公开(公告)号：US20190235141A1

公开(公告)日：2019-08-01

申请号：US16338013

申请日：2017-09-25

Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

Inventor： Philipp Naujok ,  Sergiy Yulin ,  Norbert Kaiser

IPC: G02B5/08 ,  G21K1/06 ,  C23C14/35 ,  G03F7/20

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  C23C14/35 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061

Abstract: A multilayer mirror for reflecting Extreme Ultraviolet (EUV) radiation and a method for producing the same are disclosed. In an embodiment a multilayer mirror includes a layer sequence having a plurality of alternating first layers and second layers, the first layers including lanthanum or a lanthanum compound and the second layers including boron, wherein the second layers are doped with carbon, and wherein a molar fraction of carbon in the second layers is 10% or less.

公开(公告)号：US09645503B2

公开(公告)日：2017-05-09

申请号：US14210625

申请日：2014-03-14

Applicant: Carl Zeiss SMT GmbH

Inventor： Ingo Saenger ,  Joerg Zimmermann ,  Daniel Kraehmer ,  Johannes Ruoff ,  Martin Meier ,  Frank Schlesener ,  Christoph Hennerkes ,  Wolfgang Singer

IPC: G03B27/54 ,  G03F7/20 ,  G21K1/06 ,  G02B19/00 ,  G02B27/28 ,  B82Y10/00

CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0071 ,  G02B19/0095 ,  G02B27/286 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70566 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum.

公开(公告)号：US20170017150A1

公开(公告)日：2017-01-19

申请号：US15281056

申请日：2016-09-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Harmen Klaas VAN DER SCHOOT ,  Lucas Henricus Johannes STEVENS ,  Maarten VAN KAMPEN

IPC: G03F1/64 ,  G03F7/20

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

Abstract translation: 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。

公开(公告)号：US09395630B2

公开(公告)日：2016-07-19

申请号：US13704222

申请日：2011-03-17

Applicant: Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

Inventor： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

IPC: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  C01B31/04 ,  G02B5/08 ,  G02B5/20 ,  G02B27/00 ,  G03F1/24 ,  G03F1/62 ,  G21K1/06 ,  H01B1/04 ,  H01B1/24 ,  G03B27/54

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.

Abstract translation: 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。 颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。 间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。

公开(公告)号：US09364190B2

公开(公告)日：2016-06-14

申请号：US13300083

申请日：2011-11-18

Applicant: Susanne Madeline Lee ,  Aurelie Boudier ,  Serge Louis Wilfrid Muller

Inventor： Susanne Madeline Lee ,  Aurelie Boudier ,  Serge Louis Wilfrid Muller

IPC: A61B6/00 ,  B82Y10/00 ,  G21K1/06 ,  H01J35/06 ,  A61B6/08

CPC classification number: A61B6/482 ,  A61B6/08 ,  A61B6/4021 ,  A61B6/502 ,  A61B6/588 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/064 ,  H01J35/06 ,  H01J2235/068

Abstract: A mammograph is provided. The mammograph includes a source of X-rays; a detector of X-rays, the source being configured to emit at least one beam of X-rays to the detector; and an optic control device configured to control the direction of X-rays emitted by the source such that the X-rays emitted by the source are substantially parallel to one another.

Abstract translation: 提供乳房X光检查。 乳房X线照相术包括X射线源; X射线检测器，所述源被配置为向所述检测器发射至少一束X射线; 以及光学控制装置，被配置为控制由所述源发射的X射线的方向，使得由所述源发射的X射线基本上彼此平行。

公开(公告)号：US09195152B2

公开(公告)日：2015-11-24

申请号：US13119895

申请日：2009-08-26

Applicant: Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak ,  Denny Mathew ,  Hendrik Jan Kettelarij ,  Fredericus Christiaan Van Den Heuvel ,  Petrus Elizabeth Maria Kuijpers

Inventor： Wouter Anthon Soer ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak ,  Denny Mathew ,  Hendrik Jan Kettelarij ,  Fredericus Christiaan Van Den Heuvel ,  Petrus Elizabeth Maria Kuijpers

IPC: G03B27/72 ,  G03F7/20 ,  B82Y10/00 ,  G02B5/20 ,  G21K1/10

CPC classification number: G03F7/7095 ,  B82Y10/00 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10 ,  G21K2201/061

Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process.

Abstract translation: 透射光谱纯度滤光器被配置为透射极紫外辐射。 光谱纯度滤光器包括具有多个孔的滤光器部分，其被配置为透射极紫外辐射并抑制第二类型辐射的透射。 每个孔径均通过各向异性蚀刻工艺制造。

公开(公告)号：US08693090B2

公开(公告)日：2014-04-08

申请号：US13000674

申请日：2009-07-01

Applicant: Christof Metzmacher

Inventor： Christof Metzmacher

IPC: G02B5/08 ,  G02B5/28

CPC classification number: G02B5/283 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of ≦5 nm and essentially made out of a material with a sputter resistance of ≦10 nm per 108 shots and whereby the second layer is provided in the path of the incident and/or reflected EUV light.

