a radius of substantially 2R within a plane perpendicular to the reference plane. The crystal may be formed by plastically deforming a cylindrically curved crystal blank over a doubly-curved convex die.

    Abstract translation: 用于扫描单色仪的双曲面晶体相对于包含单色仪的源和图像位置的参考平面定向。 晶体具有格子点的凹面和凹面结构,其对于半径为R的罗兰圆,在参考平面内满足约翰逊几何条件。格点的平面基本上球形弯曲为半径为2R,晶体表面为 在垂直于参考平面的平面内大致环形弯曲,半径大致为2R。 晶体可以通过将圆柱形弯曲的晶体坯料塑性变形在双曲形凸模上而形成。

    Scanning monochrometer crystal and method of formation
    159.
    发明授权
    Scanning monochrometer crystal and method of formation 失效
    扫描单色仪晶体和形成方法

    公开(公告)号:US4807268A

    公开(公告)日:1989-02-21

    申请号:US833950

    申请日:1986-02-26

    Inventor: David B. Wittry

    Abstract: A doubly-curved crystal for use in a scanning monochromator is oriented with respect to a reference plane containing source and image locations of the monochromator. The crystal has concave planes of lattice points and a concave crystal surface which satisfy Johannson geometric conditions within the reference plane for a Rowland circle of radius R. The planes of lattice points are substantially spherically curved to a radius of 2R, and the crystal surface is substantially toroidally curved with a radius of substantially 2R within a plane perpendicular to the reference plane. The crystal may be formed by plastically deforming a cylindrically curved crystal blank over a doubly-curved convex die.

    Abstract translation: 用于扫描单色仪的双曲面晶体相对于包含单色仪的源和图像位置的参考平面定向。 晶体具有格子点的凹面和凹面结构,其对于半径为R的罗兰圆,在参考平面内满足约翰逊几何条件。格点的平面基本上球形弯曲为半径为2R,晶体表面为 在垂直于参考平面的平面内大致环形弯曲,半径大致为2R。 晶体可以通过将圆柱形弯曲的晶体坯料塑性变形在双曲形凸模上而形成。

    Plane-grating monochromator
    160.
    发明授权
    Plane-grating monochromator 失效
    平面光栅单色仪

    公开(公告)号:US4553253A

    公开(公告)日:1985-11-12

    申请号:US704131

    申请日:1984-06-20

    Inventor: Helmuth Petersen

    CPC classification number: G01J3/1804 G21K1/06 G21K2201/064

    Abstract: A plane-grating monochromator is described which is particularly well suited for wavelengths in the range from approximately 1 to 15 nanometers and contains as its primary optical elements a diffraction grating (16) and an ellipsoid mirror (20). If both the entry aperture and the exit aperture are intended to be stationary, then a pivotable mirror (14) preceding them is provided. The present plane-grating monochromator is distinguished by an accurate image, virtually free of distortion, and correspondingly high resolution as well as by simple optics; it includes only two or three optical elements, and a kinematically simple adjusting mechanism for the optical elements suffices for adjusting the wavelength.

    Abstract translation: 描述了一种平面光栅单色仪,其特别适用于约1至15纳米范围内的波长,并且包含作为其主要光学元件的衍射光栅(16)和椭圆面镜(20)。 如果入口孔和出口孔都要静止,则提供它们之前的可枢转镜(14)。 本平面光栅单色仪的特征在于准确的图像,实际上没有失真,相应的高分辨率以及简单的光学元件; 它仅包括两个或三个光学元件,并且用于光学元件的运动学上简单的调节机构足以调节波长。

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