Abstract translation: 本发明涉及一种改进的EUV反射元件，其包括：a）基本上由高反射材料制成的第一层; b）具有＆nlE; 5nm厚度的第二层，并且基本上由溅射电阻为n1E的材料制成; 每108次照射10nm，由此第二层设置在入射和/或反射的EUV光的路径中。

公开(公告)号：US08611503B2

公开(公告)日：2013-12-17

申请号：US13112099

申请日：2011-05-20

Applicant: Kohei Okamoto ,  Atsushi Komoto ,  Wataru Kubo ,  Hirokatsu Miyata ,  Takashi Noma

Inventor： Kohei Okamoto ,  Atsushi Komoto ,  Wataru Kubo ,  Hirokatsu Miyata ,  Takashi Noma

IPC: G21K1/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/067

Abstract: An X-ray waveguide which: shows a small propagation loss of an X-ray; does not deteriorate owing to oxidation; and can be easily produced is realized with an X-ray waveguide, including: a core for guiding an X-ray in such a wavelength band that the real part of refractive index of materials is 1 or less; and a cladding for confining the X-ray in the core, in which: the cladding has a one-dimensional periodic structure consisting of at least two materials having different real parts of refractive index; one of the materials is inorganic one, and another one of materials is any of an organic material, a gas, or vacuum; and the core and the cladding are formed so that the critical angle for total reflection at the interface between the core and the cladding is smaller than a Bragg angle depending on the periodicity of the one-dimensional periodic structure.

Abstract translation: X射线波导：X射线的传播损耗小; 不会因氧化而劣化; 并且可以容易地制造，其包括：用于引导材料的折射率的实数为1以下的波长带的X射线的芯; 以及用于将X射线限制在芯中的包层，其中：包层具有由具有不同实际折射率部分的至少两种材料组成的一维周期性结构; 其中一种材料是无机材料，另一种材料是有机材料，气体或真空中的任何一种; 并且芯和包层形成为使得在芯和包层之间的界面处的全反射的临界角小于根据一维周期性结构的周期性的布拉格角。

公开(公告)号：US08585224B2

公开(公告)日：2013-11-19

申请号：US13763709

申请日：2013-02-10

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Dirk Heinrich Ehm ,  Stephan Muellender ,  Thomas Stein ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Dieter Kraus ,  Richard Versluis ,  Marcus Gerhardus Hendrikus Meijerink

IPC: G02B5/08 ,  H01S3/22

CPC classification number: G03B27/16 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

Abstract translation: 光学装置，例如 用于EUV光刻的投影曝光装置（1）包括：封闭内部空间（15）的壳体（2）; 布置在壳体（2）中的至少一个优选反射光学元件（4-10,12,14.1-14.6）; 至少一个用于所述壳体（2）的内部空间（15）的真空发生单元（3）; 以及布置在所述内部空间（15）中并且至少包围所述光学元件（4-10,12,14.1-14.5）的光学表面（17,17.1,17.2）的至少一个真空壳体（18,18.1-18.10） 。 污染减少单元与真空壳体（18.1-18.10）相关联，并且至少紧邻光学表面（17,17.1,17.2）处的污染物质特别是水和/或烃的分压降低 与内部空间（15）中的污染物质的分压有关。

公开(公告)号：US20130280421A1

公开(公告)日：2013-10-24

申请号：US13976634

申请日：2011-10-28

Applicant: Jung Ho Je ,  Jiwon Jung

Inventor： Jung Ho Je ,  Jiwon Jung

IPC: G02B3/08

CPC classification number: G02B3/08 ,  B82Y10/00 ,  C23C16/45555 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067

Abstract: The present invention relates to a method for manufacturing an X-ray/γ-ray focusing optical system comprising the steps of: providing a capillary substrate; and sequentially accumulating a plurality of alternation layers, each consisting of an X-ray/γ-ray opaque material and an X-ray/γ-ray transparent material, on an inner surface of the capillary substrate in a Fresnel pattern by atomic layer deposition.

Abstract translation: 本发明涉及一种用于制造X射线/γ射线聚焦光学系统的方法，包括以下步骤：提供毛细管基底; 并且通过原子层沉积在菲涅耳图案的毛细管基板的内表面上依次累积多个交替层，每个交替层由X射线/伽玛射线不透明材料和X射线/γ射线透明材料组成 。